Patents by Inventor Hsuch Liang Liao

Hsuch Liang Liao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030048591
    Abstract: A method for desmearing pulse-type D.C. plasma and an apparatus for the method, the apparatus has a vacuum chamber for a vacuum pumping system to make the chamber a vacuum state. An electrode holder is provided in the vacuum chamber for a plurality of electrode plates separately mounted thereon in a line. The electrode plates use a pulse-type D.C. power supply as a source of energy for excitation of plasma. An electrode plate to be processed is located between every two electrode plates in a state of floating. A gas inlet system is provided in order that the aforesaid vacuum pumping and excitation of plasma can cooperatively make uniform distribution of reaction gas in the vacuum chamber to shorten the process flow and the operation time of desmearing in the holes of a printed circuit board and to lower the cost of equipment.
    Type: Application
    Filed: September 10, 2001
    Publication date: March 13, 2003
    Applicant: Saturn Vac Co., Ltd.
    Inventors: Robert Jann, Shyh-Horng Sheu, Hsuch Liang Liao