Patents by Inventor Hyun Kyung SHIM

Hyun Kyung SHIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods of fabricating fine patterns
    Patent number: 9190274
    Abstract: Methods of forming fine patterns are provided. The method includes reinforcing a hydrophobic property of a hard mask layer using a surface treatment process to form a neutral layer, forming a block co-polymer layer on the neutral layer, and phase-separating the block co-polymer layer into first domains and second domains.
    Type: Grant
    Filed: December 19, 2013
    Date of Patent: November 17, 2015
    Assignee: SK HYNIX INC.
    Inventors: Keun Do Ban, Cheol Kyu Bok, Myoung Soo Kim, Ki Lyoung Lee, Hyun Kyung Shim
  • Methods of fabricating nano-scale structures and nano-scale structures fabricated thereby
    Patent number: 8999862
    Abstract: Methods of fabricating nano-scale structures are provided. A method includes forming a first hard mask pattern corresponding to first openings in a dense region, forming first guide elements on the first hard mask pattern aligned with the first openings, and forming second hard mask patterns in a sparse region to provide isolated patterns. A blocking layer is formed in the sparse region to cover the second hard mask patterns. A first domain and second domains are formed in the dense region using a phase separation of a block co-polymer layer. Related nano-scale structures are also provided.
    Type: Grant
    Filed: April 7, 2014
    Date of Patent: April 7, 2015
    Assignee: SK Hynix Inc.
    Inventors: Keun Do Ban, Cheol Kyu Bok, Myoung Soo Kim, Jung Hyung Lee, Hyun Kyung Shim, Chang Il Oh
  • METHODS OF FABRICATING FINE PATTERNS
    Publication number: 20150031210
    Abstract: Methods of forming fine patterns are provided. The method includes reinforcing a hydrophobic property of a hard mask layer using a surface treatment process to form a neutral layer, forming a block co-polymer layer on the neutral layer, and phase-separating the block co-polymer layer into first domains and second domains.
    Type: Application
    Filed: December 19, 2013
    Publication date: January 29, 2015
    Applicant: SK HYNIX INC.
    Inventors: Keun Do BAN, Cheol Kyu BOK, Myoung Soo KIM, Ki Lyoung LEE, Hyun Kyung SHIM