Abstract: A method according to an embodiment includes obtaining calibration measurement data, with an optical detection apparatus, from a plurality of marker structure sets provided on a calibration substrate. Each marker structure set includes at least one calibration marker structure created using different known values of the process parameter. The method includes obtaining measurement data, with the optical detection apparatus, from at least one marker structure provided on a substrate and exposed using an unknown value of the process parameter; and determining the unknown value of the process parameter from the obtained measurement data by employing regression coefficients in a model based on the known values of the process parameter and the calibration measurement data.

Abstract: A method according to an embodiment includes obtaining calibration measurement data, with an optical detection apparatus, from a plurality of marker structure sets provided on a calibration substrate. Each marker structure set includes at least one calibration marker structure created using different known values of the process parameter. The method includes obtaining measurement data, with the optical detection apparatus, from at least one marker structure provided on a substrate and exposed using an unknown value of the process parameter; and determining the unknown value of the process parameter from the obtained measurement data by employing regression coefficients in a model based on the known values of the process parameter and the calibration measurement data.

Abstract: Without changing the initial illumination setting and resist process condition, a method according to one embodiment includes manipulating the design shape by application of additional and non-printable assist features (“sub-resolution assist features” or “SRAF”), such that CD sensitivities of the pattern feature are minimized. The SRAF may comprise chrome dots, or any other design objects of different sizes, shapes, and/or types, which can modulate the intensity and/or phase of the original pattern. to minimize an aberration sensitivity of selected ones of the plurality of pattern features A pattern that was not designed to include SRAF may be modified to include SRAF. In such a method, one or more aspects of the assist features are selected to reduce the aberration-induced image variation for a pattern and its sensitivity to aberrations.

Abstract: The invention relates to an arrangement for reverse-stranding (SZ-stranding) at least one stranding element of a cable, in particular a stranding element containing a beam waveguide, about a central element, a laying device being arranged between the oscillating lay plate and the fixed lay plate, which laying device takes up and pays out a lay of the stranding element at alternating periods, and comprises a stress controller for evening out the pull-off speed from the supply reel, which is arranged between the fixed lay plate and the supply reel.

Abstract: The invention relates to a communications cable which is assembled of at least one basic bundle of at least three component conductors each being formed of two SZ stranded pairs or quads of wires and a portion of the component conductors in the group being radially transposed across each other. The invention also relates to a method of and a device for manufacturing such a cable.

Abstract: A plurality of elongated elements is maintained at a distance from one another by a spacing element, joined together at an inlet nipple, and twisted in the same twisting direction at a constant twisting speed by a twisting head located downstream of the inlet nipple, to emerge from the twisting head through an outlet nipple. The distance of the spacing element from the inlet nipple is cyclically varied by displacing the spacing element at a displacement speed which is lower than the advancement speed of the elements. The displacement speed is increased to the advancement speed during the displacement of the spacing element from a terminal position of a trajectory of displacement of the separating element which is more remote from the twisting head than the other terminal position, in a section of the trajectory having a length which is a predetermined fraction of the length of the trajectory.