Patents by Inventor Hyung-ik Lee

Hyung-ik Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090239115
    Abstract: A heteroatom-containing mesoporous carbon has a pore diameter of 11 to 35 nm, has a specific surface area of 500 m2/g or more, and comprises a heteroatom. The heteroatom-containing mesoporous carbon is formed by a method including mixing a carbon precursor, a heteroatom-containing precursor, and silica particles to prepare a carbon precursor mixture; drying and carbonizing the carbon precursor mixture to prepare a silica-carbon composite; and removing silica from the silica-carbon composite. An anode and/or a cathode of fuel cell includes catalyst particles supported on the heteroatom-containing mesoporous carbon.
    Type: Application
    Filed: October 27, 2008
    Publication date: September 24, 2009
    Applicant: Samsung SDI Co., Ltd.
    Inventors: Chan-ho Pak, Hyuk Chang, Ji-man Kim, Hyung-Ik Lee
  • Publication number: 20090072719
    Abstract: Example embodiments relate to a passivation film for protecting an electronic device. The passivation film may include a myelin layer. The myelin layer may have a thickness of about 100 ? to 10 ?m. The passivation film may further include an inorganic film. Example embodiments also relate to an electronic display device including a substrate, an organic light-emitting device (OLED) disposed on the substrate, and a myelin layer disposed on the organic light-emitting device. A plurality of myelin layers and a plurality of inorganic films may be alternately stacked on the organic light-emitting device in lieu of a single myelin layer.
    Type: Application
    Filed: March 31, 2008
    Publication date: March 19, 2009
    Inventors: Young-nam Kwon, Young-gu Lee, Jong-jin Park, Hyung-ik Lee, Sung Heo
  • Publication number: 20080160391
    Abstract: A sulfur-containing mesoporous carbon that has mesopores with an average diameter of 2 to 10 nm, a method of preparing the same, a catalyst containing the mesoporous carbon as a catalyst support, and a fuel cell using the catalyst in which the sulfur-containing mesoporous carbon has a good affinity for and adhesion to catalyst particles so as to strongly support the catalyst particles due to the sulfur atoms substituting for carbons in an OMC carbon skeleton structure. The growth of metal catalyst particles is prevented when heat-treating the metal catalyst particles. The catalyst using the sulfur-containing mesoporous carbon can be applied to a fuel cell to prevent a reduction in catalytic activity due to increased particle size by an accumulation of catalyst particles. The catalyst containing the sulfur-containing mesoporous carbon as a catalyst support can be used to manufacture a fuel cell having an improved performance.
    Type: Application
    Filed: December 28, 2007
    Publication date: July 3, 2008
    Applicant: Samsung SDI Co., Ltd
    Inventors: Sang Hoon JOO, Chan-ho PAK, Hyuk CHANG, Ji-man KIM, Hyung-ik Lee
  • Publication number: 20070178681
    Abstract: A semiconductor device has a plurality of stacked metal layers. The semiconductor device includes a substrate, a gate oxide layer deposited on the substrate and formed from a high-k dielectric material, a first metal layer deposited on the gate oxide layer and formed from a nitride of a metal of the high-k dielectric material of the gate oxide layer, a second metal layer deposited on the first metal layer, a third metal layer deposited on the second metal layer, and a material layer deposited on the third metal layer, wherein the material layer taken together with the first, second and third metal layers forms a gate electrode. Because any chemical reaction between the gate oxide layer and the metal layer can be controlled, deterioration of the capacitance equivalent oxide thickness) and leakage of current are prevented, and a semiconductor device having improved insulation can be provided.
    Type: Application
    Filed: January 10, 2007
    Publication date: August 2, 2007
    Applicant: SAMSUNG ELECTRONICS CO., LTD.,
    Inventors: Young-su CHUNG, Sung-kee HAN, Hyung-suk JUNG, Hyung-ik LEE
  • Publication number: 20070122334
    Abstract: Provided are a mesoporous carbon containing at least one heteroatom boron and phosphorus, a manufacturing method thereof, and a fuel cell using the same. The mesoporous carbon contains a heteroatom such as boron and phosphorous to reduce sheet resistance, and thus can efficiently transfer electric energy. Such a mesoporous carbon can be used as a conductive material of electrodes for fuel cells. When the mesoporous carbon is used as a support for catalysts of electrodes, a supported catalyst containing the support can be used to manufacture a fuel cell having high efficiency.
    Type: Application
    Filed: May 31, 2006
    Publication date: May 31, 2007
    Applicant: Samsung SDI Co., Ltd
    Inventors: Chan-ho Pak, Sang-hoon Joo, Hyuk Chang, Ji-man Kim, Hyung-ik Lee
  • Publication number: 20070116624
    Abstract: A mesoporous carbon is prepared by mixing a carbon precursor, an acid, and a solvent to obtain a carbon precursor mixture; impregnating an ordered mesoporous silica (OMS) with the carbon precursor mixture; carbonizing the impregnated OMS at 800 to 1300° C. by irradiating microwave energy with a power of 100 to 2000 W thereon to form an OMS-carbon composite; and removing the mesoporous silica from the OMS-carbon composite. The method of preparing a mesoporous carbon can significantly reduce a carbonization time by carbonizing a carbon precursor using microwave energy in a silica template compared to a conventional method using a heat treatment. A supported catalyst and a fuel cell include the mesoporous carbon.
    Type: Application
    Filed: May 31, 2006
    Publication date: May 24, 2007
    Applicant: Samsung SDI Co., Ltd.
    Inventors: Sang-hoon Joo, Chan-ho Pak, Hyuk Chang, Ji-man Kim, Hyung-ik Lee
  • Publication number: 20070072399
    Abstract: Semiconductor devices are provided having a selective epitaxial growth layer that exhibits suppressed lateral growth. These semiconductor devices may include a semiconductor substrate having a silicon region, and an epitaxial growth layer formed on the silicon region. The epitaxial growth layer may comprise alternatively stacked silicon and silicon germanium epitaxial layers. The silicon germanium epitaxial layer may be thinner than the silicon epitaxial layers.
    Type: Application
    Filed: September 11, 2006
    Publication date: March 29, 2007
    Inventors: Young-Pil Kim, Jin-Bum Kim, Jun-Ho Lee, Hyung-ik Lee, Hion-Suck Baik
  • Publication number: 20060263288
    Abstract: Provided are a mesoporous carbon and a method of preparing the same, where the mesoporous carbon is prepared using phenanthrene as a carbon source and a mesoporous silica as a template. The mesoporous carbon has a significantly low plane resistance, which can be obtained without sacrificing other physical properties, and thus obtains a high conductivity and effectively transfers electrical energy. Accordingly, a fuel cell electrode or a fuel cell which is produced using the mesoporous carbon as a conductive material has high efficiency. Furthermore, the mesoporous carbon may be used in various electrochemical devices as a conductive material.
    Type: Application
    Filed: May 16, 2006
    Publication date: November 23, 2006
    Applicant: Samsung SDI Co., Ltd.
    Inventors: Chan-ho Pak, Sang-hoo Joo, Hyuk Chang, Ji-man Kim, Hyung-ik Lee
  • Publication number: 20050036935
    Abstract: A method for manufacturing a carbon molecular sieve with increased microporosity; a method for manufacturing a carbon molecular sieve with increased microporosity and improved structural regularity; a carbon molecular sieve with increased microporosity; a carbon molecular sieve with increased microporosity and improved structural regularity; a catalyst for a fuel cell using the carbon molecular sieve; and a fuel cell using the catalyst are provided.
    Type: Application
    Filed: September 27, 2004
    Publication date: February 17, 2005
    Applicant: Samsung SDI Co., LTD.
    Inventors: Chan-ho Pak, Ji-man Kim, Hyung-ik Lee
  • Patent number: 6812187
    Abstract: A method for manufacturing a carbon molecular sieve with increased microporosity; a method for manufacturing a carbon molecular sieve with increased microporosity and improved structural regularity; a carbon molecular sieve with increased microporosity; a carbon molecular sieve with increased microporosity and improved structural regularity; a catalyst for a fuel cell using the carbon molecular sieve; and a fuel cell using the catalyst are provided.
    Type: Grant
    Filed: July 28, 2003
    Date of Patent: November 2, 2004
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Chan-ho Pak, Ji-man Kim, Hyung-ik Lee