Abstract: Disclosed are metal-insulator-metal capacitors and integrated chips. In one embodiment, a metal-insulator-metal capacitor includes N electrodes and (N?1) passivation layers, wherein the N electrodes and the (N?1) passivation layers are alternately stacked on a substrate. N is an integer larger than 1. Thicknesses of the N electrodes gradually increase in a direction parallel to a normal direction of the substrate.

Abstract: A method of forming a semiconductor structure including a metal-insulator-metal (MIM) capacitor includes: forming a stack structure over a substrate, wherein the stack structure includes a plurality of electrode material layers and a plurality of insulating material layers alternately stacked over the substrate; forming a mask layer on the stack structure; and performing a patterning process on the stack structure, so as to form the MIM capacitor comprising alternately stacked electrodes and insulating layers. Performing the patterning process includes: performing a first etching process to remove a first portion of the stack structure exposed by the mask layer; performing a first trimming process on the mask layer to remove a portion of the mask layer, and a first trimmed mask layer is formed; and performing a second etching process to remove a second portion of the stack structure exposed by the first trimmed mask layer.

Abstract: A memory array and a method for forming the memory array are disclosed. The memory array includes memory elements, selectors and conductive vias. Each selector includes two pairs of fin structures. The conductive vias are electrically coupled to the two pairs of fin structures of the selectors.

Abstract: Costs may be avoided and yields improved by applying scanning probe microscopy to substrates in the midst of an integrated circuit fabrication process sequence. Scanning probe microscopy may be used to provide conductance data. Conductance data may relate to device characteristics that are normally not available until the conclusion of device manufacturing. The substrates may be selectively treated to ameliorate a condition revealed by the data. Some substrates may be selectively discarded based on the data to avoid the expense of further processing. A process maintenance operation may be selectively carried out based on the data.

Abstract: A semiconductor device inspection method including: depositing a dielectric material over a substrate to form an interconnect-level dielectric (ILD) layer; patterning the ILD layer to form via structures in the ILD layer; depositing an electrically conductive material to form an inspection layer on the ILD layer and in the via structures; imaging the inspection layer to generate image data; and detecting any defects in the via structures by analyzing the image data.

Abstract: Various embodiments of the present disclosure are directed towards a method for nondestructive inspection of cell etch redeposition. In some embodiments of the method, a grayscale image of a plurality of cells on a wafer is captured. The grayscale image provides a top down view of the cells and, in some embodiments, is captured in situ after etching to form the cells. The cells are identified in the grayscale image to determine non-region of interest (non-ROI) pixels corresponding to the cells. The non-ROI pixels are subtracted from the grayscale image to determine ROI pixels. The ROI pixels are remaining pixels after the subtracting and correspond to material on sidewalls of, and in recesses between, the cells. An amount of etch redeposition on the sidewalls and in the recesses is then scored based on gray levels of the ROI pixels. Further, the wafer is processed based on the score.

Abstract: A semiconductor device inspection method including: depositing a dielectric material over a substrate to form an interconnect-level dielectric (ILD) layer; patterning the ILD layer to form via structures in the ILD layer; depositing an electrically conductive material to form an inspection layer on the ILD layer and in the via structures; imaging the inspection layer to generate image data; and detecting any defects in the via structures by analyzing the image data.

Abstract: Various embodiments of the present disclosure are directed towards a method for non-destructive inspection of cell etch redeposition. In some embodiments of the method, a grayscale image of a plurality of cells on a wafer is captured. The grayscale image provides a top down view of the cells and, in some embodiments, is captured in situ after etching to form the cells. The cells are identified in the grayscale image to determine non-region of interest (non-ROI) pixels corresponding to the cells. The non-ROI pixels are subtracted from the grayscale image to determine ROI pixels. The ROI pixels are remaining pixels after the subtracting and correspond to material on sidewalls of, and in recesses between, the cells. An amount of etch redeposition on the sidewalls and in the recesses is then scored based on gray levels of the ROI pixels. Further, the wafer is processed based on the score.

Abstract: A method includes setting a current level of a write signal to a first non-zero value for a first period of time. The write signal is provided to a memory element during the first period of time. The current level of the write signal is adjusted from the first non-zero value to a second non-zero value, different from the first non-zero value, for a second period of time. The write signal is provided to the memory element during the second period of time. The current level of the write signal is adjusted from the second non-zero value to a third value, different from the first non-zero value and different from the second non-zero value, for a third period of time. The write signal is provided to the memory element during the third period of time.

Abstract: A semiconductor device inspection method including: depositing a dielectric material over a substrate to form an interconnect-level dielectric (ILD) layer; patterning the ILD layer to form via structures in the ILD layer; depositing an electrically conductive material to form an inspection layer on the ILD layer and in the via structures; imaging the inspection layer to generate image data; and detecting any defects in the via structures by analyzing the image data.

Abstract: Disclosed are metal-insulator-metal capacitors and integrated chips. In one embodiment, a metal-insulator-metal capacitor includes N electrodes and (N?1) passivation layers, wherein the N electrodes and the (N?1) passivation layers are alternately stacked on a substrate. N is an integer larger than 1. Thicknesses of the N electrodes gradually increase in a direction parallel to a normal direction of the substrate.

Abstract: A method of forming a semiconductor structure including a metal-insulator-metal (MIM) capacitor includes: forming a stack structure over a substrate, wherein the stack structure includes a plurality of electrode material layers and a plurality of insulating material layers alternately stacked over the substrate; forming a mask layer on the stack structure; and performing a patterning process on the stack structure, so as to form the MIM capacitor comprising alternately stacked electrodes and insulating layers. Performing the patterning process includes: performing a first etching process to remove a first portion of the stack structure exposed by the mask layer; performing a first trimming process on the mask layer to remove a portion of the mask layer, and a first trimmed mask layer is formed; and performing a second etching process to remove a second portion of the stack structure exposed by the first trimmed mask layer.

Abstract: A method includes setting a current level of a write signal to a first non-zero value for a first period of time. The write signal is provided to a memory element during the first period of time. The current level of the write signal is adjusted from the first non-zero value to a second non-zero value, different from the first non-zero value, for a second period of time. The write signal is provided to the memory element during the second period of time. The current level of the write signal is adjusted from the second non-zero value to a third value, different from the first non-zero value and different from the second non-zero value, for a third period of time. The write signal is provided to the memory element during the third period of time.

Abstract: A memory array and a method for forming the memory array are disclosed. The memory array includes memory elements, selectors and conductive vias. Each selector includes two pairs of fin structures. The conductive vias are electrically coupled to the two pairs of fin structures of the selectors.

Abstract: A method includes setting a current level of a write signal to a first non-zero value for a first period of time. The write signal is provided to a memory element during the first period of time. The current level of the write signal is adjusted from the first non-zero value to a second non-zero value, different from the first non-zero value, for a second period of time. The write signal is provided to the memory element during the second period of time. The current level of the write signal is adjusted from the second non-zero value to a third value, different from the first non-zero value and different from the second non-zero value, for a third period of time. The write signal is provided to the memory element during the third period of time.

Abstract: A memory array and a method for forming the memory array are disclosed. The memory array includes memory elements, selectors and conductive vias. Each selector includes two pairs of fin structures and a gate structure. The gate structure crosses the two pairs of fin structures. The conductive vias are electrically coupled to the two pairs of fin structures of the selectors.

Abstract: Costs may be avoided and yields improved by applying scanning probe microscopy to substrates in the midst of an integrated circuit fabrication process sequence. Scanning probe microscopy may be used to provide conductance data. Conductance data may relate to device characteristics that are normally not available until the conclusion of device manufacturing. The substrates may be selectively treated to ameliorate a condition revealed by the data. Some substrates may be selectively discarded based on the data to avoid the expense of further processing. A process maintenance operation may be selectively carried out based on the data.

Abstract: A second metal structure such as a metal plug is formed over a first metal structure, such as a metal line, by causing metal material from the first metal structure to migrate into an opening in a dielectric layer over the first metal structure. The metal material, which may be copper, is of a type that undergoes a reduction in density as it oxidizes. Migration is induced using gases that alternately oxidize and reduce the metal material. Over many cycles, the metal material migrates into the opening. In some embodiments, the migrated metal material partially fills the opening. In some embodiments, the migrated metal material completely fills the opening.

Abstract: A valve assembly attached to a capacitor such that pressurizing the capacitor to a first positive pressure threshold induces the valve assembly to open, the pressurized air is released to the patient, and then as the pressure in the capacitor drops to a second pressure threshold the valve closes and the capacitor begins to build pressure until the first positive pressure threshold is achieved and the process repeats. Relative to the valve assembly and integrated therein, is an incrementally adjustable index knob to vary the rate of a biasing force performing work against the actionable valve face of the diaphragm functional surface to set the performance of the valve assembly, thereby increasing the potential for correct operation across a range of oscillating rates supporting a broad spectrum of patient therapies and types.

Abstract: A memory array and a method for forming the memory array are disclosed. The memory array includes memory elements, selectors and conductive vias. Each selector includes two pairs of fin structures and a gate structure. The gate structure crosses the two pairs of fin structures. The conductive vias are electrically coupled to the two pairs of fin structures of the selectors.