Patents by Inventor Hyun-Gi Cho

Hyun-Gi Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240128502
    Abstract: An embodiment solid electrolyte includes a first compound and a second compound. The first compound is represented by a first chemical formula Li7-aPS6-a(X11-bX2b)a, wherein X1 and X2 are the same or different and each represents F, Cl, Br, or I, and wherein 0<a?2 and 0<b<1, and the second compound is represented by a second chemical formula Li7-cP1-2dMdS6-c-3d(X11-eX2e)c, wherein X1 and X2 are the same or different and each represents F, Cl, Br, or I, wherein M represents Ge, Si, Sn, or any combination thereof, and wherein 0<c?2, 0<d<0.5, and 0<e<1.
    Type: Application
    Filed: August 14, 2023
    Publication date: April 18, 2024
    Inventors: Sa Heum Kim, Yong Jun Jang, Yong Gu Kim, Sung Man Cho, Sun Ho Choi, Seong Hyeon Choi, Kyu Sung Park, Young Gyoon Ryu, Suk Gi Hong, Pil Sang Yun, Myeong Ju Ha, Hyun Beom Kim, Hwi Chul Yang
  • Patent number: 11947767
    Abstract: A touch sensor including: a substrate including a sensing area and a non-sensing area; a touch electrode disposed on the sensing area of the substrate; a pad part disposed on the non-sensing area of the substrate; a connection line electrically connecting the touch electrode and the pad part, the connection line including a first connection line and a second connection line surrounding upper and side surfaces of the first connection line; a first insulating layer disposed on the connection line, the first insulating layer exposing at least a portion of the second connection line; and a connection electrode formed on the first insulating layer to protrude to the non-sensing area from one end of the touch electrode, the connection electrode being physically connected to the exposed second connection line through the first insulating layer.
    Type: Grant
    Filed: December 26, 2019
    Date of Patent: April 2, 2024
    Assignee: Samsung Display Co., Ltd.
    Inventors: Chun Gi You, Hyun Sik Park, Ma Eum Cho
  • Patent number: 11927881
    Abstract: A pellicle for extreme ultraviolet (EUV) lithography is based on yttrium carbide and used in a EUV lithography process. The pellicle for EUV lithography includes a pellicle layer that has a core layer containing yttrium carbide. The yttrium carbide is YCx in which the atomic percentage of carbon is within a range of 25% to 45%.
    Type: Grant
    Filed: November 29, 2021
    Date of Patent: March 12, 2024
    Assignee: Korea Electronics Technology Institute
    Inventors: Hyeong Keun Kim, Seul Gi Kim, Hyun Mi Kim, Jin Woo Cho, Ki Hun Seong
  • Patent number: 6960265
    Abstract: An apparatus and method for automatically collecting metallic impurities of a semiconductor wafer. In one aspect, an apparatus includes an air tight process chamber including a loading unit for loading the semiconductor wafer and unloading unit for unloading the semiconductor wafer; a vapor phase decomposition unit disposed in the process chamber for decomposing a silicon oxide layer on the semiconductor wafer; and a scanning unit disposed in the process chamber for scanning the semiconductor wafer to collect the metallic impurities. The scanning unit includes a scanning solution bottle for obtaining scanning solution that is used for absorbing metallic impurities on the semiconductor wafer; a scanning arm capable of downward, upward, and rotational movement; and a nozzle coupled to the scanning arm for drawing in scanning solution from the scanning solution bottle, and for forming a droplet of scanning solution that cohers to the nozzle when scanning a semiconductor wafer to collect metallic impurities.
    Type: Grant
    Filed: March 21, 2002
    Date of Patent: November 1, 2005
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yong-Woo Heo, June-Ing Gill, Mi-Kyoung Lee, Hyun-Gi Cho
  • Publication number: 20020134406
    Abstract: An apparatus and method for automaticaly collecting metallic impurities of a semiconductor wafer. In one aspect, an apparatus comprises: an air tight process chamber comprising a loading unit for loading the semiconductor wafer and unloading unit for unloading the semiconductor wafer; a vapor phase decomposition unit disposed in the process chamber for decomposing a silicon oxide layer on the semiconductor wafer; and a scanning unit disposed in the process chamber for scanning the semiconductor wafer to collect the metallic impurities. The scanning unit comprises a scanning solution bottle for obtaining scanning solution that is used for absorbing metallic impurities on the semiconductor wafer; a scanning arm capable of downward, upward, and rotational movement; and a nozzle coupled to the scanning arm for drawing in scanning solution from the scanning solution bottle, and for forming a droplet of scanning solution that cohers to the nozzle when scanning a semiconductor wafer to collect metallic impurities.
    Type: Application
    Filed: March 21, 2002
    Publication date: September 26, 2002
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Yong-Woo Heo, June-Ing Gill, Mi-Kyoung Lee, Hyun-Gi Cho
  • Patent number: 5570198
    Abstract: A paid broadcast receiving device has a decoder connection detector for determining whether or not a video cassette recorder (VCR) and a canal+ decoder are connected. The determination depends on an impedance match between the VCR and decoder when a canal+ broadcast channel is selected after the canal+ channel is stored in a system where a VCR is to be connected to a canal+ decoder and a television. The system thereby receives and/or records canal+ broadcasts without a decoder, for paid broadcasts sent via a public line, even if the canal+ decoder is not connected to the VCR. Users are able to easily judge whether or not the canal+ decoder is connected.
    Type: Grant
    Filed: July 27, 1994
    Date of Patent: October 29, 1996
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Hyun-gi Cho