Patents by Inventor Hyuk Hyun Ryu

Hyuk Hyun Ryu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190048471
    Abstract: The present invention relates to a nanostructure formation device using microwaves and, more specifically, to a novel structure of a nanostructure formation device using microwaves, the device being capable of introducing a solution process factor to a conventional nanostructure formation device using microwaves, so as to stably manufacture a nanostructure by using a microwave while consistently maintaining the concentration of a formation solution and the process conditions for it when the nanostructure is formed through a solution process.
    Type: Application
    Filed: February 23, 2017
    Publication date: February 14, 2019
    Inventor: HYUK HYUN RYU
  • Patent number: 9595439
    Abstract: The present invention relates to a method for preparing a nanostructure by electrochemical deposition, and a nanostructure prepared thereby, and more specifically, to: a method for preparing a nanostructure by electrochemical deposition, wherein it is possible to prepare a nanostructure having remarkable morphological, structural and optical characteristics by controlling a method for applied power during electrochemical deposition; and a nanostructure prepared thereby.
    Type: Grant
    Filed: April 23, 2014
    Date of Patent: March 14, 2017
    Assignee: INJE UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventors: Hyuk Hyun Ryu, Jin Tak Jang, Tae Gyoum Kim
  • Patent number: 9567235
    Abstract: The present invention relates to a solution reaction apparatus and solution reaction method using the same, and more particularly a solution reaction apparatus and a solution reaction method using the same, wherein a reaction vessel is made by using a sealing member, a reaction vessel forming member, and a substrate serving as the bottom part of the reaction vessel so as to cause one side of a reaction solution only to contact the solution, thereby adjusting the temperature of the substrate differently from the temperature of the solution. The solution reaction apparatus of the present invention can control temperature of the substrate and temperature of the reaction solution separately, thereby it can control the temperature of the solution above the boiling point of the solution, and can react the solution while constantly maintaining the concentration of the solution by the solution circulatory device. Accordingly, it has an effect of freely forming various nanostructures on the substrate.
    Type: Grant
    Filed: February 25, 2013
    Date of Patent: February 14, 2017
    Assignee: INJE UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventors: Hyuk Hyun Ryu, Jin Tak Jang, Tae Hyun Lee, Hee Bong Oh
  • Publication number: 20150275386
    Abstract: The present invention relates to a method for preparing a nanostructure by electrochemical deposition, and a nanostructure prepared thereby, and more specifically, to: a method for preparing a nanostructure by electrochemical deposition, wherein it is possible to prepare a nanostructure having remarkable morphological, structural and optical characteristics by controlling a method for applied power during electrochemical deposition; and a nanostructure prepared thereby.
    Type: Application
    Filed: April 23, 2014
    Publication date: October 1, 2015
    Applicant: Inje University Industry-Academic Cooperation Foundation
    Inventors: Hyuk Hyun Ryu, Jin Tak Jang, Tae Gyoum Kim
  • Publication number: 20150037244
    Abstract: The present invention relates to a solution reaction apparatus and solution reaction method using the same, and more particularly a solution reaction apparatus and a solution reaction method using the same, wherein a reaction vessel is made by using a sealing member, a reaction vessel forming member, and a substrate serving as the bottom part of the reaction vessel so as to cause one side of a reaction solution only to contact the solution, thereby adjusting the temperature of the substrate differently from the temperature of the solution. The solution reaction apparatus of the present invention can control temperature of the substrate and temperature of the reaction solution separately, thereby it can control the temperature of the solution above the boiling point of the solution, and can react the solution while constantly maintaining the concentration of the solution by the solution circulatory device. Accordingly, it has an effect of freely forming various nanostructures on the substrate.
    Type: Application
    Filed: February 25, 2013
    Publication date: February 5, 2015
    Inventors: Hyuk Hyun Ryu, Jin Tak Jang, Tae Hyun Lee, Hee Bong Oh