Abstract: A method includes generating a schematic of an integrated circuit (IC), the IC having a circuit component. The method also includes searching a database having one or more configurations of the circuit component, each of the one or more configurations of the circuit component having a corresponding estimated resistance capacitance (RC) value and an assigned color scheme based on the estimated RC value. The method further includes displaying the circuit component in the schematic as a symbol representing the circuit component, the symbol representing the circuit component being displayed having the assigned color scheme of a selected circuit component configuration.

Abstract: A structure and method for cooling a three-dimensional integrated circuit (3DIC) are provided. A cooling element is configured for thermal connection to the 3DIC. The cooling element includes a plurality of individually controllable cooling modules disposed at a first plurality of locations relative to the 3DIC. Each of the cooling modules includes a cold pole and a heat sink. The cold pole is configured to absorb heat from the 3DIC. The heat sink is configured to dissipate the heat absorbed by the cold pole and is coupled to the cold pole via an N-type semiconductor element and via a P-type semiconductor element. A temperature sensing element includes a plurality of thermal monitoring elements disposed at a second plurality of locations relative to the 3DIC for measuring temperatures at the second plurality of locations. The measured temperatures control the plurality of cooling modules.

Abstract: A semiconductor structure includes a first conductive path and a second conductive path configured to carry a first pair of differential signals representative of an in-phase signal. The semiconductor device further includes a third conductive path and a fourth conductive path configured to carry a second pair of differential signals representative of a quadrature signal corresponding to the in-phase signal. The first and second conductive paths are in a conductive layer of the semiconductor structure, and the third and fourth conductive paths are in another conductive layer of the semiconductor structure.

Abstract: A method comprises: receiving a circuit design comprising networks of first devices fabricated by a first fabrication process; selecting second devices to be fabricated by a second process; substituting the second devices for the first devices in the networks of the circuit design; sorting the second devices within a selected one of the networks by device area from a largest device area to a smallest device area; and assigning each second device in the selected network to be fabricated in a respective tier of a plurality of tiers of a three dimensional integrated circuit (3D IC) for which a total area of second devices previously assigned to said respective tier is the smallest, the second devices being assigned sequentially according to the sorting.

Abstract: A method includes generating a schematic of an integrated circuit (IC), the IC having a circuit component. The method also includes searching a database having one or more configurations of the circuit component, each of the one or more configurations of the circuit component having a corresponding estimated resistance capacitance (RC) value and an assigned color scheme based on the estimated RC value. The method further includes displaying the circuit component in the schematic as a symbol representing the circuit component, the symbol representing the circuit component being displayed having the assigned color scheme of a selected circuit component configuration.

Abstract: An apparatus includes a first tier and a second tier. The second tier is above the first tier. The first tier includes a first cell. The second tier includes a second cell and a third cell. The third cell includes a first inter layer via (ILV) to couple the first cell in the first tier to the second cell in the second tier. The third cell further includes a second ILV, the first ILV and the second ILV are extended along a first direction. The first tier further includes a fourth cell. The second tier further includes a fifth cell. The second ILV of the third cell is arranged to connect the fourth cell of the first tier with the fifth cell of the second tier. In some embodiments, the second tier further includes a spare cell including a spare ILV for engineering change order (ECO) purpose.

Abstract: A method of generating, based on a first netlist of an integrated circuit, a second netlist includes generating layout geometry parameters for at least a portion of the first netlist of the integrated circuit, the portion including a first device. A third netlist is generated based on the first netlist and the layout geometry parameters. A description in the third netlist for modeling the first device is decomposed into a description in a fourth netlist for modeling a plurality of secondary devices. The second netlist is generated based on the fourth netlist.

Abstract: A method comprises generating a schematic of an integrated circuit (IC), the IC having a circuit component. The method also comprises searching a database having one or more configurations of the circuit component, each of the one or more configurations of the circuit component having a corresponding estimated resistance capacitance (RC) value and an assigned color scheme based on the estimated RC value. The method further comprises displaying the circuit component in the schematic as a symbol representing the circuit component, the symbol representing the circuit component being displayed having the assigned color scheme of a selected circuit component configuration. The method additionally comprises displaying a layout of the IC based on a determination that the schematic passed a design rule check, the displayed layout of the IC including the selected configuration of the circuit component, the selected configuration being displayed in the layout having the assigned color scheme.

Abstract: A method for back-end-of-line variation modeling is provided. A bounding box is defined within a design layout. A back-end-of-line variation parameter is determined for the bounding box. The back-end-of-line variation parameter is applied as a constraint for simulation of the design layout.

Abstract: An apparatus includes a first tier and a second tier. The second tier is above the first tier. The first tier includes a first cell. The second tier includes a second cell and a third cell. The third cell includes a first ILV to couple the first cell in the first tier to the second cell in the second tier. The third cell further includes a second ILV, the first ILV and the second ILV are extended along a first direction. The first tier further includes a fourth cell. The second tier further includes a fifth cell. The second ILV of the third cell is arranged to connect the fourth cell of the first tier with the fifth cell of the second tier. In some embodiments, the second tier further includes a spare cell including a spare ILV for ECO purpose.

Abstract: A non-transitory, computer readable storage medium is encoded with computer program instructions, such that, when the computer program instructions are executed by a computer, the computer performs a method. The method generates mask assignment information for forming a plurality of patterns on a layer of an integrated circuit (IC) by multipatterning. The mask assignment information includes, for each of the plurality of patterns, a mask assignment identifying which of a plurality of masks is to be used to form that pattern, and a mask assignment lock state for that pattern. User inputs setting the mask assignment of at least one of the plurality of patterns, and its mask assignment lock state are received. A new mask assignment is generated for each of the plurality of patterns having an “unlocked” mask assignment lock state.

Abstract: A method comprises grouping sub-components based on an association between the sub-components and connections coupled to the sub-components. The method also comprises determining a total ratio area per group based on normalized ratio units of the sub-components. The method further comprises identifying a priority group based on a ranking of the groups, the ranking being based on the total area per group. The method also comprises assigning, by a priority assignment process, a first color scheme or a second color scheme to the sub-components included in the priority group. The method further comprises assigning, by an other assignment process, the first color scheme or the second color scheme to the remainder of the sub-components. At least the other assignment process is based on a balancing of a first total area of sub-components having the first color scheme with a second total area of sub-components having the second color scheme.

Abstract: A method of making a three-dimensional (3D) integrated circuit (IC) includes performing a series of simulations of operations of a first die of the 3DIC in response to a corresponding series of input vectors and at least one environment temperature. The method also includes adjusting, for at least one simulation in the series of simulations, the at least one environment temperature based on an operational temperature profile of a second die of the 3DIC.

Abstract: Interposer and semiconductor package embodiments provide for the isolation and suppression of electronic noise such as EM emissions in the semiconductor package. The interposer includes shield structures in various embodiments, the shield structures blocking the electrical noise from the noise source, from other electrical signals or devices. The shields include solid structures and some embodiments and decoupling capacitors in other embodiments. The coupling structures includes multiple rows of solder balls included in strips that couple the components and surround and contain the source of electrical noise.

Abstract: A method for fabricating an inductor structure having an increased quality factor (Q) is provided. In one embodiment, a substrate is provided and a plurality of metal layers are formed on the substrate. A spirally patterned conductor layer is formed over and in the substrate and in the metal layers to produce a planar spiral inductor. A via hole is formed over and in the substrate and in the metal layers within the spirally patterned conductor layer, the via hole being formed by a through silicon via (TSV) process. Thereafter, the via hole is filled with a core layer, wherein the core layer extends from a bottom surface of the substrate to a top surface of the metal layers.

Abstract: A method for back-end-of-line variation modeling is provided. A bounding box is defined within a design layout. A back-end-of-line variation parameter is determined for the bounding box. The back-end-of-line variation parameter is applied as a constraint for simulation of the design layout.

Abstract: A method comprises grouping sub-components based on an association between the sub-components and connections coupled to the sub-components. The method also comprises determining a total ratio area per group based on normalized ratio units of the sub-components. The method further comprises identifying a priority group based on a ranking of the groups, the ranking being based on the total area per group. The method also comprises assigning, by a priority assignment process, a first color scheme or a second color scheme to the sub-components included in the priority group. The method further comprises assigning, by an other assignment process, the first color scheme or the second color scheme to the remainder of the sub-components. At least the other assignment process is based on a balancing of a first total area of sub-components having the first color scheme with a second total area of sub-components having the second color scheme.

Abstract: Interposer and semiconductor package embodiments provide for the isolation and suppression of electronic noise such as EM emissions in the semiconductor package. The interposer includes shield structures in various embodiments, the shield structures blocking the electrical noise from the noise source, from other electrical signals or devices. The shields include solid structures and some embodiments and decoupling capacitors in other embodiments. The coupling structures includes multiple rows of solder balls included in strips that couple the components and surround and contain the source of electrical noise.

Abstract: A method of designing a semiconductor device is performed by at least one processor. In the method, a first environment temperature for a first substrate is determined based on an operational temperature of a second substrate, the first and second substrates stacked one upon another in the semiconductor device. An operation of at least one first circuit element in the first substrate is simulated based on the first environment temperature.

Abstract: A method comprises generating a schematic of an integrated circuit (IC), the IC having a circuit component. The method also comprises searching a database having one or more configurations of the circuit component, each of the one or more configurations of the circuit component having a corresponding estimated resistance capacitance (RC) value and an assigned color scheme based on the estimated RC value. The method further comprises displaying the circuit component in the schematic as a symbol representing the circuit component, the symbol representing the circuit component being displayed having the assigned color scheme of a selected circuit component configuration. The method additionally comprises displaying a layout of the IC based on a determination that the schematic passed a design rule check, the displayed layout of the IC including the selected configuration of the circuit component, the selected configuration being displayed in the layout having the assigned color scheme.