Patents by Inventor H. Wally Lee

H. Wally Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of removing HDP oxide deposition
    Patent number: 6897121
    Abstract: A method of removing HDP oxide deposition comprises the steps of: (1) etching the HDP oxide deposition by in-side-out model, wherein the etching rate in the center of the substrate is faster than the edges of the substrate; (2) etching the HDP oxide deposition by out-side-in model, wherein the etching rate in the edges of the substrate is faster than the center of the substrate; and (3) removing the remaining silicon oxide layer using chemical-mechanical polishing (CMP). According to the method of the invention, the HDP oxide deposition can be planarized more uniform.
    Type: Grant
    Filed: May 21, 2003
    Date of Patent: May 24, 2005
    Assignee: Macronix International Co., Ltd.
    Inventors: H. Wally Lee, Ching-Ping Wu, Han-Maou Chang, Ma Chia-Chih, Nan-Tzu Lian, Hsin-Cheng Liu