Patents by Inventor Hung-Chia CHOU

Hung-Chia CHOU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10591816
    Abstract: The invention provides a photosensitive resin composition, a color filter, and a liquid crystal display element thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a black pigment (E). The compound (B) having an ethylenically unsaturated group contains a compound (B-1) having an acidic group and at least three ethylenically unsaturated groups. The photoinitiator (C) includes a photoinitiator (C-1) represented by formula (1).
    Type: Grant
    Filed: October 15, 2015
    Date of Patent: March 17, 2020
    Assignee: Chi Mei Corporation
    Inventors: Hao-Wei Liao, Yu-Jie Tsai, Hung-Chia Chou
  • Publication number: 20170235224
    Abstract: The invention provides a photosensitive resin composition, a color filter, and a liquid crystal display element thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a black pigment (E). The compound (B) having an ethylenically unsaturated group contains a compound (B-1) having an acidic group and at least three ethylenically unsaturated groups. The photoinitiator (C) includes a photoinitiator (C-1) represented by formula (1).
    Type: Application
    Filed: October 15, 2015
    Publication date: August 17, 2017
    Applicant: Chi Mei Corporation
    Inventors: Hao-Wei Liao, Yu-Jie Tsai, Hung-Chia Chou
  • Publication number: 20170003586
    Abstract: The invention relates to a photosensitive resin composition for black matrix, a color filter formed by the black matrix, and a liquid crystal display element. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing an ethylenically unsaturated group (B), a photoinitiator (C), a solvent (D), a black pigment (E), and a compound (F) containing Formula (1). The photosensitive resin composition for black matrix has the advantage of good linearity of pattern with high finesse.
    Type: Application
    Filed: June 28, 2016
    Publication date: January 5, 2017
    Inventors: HAO-WEI LIAO, HUNG-CHIA CHOU
  • Publication number: 20160011509
    Abstract: A photosensitive resin composition capable of forming a black matrix having good adhesion and good hardness, a black matrix, a color filter and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a hyperbranched polymer (D), a solvent (E), and a black pigment (F). The alkali-soluble resin (A) includes a first alkali-soluble resin (A-1) represented by formula (1). The hyperbranched polymer (D) is formed by reacting a multi-mercapto compound and a multi-functional (meth)acrylate.
    Type: Application
    Filed: September 25, 2015
    Publication date: January 14, 2016
    Inventors: Hao-Wei Liao, Hung-Chia Chou
  • Publication number: 20150370162
    Abstract: The present invention relates to a photosensitive resin composition for black matrix and an application thereof. The aforementioned photosensitive resin composition includes an alkali-soluble resin (A), a compound having an unsaturated vinyl group (B), a photo-initiator (C), a solvent (D), a black pigment (E) and a fluorescent brightening agent (F). The aforementioned alkali-soluble resin (A) includes a resin having an unsaturated group (A-1), and the resin having the unsaturated group (A-1) is obtained by polymerizing a mixture, and the mixture comprises an epoxy compound having at least two epoxy groups (a-1-1) and a compound having at least one carboxylic group and at least one vinyl unsaturated group (a-1-2).
    Type: Application
    Filed: June 2, 2015
    Publication date: December 24, 2015
    Inventors: Hung-Chia CHOU, Hao-Wei LIAO