Patents by Inventor Hua-Ching Hsu

Hua-Ching Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6715338
    Abstract: An apparatus and a method for detecting a flammable gas in a gas mixture is provided. The apparatus includes a chamber that is equipped with an igniting device and a temperature sensor such that a flammable gas fed into the chamber may be ignited and that a temperature rise in the chamber cavity may be detected. A signal responding to the temperature rise is sent to a process controller such that a valve means for feeding the gas mixture into the system can be switched over to an ambient air supply for purging out the system and for avoiding the danger of explosion or fire. The apparatus and method are particularly suitable for detecting a flammable gas in an exhaust gas mixture of a semiconductor fabrication machine, however, they may also be used in detecting flammable gases in any other processing equipment which generates an effluent gas flow.
    Type: Grant
    Filed: August 28, 1998
    Date of Patent: April 6, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventor: Hua Ching Hsu
  • Patent number: 6280696
    Abstract: A method for removing high boiling point volatile organic compounds from an exhaust gas and an apparatus for performing such operation are described. In the method, a wet scrubber is provided which is equipped with a spent water reservoir at the bottom of the scrubber for collecting spent water that contains the volatile organic compounds dissolved in water used to wash the exhaust gas. An ozone gas at a preset concentration is then flown into the spent water to oxidize the dissolved volatile organic compounds contained in the water. The exhaust gas after being washed in the wet scrubber can be released to the atmosphere together with carbon dioxide generated in the oxidation reaction. In the apparatus, an ozone detector is further provided on the exhaust gas outlet in the wet scrubber chamber to verify a content of ozone in the released exhaust gas which is an indication that all the volatile organic compounds have been oxidized in the spent water reservoir.
    Type: Grant
    Filed: April 5, 2000
    Date of Patent: August 28, 2001
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd
    Inventors: Hua-Ching Hsu, Ta-Tien Hsiang
  • Patent number: 5907895
    Abstract: The present invention provides a wafer tweezer assembling device by utilizing a chuck member and a plurality of tweezer blades separated by spacers having a predetermined thickness such that the mounting and the calibration of the tweezer can be accomplished in one operation without the need of further calibration steps after the assembling process.
    Type: Grant
    Filed: March 3, 1997
    Date of Patent: June 1, 1999
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chi Fu Yu, Hua Ching Hsu