Patents by Inventor Hsuan-Bin Huang
Hsuan-Bin Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10643818Abstract: A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. In the invention, the system is designed to improve the contamination particles from components in the load lock system of charged particle beam inspection tool and also to simplify its assembly.Type: GrantFiled: January 7, 2019Date of Patent: May 5, 2020Assignee: ASML Netherlands B.V.Inventors: Hsuan-Bin Huang, Chun-Liang Lu, Chin-Fa Tu, Wen-Sheng Lin, Youjin Wang
-
Publication number: 20190214225Abstract: A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. In the invention, the system is designed to improve the contamination particles from components in the load lock system of charged particle beam inspection tool and also to simplify its assembly.Type: ApplicationFiled: January 7, 2019Publication date: July 11, 2019Inventors: Hsuan-Bin HUANG, Chun-Liang LU, Chin-Fa TU, Wen-Sheng LIN, Youjin WANG
-
Publication number: 20190134462Abstract: In a ball movement state measuring system with a ball, a sensing module, a wireless communication module, a power supply and an induction coil, the speed, rotation speed, rotation axis and trace of the ball at first movement state are calculated based on first accelerated speed and first angular velocity of the ball at first movement state and first movement result is obtained by the processor. The speed, rotation speed, rotation axis and trace of the ball at second movement state are calculated based on speed and rotation axis of the ball at first movement state, second accelerated speed and environment parameter of the ball at second movement state and second movement result is obtained by the processor. The ball is forced by gravity, applied force and air resistance at first movement state, and the ball is forced by gravity, air resistance and centripetal force at second movement state.Type: ApplicationFiled: January 7, 2019Publication date: May 9, 2019Applicant: Jingletek Co., Ltd.Inventors: CHING-LUN LIN, YU-LIN WANG, YIN-LIN CHEN, HSIN-HSI LI, HONG-LIN CHEN, PEI-YIN TSAI, I-TAI WU, HSUAN-BIN HUANG
-
Patent number: 10262552Abstract: In a ball movement state measuring system with a ball, a sensing module, a wireless communication module, a power supply and an induction coil, the speed, rotation speed, rotation axis and trace of the ball at first movement state are calculated based on first accelerated speed and first angular velocity of the ball at first movement state and first movement result is obtained by the processor. The speed, rotation speed, rotation axis and trace of the ball at second movement state are calculated based on speed and rotation axis of the ball at first movement state, second accelerated speed and environment parameter of the ball at second movement state and second movement result is obtained by the processor. The ball is forced by gravity, applied force and air resistance at first movement state, and the ball is forced by gravity, air resistance and centripetal force at second movement state.Type: GrantFiled: August 18, 2016Date of Patent: April 16, 2019Inventors: Ching-Lun Lin, Yu-Lin Wang, Yin-Lin Chen, Hsin-Hsi Li, Hong-Lin Chen, Pei-Yin Tsai, I-Tai Wu, Hsuan-Bin Huang
-
Patent number: 10176967Abstract: A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. In the invention, the system is designed to improve the contamination particles from components in the load lock system of charged particle beam inspection tool and also to simplify its assembly.Type: GrantFiled: February 23, 2017Date of Patent: January 8, 2019Assignee: HERMES MICROVISION, INC.Inventors: Hsuan-Bin Huang, Chun-Liang Lu, Chin-Fa Tu, Wen-Sheng Lin, You-Jin Wang
-
Publication number: 20180240645Abstract: A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. In the invention, the system is designed to improve the contamination particles from components in the load lock system of charged particle beam inspection tool and also to simplify its assembly.Type: ApplicationFiled: February 23, 2017Publication date: August 23, 2018Inventors: HSUAN-BIN HUANG, CHUN-LIANG LU, CHIN-FA TU, WEN-SHENG LIN, YOU-JIN WANG
-
Publication number: 20180018901Abstract: In a ball movement state measuring system with a ball, a sensing module, a wireless communication module, a power supply and an induction coil, the speed, rotation speed, rotation axis and trace of the ball at first movement state are calculated based on first accelerated speed and first angular velocity of the ball at first movement state and first movement result is obtained by the processor. The speed, rotation speed, rotation axis and trace of the ball at second movement state are calculated based on speed and rotation axis of the ball at first movement state, second accelerated speed and environment parameter of the ball at second movement state and second movement result is obtained by the processor. The ball is forced by gravity, applied force and air resistance at first movement state, and the ball is forced by gravity, air resistance and centripetal force at second movement state.Type: ApplicationFiled: August 18, 2016Publication date: January 18, 2018Inventors: Ching-Lun Lin, Yu-Lin Wang, Yin-Lin Chen, Hsin-Hsi Li, Hong-Lin Chen, Pei-Yin Tsai, I-Tai Wu, Hsuan-Bin Huang
-
Patent number: 7868303Abstract: A patterning device handling apparatus for use in charged particle beam imaging is disclosed. The disclosed patterning device handling apparatus comprises a first gripping member and a second gripping member. The first gripping member is equipped with a plurality of first positioning projections, and the second gripping member is equipped with a plurality of second positioning projections. When the patterning device is held at one angle, the first positioning projections abut against one edge of the patterning device and the second positioning projections abut against the opposite edge of the patterning device. When the patterning device is held at another angle, the first positioning projections abut against two neighboring edges of the patterning device, and the second positioning projections abut against the other two neighboring edges of the patterning device. Therefore, the disclosed patterning device handling apparatus can hold the pattering device at different angles.Type: GrantFiled: October 10, 2008Date of Patent: January 11, 2011Assignee: Hermes Microvision, Inc.Inventors: You-Jin Wang, Hsuan-Bin Huang, Chung-Shih Pan
-
Patent number: 7838848Abstract: A patterning device holding apparatus includes a support platform unit with a plurality of first positioning projections and a gripper unit. The gripper unit includes a head portion and a plurality of second positioning projections disposed on the head portion, and a rolling member set at a base portion. The grapping and releasing of the patterning device is achieved by the rotation of the gripper unit about a pivot substantially parallel with the center axis of the rolling member. The first and second positioning projections corporately abut against the edges of a patterning device to fix the patterning device in place.Type: GrantFiled: October 23, 2008Date of Patent: November 23, 2010Assignee: Hermes Microvision, Inc.Inventors: Hsuan-Bin Huang, You-Jin Wang, Chung-Shih Pan
-
Publication number: 20100102226Abstract: A patterning device holding apparatus includes a support platform unit with a plurality of first positioning projections and a gripper unit. The gripper unit includes a head portion and a plurality of second positioning projections disposed on the head portion, and a rolling member set at a base portion. The grapping and releasing of the patterning device is achieved by the rotation of the gripper unit about a pivot substantially parallel with the center axis of the rolling member. The first and second positioning projections corporately abut against the edges of a patterning device to fix the patterning device in place.Type: ApplicationFiled: October 23, 2008Publication date: April 29, 2010Inventors: Hsuan-Bin HUANG, You-Jin Wang, Chung-Shih Pan
-
Publication number: 20100090107Abstract: A patterning device handling apparatus for use in charged particle beam imaging is disclosed. The disclosed patterning device handling apparatus comprises a first gripping member and a second gripping member. The first gripping member is equipped with a plurality of first positioning projections, and the second gripping member is equipped with a plurality of second positioning projections. When the patterning device is held at one angle, the first positioning projections abut against one edge of the patterning device and the second positioning projections abut against the opposite edge of the patterning device. When the patterning device is held at another angle, the first positioning projections abut against two neighboring edges of the patterning device, and the second positioning projections abut against the other two neighboring edges of the patterning device. Therefore, the disclosed patterning device handling apparatus can hold the pattering device at different angles.Type: ApplicationFiled: October 10, 2008Publication date: April 15, 2010Inventors: You-Jin WANG, Hsuan-Bin HUANG, Chung-Shih PAN