Patents by Inventor Hugo John Miller, III

Hugo John Miller, III has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wafer cleaning apparatus
    Patent number: 6345404
    Abstract: An apparatus for cleaning a wafer oriented vertically is provided. The apparatus includes a first brush and a second brush located horizontally from the first brush. During use, a wafer is oriented vertically the first and second brushes. The brushes are brought into contact with the wafer and rotated thereby engaging the wafer with rollers. By rotating the rollers, the wafer is also rotated. Liquid is sprayed towards the brushes and wafer. By orienting the wafer vertically, liquid and particulates contained therein readily fall from the water due to gravity. This is particularly advantageous when cleaning larger diameter wafers in which particulates must be removed from a larger wafer surface area.
    Type: Grant
    Filed: November 15, 1999
    Date of Patent: February 12, 2002
    Assignee: Lam Research Corporation
    Inventors: Donald Edgar Stephens, Oliver David Jones, Hugo John Miller, III
  • Method of cleaning semiconductor wafers and other substrates
    Patent number: 6143089
    Abstract: A method and apparatus for cleaning a wafer oriented vertically is provided. The apparatus includes a first brush and a second brush located horizontally from the first brush. During use, a wafer is orientated vertically between the first and second brushes. The brushes are brought into contact with the wafer and rotated thereby engaging the wafer with rollers. By rotating the rollers, the wafer is also rotated. Liquid is sprayed towards the brushes and wafer. By orienting the wafer vertically, liquid and particulates contained therein readily fall from the wafer due to gravity. This is particularly advantageous when cleaning larger diameter wafers in which particulates must be removed from a larger wafer surface area.
    Type: Grant
    Filed: July 29, 1998
    Date of Patent: November 7, 2000
    Assignee: Lam Research Corporation
    Inventors: Donald Edgar Stephens, Oliver David Jones, Hugo John Miller, III
  • Wafer cleaning apparatus
    Patent number: 5875507
    Abstract: An apparatus for cleaning a wafer oriented vertically is provided. The apparatus includes a first brush and a second brush located horizontally from the first brush. During use, a wafer is orientated vertically between the first and second brushes. The brushes are brought into contact with the wafer and rotated thereby engaging the wafer with rollers. By rotating the rollers, the wafer is also rotated. Liquid is sprayed towards the brushes and wafer. By orienting the wafer vertically, liquid and particulates contained therein readily fall from the wafer due to gravity. This is particularly advantageous when cleaning larger diameter wafers in which particulates must be removed from a larger wafer surface area.
    Type: Grant
    Filed: July 15, 1996
    Date of Patent: March 2, 1999
    Assignee: Oliver Design, Inc.
    Inventors: Donald Edgar Stephens, Oliver David Jones, Hugo John Miller, III