Abstract: An addition system of a reducing agent in a semiconductor manufacturing process includes pre-treatment and post-treatment gas concentration detection devices, a process exhaust gas treatment device, a reducing agent supply device, and an addition system control device. The process exhaust gas treatment device purifies exhaust gas of a semiconductor manufacturing process and emits a post-treatment gas. The reducing agent supply device supplies a reducing agent gas into the process exhaust gas treatment device. The post-treatment gas concentration detection device detects a residual concentration of the reducing agent gas in the post-treatment gas. The addition system control device calculates destruction and removal efficiency (DRE) for process gases according to pre-treatment and post-treatment gas concentrations, and, according to the DRE and the residual concentration, sends a signal to the reducing agent supply device to control the amount of the reducing agent gas added.

Abstract: A device and method of simultaneously removing flammable gases and nitrous oxide are provided. The device includes a thermal oxidation chamber, a high-temperature resistant dust filter, and a catalyst chamber. The thermal oxidation chamber is configured to receive an exhaust gas from a process tool. The exhaust gas includes flammable gases and nitrous oxide. The thermal oxidation chamber has a first exhaust pipe to emit nitrous oxide and dust generated after the exhaust gas is thermally oxidized. The high-temperature resistant dust filter receives dust and nitrous oxide from the first exhaust pipe, wherein the high-temperature resistant dust filter has a filter fiber net and a second exhaust pipe, and the second exhaust pipe is configured to emit nitrous oxide. The catalyst chamber receives nitrous oxide from the second exhaust pipe, wherein the catalyst chamber has a nitrous oxide decomposition catalyst to decompose nitrous oxide into nitrogen and oxygen.

Abstract: An air purifier and a purifying method are provided. The air purifier includes a housing, a sterilization and ozone-generating unit, a physical filter, a first ozone-removing unit, and a cover. The housing has a sidewall and a bottom surface to define a processing space, wherein an upper end of the housing has an air inlet and the sidewall has an air outlet. The sterilization and ozone-generating unit is disposed in the processing space. The physical filter is disposed in the processing space, extends along the sidewall, and surrounds the sterilization and ozone-generating unit. The first ozone-removing unit is disposed between the physical filter and the sidewall. The cover is openably disposed at the air inlet.

Abstract: A sterilization device with dose function is provided. The sterilization device includes a sterilization container, an ultraviolet sterilization module, an ozone sensing module, a sterilization time counter, a dose controller and an ozone removal module. The ultraviolet sterilization module is disposed in the sterilization container to sterilize an article by emitting an ultraviolet light. The ozone sensing module is used to sense an ozone concentration of the sterilization container. The sterilization time counter is used to calculate a sterilization time. The dose controller is used to receive a sensing signal of the ozone concentration and a counting signal of the sterilization time to obtain an ozone dose. The ozone removal module is disposed in the sterilization container to remove or purify the ozone and reduce the ozone concentration in the sterilization container.

Abstract: An air purifier and a purifying method are provided. The air purifier includes a housing, a sterilization and ozone-generating unit, a physical filter, a first ozone-removing unit, and a cover. The housing has a sidewall and a bottom surface to define a processing space, wherein an upper end of the housing has an air inlet and the sidewall has an air outlet. The sterilization and ozone-generating unit is disposed in the processing space. The physical filter is disposed in the processing space, extends along the sidewall, and surrounds the sterilization and ozone-generating unit. The first ozone-removing unit is disposed between the physical filter and the sidewall. The cover is openably disposed at the air inlet.