Abstract: It is disclosed a photoresist cleaning composition for stripping a photoresist pattern having a film thickness of 3-150 ?m, which contains (a) quaternary ammonium hydroxide (b) a mixture of water-soluble organic solvents (c) at least one corrosion inhibitor and (d) water, and a method for treating a substrate therewith.

Abstract: It is disclosed a photoresist cleaning composition for stripping a photoresist pattern having a film thickness of 3-150 ?m, which contains (a) quaternary ammonium hydroxide (b) a mixture of water-soluble organic solvents (c) at least one corrosion inhibitor and (d) water, and a method for treating a substrate therewith.

Abstract: An adapter structure for handheld electrical tools is disclosed, which includes an outer socket and an inner socket. The outer socket is provided with a shank at its bottom and provided therein with first teeth. The inner socket has an upper section, a middle section, and a lower section. The middle section is provided at its bottom with second teeth. The inner socket is fitted into the outer socket and limited by a crimp formed at a top edge of the outer socket, so that the inner socket will not be detached from the outer socket. When a selective tool, fitted at the upper section, is pressed to move downwardly, the first teeth can engage with the second teeth, so that the outer socket can drive the inner socket with the selective tool to rotate bolts or nuts under torque limitation for fastening operations.

Abstract: An adapter structure for handheld electrical tools is disclosed, which includes an outer socket and an inner socket. The outer socket is provided with a shank at its bottom and provided therein with first teeth. The inner socket has an upper section, a middle section, and a lower section. The middle section is provided at its bottom with second teeth. The inner socket is fitted into the outer socket and limited by a crimp formed at a top edge of the outer socket, so that the inner socket will not be detached from the outer socket. When a selective tool, fitted at the upper section, is pressed to move downwardly, the first teeth can engage with the second teeth, so that the outer socket can drive the inner socket with the selective tool to rotate bolts or nuts under torque limitation for fastening operations.

Abstract: Disclosed is a microarray chip for allergy-related immunoglobulin detection, especially for quantitative detection of total IgE and allergen-specific immunoglobulins (such as specific IgE, specific IgG, and specific IgM), which comprises a solid substrate, a reactive layer fabricated on the solid substrate, and at least one allergen or substance capable of binding to immunoglobulin of interest. Whereby, use the result of quantitative detection for allergen-specific IgE to determine hypersensitivity level. In addition, a method for allergy-related immunoglobulin detection using the microarray chip is present, which uses a secondary monoclonal antibody to minimize non-specific binding and applies an enzymatic reaction to amplify reaction signal. An efficient way is thus obtained, which not only reduces time consumption but also provides quantitative measurement.

Abstract: A fungal glucoamylase including a mutation pair Asn20Cys coupled with Ala27Cys forming a disulfide bond between the two members of the pair. The mutation provides increased thermal stability and reduced isomaltose formation to the enzyme. A fungal glucoamylase including a 311-314Loop mutation wherein reduced isomaltose formation is provided by the mutation is also provided. A fungal glucoamylase including a mutation Ser411Ala wherein increased pH optimum and reduced isomaltose formation is provided by the mutation is also provided. Combinations of the mutations in engineered glucoamylases are also provided as are combinations with other glucoamylase mutations that provide increased thermal stability, increased pH optimum and reduced isomaltose froamtion for cumulative improvements in the engineered glucoamylases. Also provided is a fungal glucoamylase including a mutation of Ser30Pro coupled with at least two stabilizing mutations forming a disulfide bond between the two stabilizing members.

Abstract: The present invention provides a water soluble polymer which is prepared by the following steps. First, a carboxyl group-containing polymer is reacted with an alkaline reagent so that a portion of the carboxyl groups are reacted in an amount sufficient to make the polymer water soluble. Then, the polymer obtained is reacted with an epoxide containing unsaturated bonds and/or heteroatoms so that 1 to 100 mole percent of the remaining carboxyl groups of the polymer are reacted with the epoxide to form ester groups via a ring-opening reaction of epoxides, wherein the heteroatom can be silicon, nitrogen, phosphorus or sulfur. The water soluble polymer of the present invention can be used as a photosensitive resin. When the photoresist composition is used for preparing printed ciruit boards, it exhibits high photosensitivity, good water dispersability, storage stability, and good adhesion to copper. In addition, the problem of sticking to the mask can be prevented.