Patents by Inventor Hung-Ting Lu

Hung-Ting Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240136117
    Abstract: A multi-phase coupled inductor includes a first iron core, a second iron core, and a plurality of coil windings. The first iron core includes a first body and a plurality of first core posts. The plurality of first core posts are connected to the first body. The second iron core is opposite to the first iron core. The second iron core and the first body are spaced apart from each other by a gap. The plurality of coil windings wrap around the plurality of first core posts, respectively. Each of the coil windings has at least two coils.
    Type: Application
    Filed: October 1, 2023
    Publication date: April 25, 2024
    Inventors: HUNG-CHIH LIANG, PIN-YU CHEN, HANG-CHUN LU, YA-WEN YANG, YU-TING HSU, WEI-ZHI HUANG
  • Patent number: 11916091
    Abstract: A backside illumination (BSI) image sensor and a method of forming the same are provided. A device includes a substrate and a plurality of photosensitive regions in the substrate. The substrate has a first side and a second side opposite to the first side. The device further includes an interconnect structure on the first side of the substrate, and a plurality of recesses on the second side of the substrate. The plurality of recesses extend into a semiconductor material of the substrate.
    Type: Grant
    Filed: April 15, 2021
    Date of Patent: February 27, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hung-Wen Hsu, Jiech-Fun Lu, Yeur-Luen Tu, U-Ting Chen, Shu-Ting Tsai, Hsiu-Yu Cheng
  • Patent number: 8954899
    Abstract: The present disclosure describes a method of calibrating a contour. The method includes designing an anchor pattern, printing the anchor pattern on a substrate, collecting scanning electron microscope (SEM) data of the printed anchor pattern on the substrate, wherein the SEM data includes a SEM image of the printed anchor pattern on the substrate, converting the SEM image of the printed anchor pattern on the substrate into a SEM contour of the printed anchor pattern, analyzing the SEM contour of the printed anchor pattern, and aligning the SEM contour of the anchor pattern to form the calibrated SEM contour.
    Type: Grant
    Filed: October 4, 2012
    Date of Patent: February 10, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ping-Chieh Wu, Tzu-Chin Lin, Hung-Ting Lu, Wen-Chun Huang, Ru-Gun Liu
  • Publication number: 20140101624
    Abstract: The present disclosure describes a method of calibrating a contour. The method includes designing an anchor pattern, printing the anchor pattern on a substrate, collecting scanning electron microscope (SEM) data of the printed anchor pattern on the substrate, wherein the SEM data includes a SEM image of the printed anchor pattern on the substrate, converting the SEM image of the printed anchor pattern on the substrate into a SEM contour of the printed anchor pattern, analyzing the SEM contour of the printed anchor pattern, and aligning the SEM contour of the anchor pattern to form the calibrated SEM contour.
    Type: Application
    Filed: October 4, 2012
    Publication date: April 10, 2014
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ping-Chieh Wu, Tzu-Chin Lin, Hung-Ting Lu, Wen-Chun Huang, Ru-Gun Liu