Patents by Inventor Hyungryul Choi

Hyungryul Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190324274
    Abstract: A head-mounted device may have a transparent display. The transparent display may be formed from a display unit that provides images to a user through an optical coupler. A user may view real-world objects through the optical coupler while control circuitry directs the transparent display to display computer-generated content over selected portions of the real-world objects. The head-mounted display may also include an adjustable opacity system. The adjustable opacity system may include an adjustable opacity layer such as a photochromic layer that overlaps the optical coupler and a light source that selectively exposes the adjustable opacity layer to ultraviolet light to control the opacity of the adjustable opacity layer. The adjustable opacity layer may block or dim light from the real-world objects to allow improved contrast when displaying computer-generated content over the real-world objects.
    Type: Application
    Filed: March 13, 2019
    Publication date: October 24, 2019
    Inventors: David A. Kalinowski, Hyungryul Choi, Jae Hwang Lee
  • Patent number: 9469083
    Abstract: Inverted Nanocone Structures and Its Fabrication Process. The method of fabricating nanotextured structures includes making a master mold having an array of tapered structures to be replicated. The master mold is pressed into a curable polymer supported on a substrate and the polymer is cured. Thereafter, the mold is detached from the cured polymer to form the nanotextured structure.
    Type: Grant
    Filed: July 1, 2013
    Date of Patent: October 18, 2016
    Assignee: Massachusetts Institute of Technology
    Inventors: Hyungryul Choi, Jeong-gil Kim, Kyoo Chul Park, Robert E. Cohen, Gareth H. McKinley, George Barbastathis
  • Patent number: 9120669
    Abstract: Fabrication method. At least first and second hardmasks are deposited on a substrate, the thickness and materials of the first and second hardmask selected to provided etch selectivity with respect to the substrate. A nanoscale pattern of photoresist is created on the first hardmask and the hardmask is etched through to create the nanoscale pattern on a second hardmask. The second hardmask is etched through to create the desired taper nanocone structures in the substrate. Reactive ion etching is preferred. A glass manufacturing process using a roller imprint module is also disclosed.
    Type: Grant
    Filed: April 13, 2012
    Date of Patent: September 1, 2015
    Assignee: Massachusetts Institute of Technology
    Inventors: Hyungryul Choi, Chih-Hao Chang, Kyoo Chul Park, Gareth H McKinley, George Barbastathis, Jeong-gil Kim
  • Publication number: 20140010994
    Abstract: Inverted Nanocone Structures and Its Fabrication Process. The method of fabricating nanotextured structures includes making a master mold having an array of tapered structures to be replicated. The master mold is pressed into a curable polymer supported on a substrate and the polymer is cured. Thereafter, the mold is detached from the cured polymer to form the nanotextured structure.
    Type: Application
    Filed: July 1, 2013
    Publication date: January 9, 2014
    Applicant: Massachusetts Institute of Technology
    Inventors: Hyungryul Choi, Jeong-gil Kim, Kyoo Chul Park, Robert E. Cohen, Gareth H. McKinley, George Barbastathis
  • Publication number: 20130025322
    Abstract: Fabrication method. At least first and second hardmasks are deposited on a substrate, the thickness and materials of the first and second hardmask selected to provided etch selectivity with respect to the substrate. A nanoscale pattern of photoresist is created on the first hardmask and the hardmask is etched through to create the nanoscale pattern on a second hardmask. The second hardmask is etched through to create the desired taper nanocone structures in the substrate. Reactive ion etching is preferred. A glass manufacturing process using a roller imprint module is also disclosed.
    Type: Application
    Filed: April 13, 2012
    Publication date: January 31, 2013
    Applicant: Massachusetts Institute of Technology
    Inventors: Hyungryul Choi, Chih-Hao Chang, Kyoo Chul Park, Gareth H. McKinley, George Barbastathis, Jeong-gil Kim