Patents by Inventor Huibert Visser
Huibert Visser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8164740Abstract: A coherence remover is provided. In an embodiment the coherence remover includes a first mirror and a second mirror coupled to the first mirror. The coherence remover is configured to receive an input beam. Each of the first and second mirrors is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam.Type: GrantFiled: December 4, 2008Date of Patent: April 24, 2012Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Huibert Visser, Jacob Fredrik Friso Klinkhamer, Lev Ryzhikov, Scott D. Coston, Adel Joobeur, Rob Vink, Yevgeniy Shmarev
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Patent number: 8159651Abstract: A coherence remover includes a first partially reflective surface and a second partially reflective surface. The coherence remover is configured to receive an input beam. Each of the first and second reflective surfaces is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam.Type: GrantFiled: December 4, 2008Date of Patent: April 17, 2012Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Huibert Visser, Jacob Fredrik Friso Klinkhamer, Lev Ryzhikov, Scott D. Coston, Adel Joobeur, Rob Vink, Yevgeniy Shmarev
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Publication number: 20110194096Abstract: A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.Type: ApplicationFiled: March 8, 2011Publication date: August 11, 2011Applicant: ASML Netherlands B.V.Inventors: Herman BOOM, Borgert Kruizinga, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Huibert Visser, Peter Julian Pollard
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Patent number: 7969549Abstract: A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.Type: GrantFiled: June 30, 2006Date of Patent: June 28, 2011Assignee: ASML Netherlands B.V.Inventors: Herman Boom, Borgert Kruizinga, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Huibert Visser, Peter Julian Pollard
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Patent number: 7948606Abstract: A system and method are used to form incoherent beams from at least a partially coherent beam, such that interference or speckle patterns are substantially eliminated. A rotating optical element directs the partially coherent beam to reflect from an angular distribution changing element to form an incoherent beam. The partially coherent beam can be directed at varying angles or positions onto the angular distribution changing element through rotation of the rotating optical element. The angles can vary as a function of time.Type: GrantFiled: April 13, 2006Date of Patent: May 24, 2011Assignee: ASML Netherlands B.V.Inventors: Huibert Visser, Johannes Jacobus Matheus Baselmans, Pieter Willem Herman De Jager, Henri Johannes Petrus Vink
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Patent number: 7826037Abstract: A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.Type: GrantFiled: August 30, 2007Date of Patent: November 2, 2010Assignee: ASML Netherlands B.V.Inventors: Huibert Visser, Oscar Franciscus Jozephus Noordman, Henri Johannes Petrus Vink, Marcus Gerhardus Hendrikus Meijerink, Koenraad Remi André Maria Schreel, Cornelis Cornelia De Bruijn
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Patent number: 7768627Abstract: A lithographic apparatus in which beams of radiation are projected onto an array of individually controllable elements, such that the beams interfere. Radiation that is further modulated by the array of individually controllable elements is projected onto a substrate.Type: GrantFiled: June 14, 2007Date of Patent: August 3, 2010Assignee: ASML Netherlands B.V.Inventors: Huibert Visser, Hedser Van Brug
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Patent number: 7738079Abstract: A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.Type: GrantFiled: November 14, 2006Date of Patent: June 15, 2010Assignee: ASML Netherlands B.V.Inventors: Oscar Franciscus Jozephus Noordman, Henri Johannes Petrus Vink, Huibert Visser
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Patent number: 7714986Abstract: A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.Type: GrantFiled: May 24, 2007Date of Patent: May 11, 2010Assignee: ASML Netherlands B.V.Inventors: Huibert Visser, Pieter Willem Herman De Jager, Henri Johannes Petrus Vink, Marcus Gerhardus Hendrikus Meijerink
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Patent number: 7714305Abstract: Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.Type: GrantFiled: March 9, 2006Date of Patent: May 11, 2010Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Huibert Visser, David William Callan, Robert-Han Munnig Schmidt, George Howard Robbins
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Patent number: 7649676Abstract: A system and method are used to form an unpolarized light beam from a polarized light beam. A system comprises a source of radiation and a unpolarizing system. The source of radiation produces a linear polarized beam. The unpolarizing system has first and second optical paths and splits the linear polarized beam. A first portion of the split beam travels along the first optical path having a first path length. A second portion of the split beam travels along the second optical path having a second, different path length. The first and second portions of the split beam are combined to form the unpolarized beam.Type: GrantFiled: June 14, 2006Date of Patent: January 19, 2010Assignee: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus Baselmans, Huibert Visser
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Patent number: 7626181Abstract: Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.Type: GrantFiled: December 9, 2005Date of Patent: December 1, 2009Assignee: ASML Netherlands B.V.Inventor: Huibert Visser
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Publication number: 20090244506Abstract: Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.Type: ApplicationFiled: December 22, 2008Publication date: October 1, 2009Applicant: ASML Netherlands B.VInventors: Huibert Visser, Martinus Hendricus Hendricus Hoeks, Borgert Kruizinga, Bob Streefkerk, Patricius Aloysius Jacobus Tinnemans, Erwin John Van Zwet, Roeland Nicolaas Maria Vanneer, Marcus Gerhardus Hendrikus Meijerink, Nicolaas Cornelis Johannes Van Der Valk, Har Van Himbergen
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Publication number: 20090201483Abstract: Apparatus and methods are used to control a polarization state of a radiation beam. A polarization control unit is configured to modulate a polarization state of at least a part of a radiation beam. A determination arrangement is configured to subsequently determine the polarization state of the at least a part of the radiation beam. A feedback unit is configured to provide signals to the polarization control arrangement based on at least the determined polarization state in order to correct for deviation in the polarization state of the part of the radiation beam from a desired polarization state. For example, the correction may ensure that the polarization state of the part of the radiation beam is at, or returns to, the desired polarization state.Type: ApplicationFiled: January 12, 2009Publication date: August 13, 2009Applicant: ASML Netherlands B.V.Inventors: Marcel Henk Andre JANSSENS, Oscar Franciscus Jozephus NOORDMAN, Huibert VISSER, Evert NIEUWKOOP
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Publication number: 20090168072Abstract: A coherence remover includes a first partially reflective surface and a second partially reflective surface. The coherence remover is configured to receive an input beam. Each of the first and second reflective surfaces is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam.Type: ApplicationFiled: December 4, 2008Publication date: July 2, 2009Applicant: ASML Netherlands B.V. and ASML Holding N.V.Inventors: Huibert VISSER, Jacob Fredrik Friso Klinkhamer, Lev Ryzhikov, Scott D. Coston, Adel Joobeur, Rob Vink, Yevgeniy Shmarev
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Publication number: 20090091734Abstract: A coherence remover is provided. In an embodiment the coherence remover includes a first mirror and a second mirror coupled to the first mirror. The coherence remover is configured to receive an input beam. Each of the first and second mirrors is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam.Type: ApplicationFiled: December 4, 2008Publication date: April 9, 2009Applicant: ASML Netherlands B.V. and ASML Holding N.V.Inventors: Huibert VISSER, Jacob Fredrik Friso Klinkhamer, Lev Ryzhikov, Scott D. Coston, Adel Joobeur, Henri Johannes Petrus Vink, Yevgeniy Konstantinovich Shmarev
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Publication number: 20080309906Abstract: A lithographic apparatus in which beams of radiation are projected onto an array of individually controllable elements, such that the beams interfere. Radiation that is further modulated by the array of individually controllable elements is projected onto a substrate.Type: ApplicationFiled: June 14, 2007Publication date: December 18, 2008Applicant: ASML Netherlands B.V.Inventors: Huibert Visser, Hedser Van Brug
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Publication number: 20080291417Abstract: A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.Type: ApplicationFiled: May 24, 2007Publication date: November 27, 2008Applicant: ASML Netherlands B.V.Inventors: Huibert Visser, Pieter Willem Herman De Jager, Henri Johannes Petrus Vink, Marcus Gerhardus Hendrikus Meijerink
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Publication number: 20080112030Abstract: A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.Type: ApplicationFiled: November 14, 2006Publication date: May 15, 2008Applicant: ASML Netherlands B.V.Inventors: Oscar Franciscus Jozephus Noordman, Henri Johannes Petrus Vink, Huibert Visser
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Publication number: 20080111981Abstract: A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.Type: ApplicationFiled: August 30, 2007Publication date: May 15, 2008Applicant: ASML Netherlands B.V.Inventors: Huibert VISSER, Oscar Franciscus Jozephus Noordman, Henri Johannes Petrus Vink, Marcus Gerhardus Hendrikus Meijerink, Koenraad Remi Andre Maria Schreel, Cornelis Cornelia De Bruijn