Patents by Inventor Hwa-Chang Seo

Hwa-Chang Seo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11988907
    Abstract: An electric field-controlled refractive index tunable device includes a phase change correlated transition metal oxide layer, and E-field responsive charge dopants. The E-field responsive charge dopants either accumulate in the phase change correlated transition metal oxide layer or are depleted from the phase change correlated transition metal oxide layer in response to an E-field applied to the phase change correlated transition metal oxide layer.
    Type: Grant
    Filed: March 25, 2021
    Date of Patent: May 21, 2024
    Assignee: HRL LABORATORIES, LLC
    Inventors: Kyung-Ah Son, Jeong-Sun Moon, Hwa Chang Seo, Richard M. Kremer, Ryan G. Quarfoth
  • Publication number: 20240136429
    Abstract: A transition metal dichalcogenide (TMD) transistor includes a substrate, an n-type two-dimensional (2D) TMD layer, a metal source electrode, a metal drain electrode, and a gate dielectric. The substrate has a top portion that is an insulating layer, and the n-type 2D TMD layer is on the insulating layer. The metal source electrode, the metal drain electrode, and the gate dielectric are on the n-type 2D TMD layer. The metal gate electrode is on top of the gate dielectric and is between the metal source electrode and the metal drain electrode.
    Type: Application
    Filed: October 18, 2022
    Publication date: April 25, 2024
    Applicant: HRL Laboratories, LLC
    Inventors: Kyung-Ah SON, Jeong-Sun MOON, Hwa Chang SEO
  • Patent number: 11808937
    Abstract: A method of providing a spatial light modulator comprising: providing a substrate; providing a first phase change material cell on the substrate, the first phase change material cell comprising: a first electrical heater on the substrate; a first optical reflector layer on the electrical heater; and a first phase change material layer on the optical reflector layer; and providing at least a second phase change material cell on the substrate, the second phase change material cell comprising: a second electrical heater on the substrate; a second optical reflector layer on the second electrical heater; a second phase change material layer on the second optical reflector layer; and providing a light absorber layer between the first phase change material cell and the second phase change material cell.
    Type: Grant
    Filed: October 27, 2021
    Date of Patent: November 7, 2023
    Assignee: HRL LABORATORIES, LLC
    Inventors: Jeong-Sun Moon, Hwa Chang Seo, Kyung-Ah Son, Kangmu Lee
  • Patent number: 11788183
    Abstract: A process enables growing thick stoichiometric crystalline and preferably IR-transparent optical PCMO material on Si and other substrates. Sputter deposition is carried out in oxygen-free inert gas (e.g., Ar) environment, which helps to prevent decomposition of the PCMO material over the substrate. In the disclosed process, there is no need to add a seed layer prior to PCMO deposition. Moreover, no post-deposition annealing is needed in a high-temperature and high-pressure oxygen furnace, but an anneal provides certain additional benefits in terms of improved transparency at IR wavelengths. Over a long deposition time for a thick PCMO film on the high temperature (?450° C.) substrates, the PCMO deposition is made repeated cycles of deposition of the PCMO material at the high temperature, each deposition cycle being followed by cooling the PCMO-deposited substrate to a substantially lower temperature (<50° C.).
    Type: Grant
    Filed: March 19, 2021
    Date of Patent: October 17, 2023
    Assignee: HRL LABORATORIES, LLC
    Inventors: Kyung-Ah Son, Jeong-Sun Moon, Hwa Chang Seo, Richard M. Kremer, Ryan G. Quarfoth, Jack A. Crowell, Mariano J. Taboada, Joshua M. Doria, Terry B. Welch
  • Patent number: 11569367
    Abstract: A field effect transistor includes a substrate, a passivation layer on the substrate forming a passivated substrate, wherein the passivation layer is inert to XeF2, and a graphene lateral heterostructure field effect transistor (LHFET) on the passivated substrate.
    Type: Grant
    Filed: April 27, 2021
    Date of Patent: January 31, 2023
    Assignee: HRL LABORATORIES, LLC
    Inventors: Kyung-Ah Son, Jeong-Sun Moon, Hwa Chang Seo
  • Publication number: 20220389561
    Abstract: A process enables growing thick stoichiometric crystalline and preferably IR-transparent optical PCMO material on Si and other substrates. Sputter deposition is carried out in oxygen-free inert gas (e.g., Ar) environment, which helps to prevent decomposition of the PCMO material over the substrate. In the disclosed process, there is no need to add a seed layer prior to PCMO deposition. Moreover, no post-deposition annealing is needed in a high-temperature and high-pressure oxygen furnace, but an anneal provides certain additional benefits in terms of improved transparency at IR wavelengths. Over a long deposition time for a thick PCMO film on the high temperature (?450° C.) substrates, the PCMO deposition is made repeated cycles of deposition of the PCMO material at the high temperature, each deposition cycle being followed by cooling the PCMO-deposited substrate to a substantially lower temperature (<50° C.).
    Type: Application
    Filed: August 18, 2022
    Publication date: December 8, 2022
    Applicant: HRL Laboratories, LLC
    Inventors: Kyung-Ah SON, Jeong-Sun MOON, Hwa Chang SEO, Richard M. KREMER, Ryan G. QUARFOTH, Jack A. CROWELL, Mariano J. TABOADA, Joshua M. DORIA, Terry B. WELCH
  • Patent number: 11222959
    Abstract: A Field Effect Transistor (FET) device and a method for manufacturing it are disclosed. The FET device contains a graphene layer, a composite gate dielectric layer disposed above the graphene layer, wherein the composite gate layer is passivated with fluorine, and a metal gate disposed above the composite gate dielectric layer. The method disclosed teaches how to manufacture the FET device.
    Type: Grant
    Filed: May 20, 2016
    Date of Patent: January 11, 2022
    Assignee: HRL Laboratories, LLC
    Inventors: Jeong-Sun Moon, Hwa Chang Seo
  • Patent number: 11187891
    Abstract: A spatial light modulator includes a substrate, a phase change material cell on the substrate, the phase change material cell including an electrical heater on the substrate, an optical reflector layer on the electrical heater, and a phase change material layer on the optical reflector layer.
    Type: Grant
    Filed: April 10, 2018
    Date of Patent: November 30, 2021
    Assignee: HRL Laboratories, LLC
    Inventors: Jeong-Sun Moon, Hwa Chang Seo, Kyung-Ah Son, Kangmu Lee
  • Publication number: 20210363629
    Abstract: A process enables growing thick stoichiometric crystalline and preferably IR-transparent optical PCMO material on Si and other substrates. Sputter deposition is carried out in oxygen-free inert gas (e.g., Ar) environment, which helps to prevent decomposition of the PCMO material over the substrate. In the disclosed process, there is no need to add a seed layer prior to PCMO deposition. Moreover, no post-deposition annealing is needed in a high-temperature and high-pressure oxygen furnace, but an anneal provides certain additional benefits in terms of improved transparency at IR wavelengths. Over a long deposition time for a thick PCMO film on the high temperature (?450° C.) substrates, the PCMO deposition is made repeated cycles of deposition of the PCMO material at the high temperature, each deposition cycle being followed by cooling the PCMO-deposited substrate to a substantially lower temperature (<50° C.).
    Type: Application
    Filed: March 19, 2021
    Publication date: November 25, 2021
    Applicant: HRL Laboratories, LLC
    Inventors: Kyung-Ah SON, Jeong-Sun MOON, Hwa Chang SEO, Richard M. KREMER, Ryan G. QUARFOTH, Jack A. CROWELL, Mariano J. TABOADA, Joshua M. DORIA, Terry B. WELCH
  • Patent number: 10559694
    Abstract: A device including a biopolymer membrane, a passivation layer on the biopolymer membrane, a graphene layer on the passivation layer, a source electrode on the graphene layer, and a drain electrode on the graphene layer, wherein the graphene layer extends between the source electrode and the drain electrode.
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: February 11, 2020
    Assignee: HRL Laboratories, LLC
    Inventors: Kyung-Ah Son, Baohua Yang, Hwa Chang Seo, Danny Wong, Jeong-Sun Moon
  • Patent number: 10096736
    Abstract: A photodetector comprising a region of a p-type phase-change chalcogenide material forming a heterojunction with a region of n-type Silicon; wherein the p-type phase-change chalcogenide material comprises one of GeTe and SbTe.
    Type: Grant
    Filed: February 20, 2018
    Date of Patent: October 9, 2018
    Assignee: HRL Laboratories, LLC
    Inventors: Jeong-Sun Moon, Hwa Chang Seo
  • Patent number: 9954133
    Abstract: A photodetector comprising a region of a p-type phase-change chalcogenide material forming a heterojunction with a region of n-type Silicon; wherein the p-type phase-change chalcogenide material comprises one of GeTe and SbTe.
    Type: Grant
    Filed: January 13, 2017
    Date of Patent: April 24, 2018
    Assignee: HRL Laboratories, LLC
    Inventors: Jeong-Sun Moon, Hwa Chang Seo
  • Patent number: 9679970
    Abstract: A device including a biopolymer membrane, a passivation layer on the biopolymer membrane, a graphene layer on the passivation layer, a source electrode on the graphene layer, and a drain electrode on the graphene layer, wherein the graphene layer extends between the source electrode and the drain electrode.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: June 13, 2017
    Assignee: HRL Laboratories, LLC
    Inventors: Kyung-Ah Son, Baohua Yang, Hwa Chang Seo, Danny Wong, Jeong-Sun Moon
  • Patent number: 9640680
    Abstract: An optical device includes an optically transparent and electrically conducting conductor including graphene, a network of metal nanowires, or graphene integrated with a network of metal nanowires. The optical device includes a II VI compound semiconductor, a III V compound semiconductor, or InAsSb.
    Type: Grant
    Filed: February 18, 2014
    Date of Patent: May 2, 2017
    Assignee: HRL Laboratories, LLC
    Inventors: Kyung-Ah Son, Hasan Sharifi, Jeong-Sun Moon, Wah S. Wong, Hwa Chang Seo
  • Patent number: 9368720
    Abstract: A switch includes an input port, an output port, a phase change material coupled between the input port and the output port, a heater, and a thermal dielectric layer in between the heater and the phase change material, and in contact with the heater and the phase change material. The thermal dielectric layer provides thermal conduction between the phase change material and the heater, and the thermal dielectric layer is nonmetallic and electrically non-conductive and includes polycrystalline AlN, diamond, or SiC.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: June 14, 2016
    Assignee: HRL Laboratories, LLC
    Inventors: Jeong-Sun Moon, Hwa-Chang Seo