Abstract: A device includes a fin extending from a semiconductor substrate; a gate stack over the fin; a first spacer on a sidewall of the gate stack; a source/drain region in the fin adjacent the first spacer; an inter-layer dielectric layer (ILD) extending over the gate stack, the first spacer, and the source/drain region, the ILD having a first portion and a second portion, wherein the second portion of the ILD is closer to the gate stack than the first portion of the ILD; a contact plug extending through the ILD and contacting the source/drain region; a second spacer on a sidewall of the contact plug; and an air gap between the first spacer and the second spacer, wherein the first portion of the ILD extends across the air gap and physically contacts the second spacer, wherein the first portion of the ILD seals the air gap.

Abstract: A novel thermophilic bacterium is provided, which has a 16S rDNA sequence as set forth in SEQ ID NO. 1. The thermophilic bacterium excretes extracellular proteins having excellent metal-ion binding ability, being useful in the treatment of boiler equipment, pipelines, geothermal wells or industrial wastewater or hard water.

Abstract: A novel thermophilic bacterium is provided, which has a 16S rDNA sequence as set forth in SEQ ID NO. 1. The thermophilic bacterium excretes extracellular proteins having excellent metal-ion binding ability, being useful in the treatment of boiler equipment, pipelines, geothermal wells or industrial wastewater or hard water.

Abstract: A mask defect detection system. The mask defect detection system comprises a first processing device, a second processing device, a third processing device, and a storage device. The first processing device processes mask design information to generate first writer-formatted mask information, wherein the first processing device comprises a first processing module. The second processing device processes mask design information to generate second writer-formatted mask information. The third processing device compares the first and second writer-formatted mask information to find differences therebetween. The storage device stores the mask design information, and the first and second writer-formatted mask information.