Patents by Inventor I. John Seward, JR.

I. John Seward, JR. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Thin-film treatment of high-value glycol and amine solvents to remove contaminants
    Patent number: 10300402
    Abstract: A method for cleaning a contaminated solvent used to treat a gas stream, for example a contaminated glycol or a contaminated amine stream, by vacuum evaporation using a mechanically-maintained horizontally-orientated thin film evaporator, where the contaminant material is recovered from the thin film in solvent-free form, as either a heavy organic material or as free flowing salts.
    Type: Grant
    Filed: June 26, 2018
    Date of Patent: May 28, 2019
    Assignee: Tessenderio Kerley, Inc.
    Inventors: David Thomas Hagerman, I. John Seward, Jr.
  • THIN-FILM TREATMENT OF HIGH-VALUE GLYCOL AND AMINE SOLVENTS TO REMOVE CONTAMINANTS
    Publication number: 20180369710
    Abstract: A method for cleaning a contaminated solvent used to treat a gas stream, for example a contaminated glycol or a contaminated amine stream, by vacuum evaporation using a mechanically-maintained horizontally-orientated thin film evaporator, where the contaminant material is recovered from the thin film in solvent-free form, as either a heavy organic material or as free flowing salts.
    Type: Application
    Filed: June 26, 2018
    Publication date: December 27, 2018
    Applicant: MPR Services, Inc.
    Inventors: David Thomas Hagerman, I. John Seward, JR.