Patents by Inventor Hsing-Lien Lin
Hsing-Lien Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240138272Abstract: Various embodiments of the present disclosure are directed towards an integrated chip including a first conductive structure over a substrate. A data storage structure overlies the first conductive structure. The data storage structure comprises a first dielectric layer on the first conductive structure and a second dielectric layer on the first dielectric layer. The first dielectric layer comprises a dielectric material and a first dopant having a concentration that changes from a top surface of the first dielectric layer in a direction towards the first conductive structure. A second conductive structure overlies the data storage structure.Type: ApplicationFiled: January 3, 2024Publication date: April 25, 2024Inventors: Fa-Shen Jiang, Cheng-Yuan Tsai, Hai-Dang Trinh, Hsing-Lien Lin, Hsun-Chung Kuang, Bi-Shen Lee
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Patent number: 11963468Abstract: In some embodiments, the present disclosure relates to an integrated chip. The integrated chip includes a bottom electrode disposed over one or more interconnects and a diffusion barrier layer on the bottom electrode. The diffusion barrier layer has an inner upper surface that is arranged laterally between and vertically below an outer upper surface of the diffusion barrier film. The outer upper surface wraps around the inner upper surface in a top-view of the diffusion barrier layer. A data storage structure is separated from the bottom electrode by the diffusion barrier layer. A top electrode is arranged over the data storage structure.Type: GrantFiled: July 27, 2022Date of Patent: April 16, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hai-Dang Trinh, Chii-Ming Wu, Hsing-Lien Lin, Fa-Shen Jiang
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Patent number: 11916127Abstract: Various embodiments of the present disclosure are directed towards a memory device including a first bottom electrode layer over a substrate. A ferroelectric switching layer is disposed over the first bottom electrode layer. A first top electrode layer is disposed over the ferroelectric switching layer. A second bottom electrode layer is disposed between the first bottom electrode layer and the ferroelectric switching layer. The second bottom electrode layer is less susceptible to oxidation than the first bottom electrode layer.Type: GrantFiled: June 16, 2021Date of Patent: February 27, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yi Yang Wei, Bi-Shen Lee, Hsin-Yu Lai, Hai-Dang Trinh, Hsing-Lien Lin, Hsun-Chung Kuang
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Publication number: 20240064998Abstract: A method includes forming a bottom electrode layer, and depositing a first ferroelectric layer over the bottom electrode layer. The first ferroelectric layer is amorphous. A second ferroelectric layer is deposited over the first ferroelectric layer, and the second ferroelectric layer has a polycrystalline structure. The method further includes depositing a third ferroelectric layer over the second ferroelectric layer, with the third ferroelectric layer being amorphous, depositing a top electrode layer over the third ferroelectric layer, and patterning the top electrode layer, the third ferroelectric layer, the second ferroelectric layer, the first ferroelectric layer, and the bottom electrode layer to form a Ferroelectric Random Access Memory cell.Type: ApplicationFiled: November 3, 2023Publication date: February 22, 2024Inventors: Bi-Shen Lee, Yi Yang Wei, Hsing-Lien Lin, Hsun-Chung Kuang, Cheng-Yuan Tsai, Hai-Dang Trinh
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Patent number: 11895933Abstract: Various embodiments of the present disclosure are directed towards a method for forming an integrated chip, the method includes forming a bottom electrode over a substrate. A first switching layer is formed on the bottom electrode. The first switching layer comprises a dielectric material doped with a first dopant. A second switching layer is formed over the first switching layer. An atomic percentage of the first dopant in the second switching layer is less than an atomic percentage of the first dopant in the first switching layer. A top electrode is formed over the second switching layer.Type: GrantFiled: June 30, 2022Date of Patent: February 6, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Fa-Shen Jiang, Cheng-Yuan Tsai, Hai-Dang Trinh, Hsing-Lien Lin, Hsun-Chung Kuang, Bi-Shen Lee
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Patent number: 11887929Abstract: An interfacial layer is provided that binds a hydrophilic interlayer dielectric to a hydrophobic gap-filling dielectric. The hydrophobic gap-filling dielectric extends over and fill gaps between devices in an array of devices disposed between two metal interconnect layers over a semiconductor substrate and is the product of a flowable CVD process. The interfacial layer provides a hydrophilic upper surface to which the interlayer dielectric adheres. Optionally, the interfacial layer is also the product of a flowable CVD process. Alternatively, the interfacial layer may be silicon nitride or another dielectric that is hydrophilic. The interfacial layer may have a wafer contact angle (WCA) intermediate between a WCA of the hydrophobic dielectric and a WCA of the interlayer dielectric.Type: GrantFiled: July 20, 2022Date of Patent: January 30, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hsing-Lien Lin, Chin-Wei Liang, Hsun-Chung Kuang, Ching Ju Yang
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Publication number: 20240023464Abstract: Some embodiments relate to an integrated chip including a first conductive structure over a substrate. A first dielectric layer is on the first conductive structure. A second dielectric layer is on the first dielectric layer, where thermal conductivities of the first and second dielectric layers are different from one another. A second conductive structure is over the second dielectric layer.Type: ApplicationFiled: July 31, 2023Publication date: January 18, 2024Inventors: Fa-Shen Jiang, Hsing-Lien Lin
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Publication number: 20240021700Abstract: Various embodiments of the present disclosure are directed towards a memory device including a first bottom electrode layer over a substrate. A ferroelectric switching layer is disposed over the first bottom electrode layer. A first top electrode layer is disposed over the ferroelectric switching layer. A second bottom electrode layer is disposed between the first bottom electrode layer and the ferroelectric switching layer. The second bottom electrode layer is less susceptible to oxidation than the first bottom electrode layer.Type: ApplicationFiled: August 8, 2023Publication date: January 18, 2024Inventors: Yi Yang Wei, Bi-Shen Lee, Hsin-Yu Lai, Hai-Dang Trinh, Hsing-Lien Lin, Hsun-Chung Kuang
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Publication number: 20230420493Abstract: A metal-insulator-metal (MIM) capacitor and methods of forming the same are described. In some embodiments, the method includes forming an opening having a first depth in one or more dielectric layers, depositing a layer in the opening and on the one or more dielectric layers, performing an anisotropic etch process to remove portions of the layer formed on horizontal surfaces, extending the opening to a second depth in the one or more dielectric layers, removing the layer, extending the opening to a third depth in the one or more dielectric layers, and forming a MIM capacitor in the opening.Type: ApplicationFiled: June 27, 2022Publication date: December 28, 2023Inventors: Hsing-Lien LIN, Hai-Dang TRINH, Yao-Wen CHANG, Jui-Lin CHU, Cheng-Te LEE
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Patent number: 11844226Abstract: A method includes forming a bottom electrode layer, and depositing a first ferroelectric layer over the bottom electrode layer. The first ferroelectric layer is amorphous. A second ferroelectric layer is deposited over the first ferroelectric layer, and the second ferroelectric layer has a polycrystalline structure. The method further includes depositing a third ferroelectric layer over the second ferroelectric layer, with the third ferroelectric layer being amorphous, depositing a top electrode layer over the third ferroelectric layer, and patterning the top electrode layer, the third ferroelectric layer, the second ferroelectric layer, the first ferroelectric layer, and the bottom electrode layer to form a Ferroelectric Random Access Memory cell.Type: GrantFiled: August 9, 2022Date of Patent: December 12, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Bi-Shen Lee, Yi Yang Wei, Hsing-Lien Lin, Hsun-Chung Kuang, Cheng-Yuan Tsai, Hai-Dang Trinh
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Publication number: 20230389453Abstract: A semiconductor device structure is provided. The structure includes a substrate and a data storage element over the substrate. The structure also includes a protective element extending into the data storage element. A bottom surface of the protective element is between a top surface of the data storage element and a bottom surface of the data storage element. The structure further includes a first electrode electrically connected to the data storage element and a second electrode electrically connected to the data storage element.Type: ApplicationFiled: July 25, 2023Publication date: November 30, 2023Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Hai-Dang TRINH, Hsing-Lien LIN, Cheng-Yuan TSAI
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Publication number: 20230365395Abstract: The present disclosure provides a structure and method of fabricating the structure. The structure comprises a cavity enclosed by a first substrate and a second substrate opposite to the first substrate. Further, the structure includes a feature in the cavity and the feature is protruded from a surface of the first substrate. In addition, the structure includes a dielectric layer over the feature, wherein the dielectric layer includes a first surface in contact with the feature and a second surface opposite to the first surface is positioned toward the cavity.Type: ApplicationFiled: July 25, 2023Publication date: November 16, 2023Inventors: Yuan-Chih Hsieh, Hsing-Lien Lin, Jung-Huei Peng, Yi-Chien Wu
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Patent number: 11800823Abstract: Some embodiments relate to a method for manufacturing a memory device. The method includes forming a bottom electrode over a substrate. A heat dispersion layer is formed over the bottom electrode. A dielectric layer is formed over the heat dispersion layer. A top electrode is formed over the dielectric layer. The heat dispersion layer comprises a first dielectric material.Type: GrantFiled: February 2, 2021Date of Patent: October 24, 2023Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Fa-Shen Jiang, Hsing-Lien Lin
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Publication number: 20230320241Abstract: Various embodiments of the present application are directed towards a resistive random-access memory (RRAM) cell including a top-electrode barrier layer configured to block the movement of nitrogen or some other suitable non-metal element from a top electrode of the RRAM cell to an active metal layer of the RRAM cell. Blocking the movement of non-metal element may be prevent formation of an undesired switching layer between the active metal layer and the top electrode. The undesired switching layer would increase parasitic resistance of the RRAM cell, such that top-electrode barrier layer may reduce parasitic resistance by preventing formation of the undesired switching layer.Type: ApplicationFiled: June 8, 2023Publication date: October 5, 2023Inventors: Hsing-Lien Lin, Chii-Ming Wu, Fa-Shen Jiang
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Patent number: 11767216Abstract: The present disclosure provides a structure. The structure comprises a cavity enclosed by a first substrate and a second substrate opposite to the first substrate. Further, the structure includes a feature in the cavity and the feature is protruded from a surface of the first substrate. In addition, the structure includes a dielectric layer over the feature, wherein the dielectric layer includes a first surface in contact with the feature and a second surface opposite to the first surface is positioned toward the cavity.Type: GrantFiled: September 25, 2020Date of Patent: September 26, 2023Assignee: Taiwan Semiconductor Manufacturing Company Ltd.Inventors: Yuan-Chih Hsieh, Hsing-Lien Lin, Jung-Huei Peng, Yi-Chien Wu
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Patent number: 11758830Abstract: A semiconductor device structure is provided. The structure includes a semiconductor substrate and a data storage element over the semiconductor substrate. The structure also includes an ion diffusion barrier element over the data storage element and a protective element extending along a sidewall of the ion diffusion barrier element. A bottom surface of the protective element is between a top surface of the data storage element and a bottom surface of the data storage element. The structure further includes a first electrode electrically connected to the data storage element and a second electrode electrically connected to the data storage element.Type: GrantFiled: May 19, 2021Date of Patent: September 12, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Hai-Dang Trinh, Hsing-Lien Lin, Cheng-Yuan Tsai
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Publication number: 20230276721Abstract: The present disclosure relates to a resistive random access memory (RRAM) device. The RRAM device includes a first electrode over a substrate and a second electrode over the substrate. A data storage structure is disposed between the first electrode and the second electrode. The data storage structure includes a first metal and a second metal. The first metal has a peak concentration at a first distance from the first electrode and the second metal has a peak concentration at a second distance from the first electrode. The first distance is different than the second distance.Type: ApplicationFiled: May 8, 2023Publication date: August 31, 2023Inventors: Hai-Dang Trinh, Cheng-Yuan Tsai, Hsing-Lien Lin, Wen-Ting Chu
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Publication number: 20230255125Abstract: A method for forming a semiconductor memory structure include forming a pillar structure. The pillar structure includes a first conductive layer, a second conductive layer and a data storage material layer between the first and second conducive layers. A sidewall of the first conductive layer, a sidewall of the data storage layer and a sidewall of the second conductive layer are exposed. An oxygen-containing plasma treatment is performed on the pillar structure to form hydrophilic surfaces of the sidewall of the first conductive layer, the sidewall of the data storage layer and the sidewall of the second conductive layer. An encapsulation layer is formed over the pillar structure and the dielectric layer. The encapsulation layer is in contact with the hydrophilic surfaces of the sidewall of the first conductive layer, the sidewall of the data storage layer and the sidewall of the second conductive layer.Type: ApplicationFiled: April 18, 2023Publication date: August 10, 2023Inventors: HSING-LIEN LIN, FU-TING SUNG, CHING JU YANG, CHII-MING WU
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Patent number: 11716915Abstract: Various embodiments of the present application are directed towards a resistive random-access memory (RRAM) cell including a top-electrode barrier layer configured to block the movement of nitrogen or some other suitable non-metal element from a top electrode of the RRAM cell to an active metal layer of the RRAM cell. Blocking the movement of non-metal element may be prevent formation of an undesired switching layer between the active metal layer and the top electrode. The undesired switching layer would increase parasitic resistance of the RRAM cell, such that top-electrode barrier layer may reduce parasitic resistance by preventing formation of the undesired switching layer.Type: GrantFiled: October 14, 2021Date of Patent: August 1, 2023Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hsing-Lien Lin, Chii-Ming Wu, Fa-Shen Jiang
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Patent number: 11683999Abstract: The present disclosure relates to a memory device. The memory device includes an access device arranged on or within a substrate and coupled to a word-line and a source line. A plurality of lower interconnects are disposed within a lower dielectric structure over the substrate. A first electrode is coupled to the plurality of lower interconnects. The plurality of lower interconnects couple the access device to the first electrode. A second electrode is over the first electrode. One or more upper interconnects are disposed within an upper dielectric structure laterally surrounding the second electrode. The one or more upper interconnects couple the second electrode to a bit-line. A data storage structure is disposed between the first electrode and the second electrode. The data storage structure includes one or more metals having non-zero concentrations that change as a distance from the substrate varies.Type: GrantFiled: June 7, 2022Date of Patent: June 20, 2023Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hai-Dang Trinh, Cheng-Yuan Tsai, Hsing-Lien Lin, Wen-Ting Chu