Patents by Inventor HSIUN-CHIA SHIH

HSIUN-CHIA SHIH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10604639
    Abstract: The invention provides a thermally-polymerizable composition. The thermally-polymerizable composition includes a (meth)acrylate oligomer having one or more functional groups, a thermal initiator, and a plasticizer. The invention also provides a combined solution formed by the thermally-polymerizable composition via a solvent-free thermal polymerization reaction. The combined solution can be used for adhesion, coating, or packaging.
    Type: Grant
    Filed: January 13, 2017
    Date of Patent: March 31, 2020
    Assignee: Eternal Materials Co., Ltd.
    Inventors: Chi-Yu Huang, Hsiun-Chia Shih
  • Publication number: 20180057662
    Abstract: The invention provides a thermally-polymerizable composition. The thermally-polymerizable composition includes a (meth)acrylate oligomer having one or more functional groups, a thermal initiator, and a plasticizer. The invention also provides a combined solution formed by the thermally-polymerizable composition via a solvent-free thermal polymerization reaction. The combined solution can be used for adhesion, coating, or packaging.
    Type: Application
    Filed: January 13, 2017
    Publication date: March 1, 2018
    Applicant: Eternal Materials Co., Ltd.
    Inventors: Chi-Yu Huang, Hsiun-Chia Shih
  • Publication number: 20170190877
    Abstract: The present invention provides a thermally polymerizable composition, which comprises (a) a monomer; (b) a thermal initiator, (c) a plasticizer, wherein the monomer comprises a mono-functional acrylate monomer, a multi-functional acrylate monomer, or a mixture thereof. The present invention also provides a combined solution formed from said thermally polymerizable composition via solvent-free thermal polymerization. The polymer may be used for adhering, coating or sealing.
    Type: Application
    Filed: August 25, 2016
    Publication date: July 6, 2017
    Inventors: Chi-Yu Huang, Hsiun-Chia Shih
  • Patent number: 9029433
    Abstract: A photocurable adhesive composition is provided, which comprises: a) a (meth)acrylate oligomer having one or more functional groups, b) a mono-functional monomer, a multi-functional monomer, or a mixture thereof, c) a photoinitiator, and d) a plasticizer having a refractive index of no less than 1.48. The photocurable adhesive composition of the present invention has good light transmittance, high refractive index and appropriate flowability and softness, and is easy to be coated and adhered. The photocurable adhesive composition of the present invention can be applied to optical products and simplify the manufacture processes, and provide adhesion property while retaining good reworkability and optical properties.
    Type: Grant
    Filed: December 30, 2011
    Date of Patent: May 12, 2015
    Assignee: Eternal Materials Co., Ltd.
    Inventors: Chi-Yu Huang, Chi-Ching Lu, Hsiun-Chia Shih
  • Publication number: 20120172477
    Abstract: A photocurable adhesive composition is provided, which comprises: a) a (meth)acrylate oligomer having one or more functional groups, b) a mono-functional monomer, a multi-functional monomer, or a mixture thereof, c) a photoinitiator, and d) a plasticizer having a refractive index of no less than 1.48. The photocurable adhesive composition of the present invention has good light transmittance, high refractive index and appropriate flowability and softness, and is easy to be coated and adhered. The photocurable adhesive composition of the present invention can be applied to optical products and simplify the manufacture processes, and provide adhesion property while retaining good reworkability and optical properties.
    Type: Application
    Filed: December 30, 2011
    Publication date: July 5, 2012
    Inventors: CHI-YU HUANG, CHI-CHING LU, HSIUN-CHIA SHIH