Patents by Inventor Hyun-Wook Rho

Hyun-Wook Rho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist stripping composition and methods of fabricating semiconductor device using the same
    Publication number: 20060163208
    Abstract: A photoresist stripping composition and a method of fabricating a semiconductor device using the photoresist stripping composition are provided. The photoresist stripping composition is made of a mixed solution of acetone and isopropyl alcohol. A preferred volume ratio of acetone to isopropyl alcohol is in a range of about 50:50 to about 95:5.
    Type: Application
    Filed: January 9, 2006
    Publication date: July 27, 2006
    Inventors: Kwang-Myeon Park, Jae-Jin Kim, Sang-Jine Park, Hyun-Wook Rho