Patents by Inventor Hsueh-Fa LIN

Hsueh-Fa LIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180195216
    Abstract: A mesh fabric structure includes a lower layer of mesh fabric and an upper layer of mesh fabric. Each of the two mesh fabrics has multiple regularly arranged meshes. The upper and lower layers of mesh fabrics are up and down overlapped with each other. The meshes of the two mesh fabrics are up and down arranged corresponding to each other to form regular 2D figures on the mesh fabric structure. A mesh fabric material includes a substrate fabric, a middle layer and a facial fabric, which are overlapped with each other. Each of the substrate fabric and the facial fabric has multiple meshes. The middle layer has at least one hollow section. The meshes of the substrate fabric and the meshes of the facial fabric are arranged corresponding to each other through the hollow section to form a 2D figure in the hollow section.
    Type: Application
    Filed: January 9, 2018
    Publication date: July 12, 2018
    Inventor: Hsueh-Fa LIN