Patents by Inventor Ichiki Takemoto
Ichiki Takemoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8476473Abstract: A compounds represented by the Formula (I) or the Formula (I?). wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q?1 to Q?4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.Type: GrantFiled: September 1, 2009Date of Patent: July 2, 2013Assignee: Sumitomo Chemical Company, LimitedInventors: Ichiki Takemoto, Nobuo Ando, Mitsuhiro Hata
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Patent number: 8378016Abstract: The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.Type: GrantFiled: March 18, 2011Date of Patent: February 19, 2013Assignee: Sumitomo Chemical Company, LimitedInventors: Nobuo Ando, Ichiki Takemoto, Isao Yoshida, Yukako Harada
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Patent number: 8329377Abstract: An imide compound represented by the formula (I): wherein R1 represents a C1-C20 aliphatic hydrocarbon group etc., W1 represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., and A represents a group represented by the formula (I-1): wherein A1 represents —CH2—CH2— etc., and a chemically amplified resist composition containing the same.Type: GrantFiled: July 21, 2009Date of Patent: December 11, 2012Assignee: Sumitomo Chemical Company, LimitedInventors: Ichiki Takemoto, Tatsuro Masuyama, Takashi Hiraoka
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Patent number: 8173350Abstract: An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R1 represents a C1-C30 aliphatic hydrocarbon group etc., R2 represents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.Type: GrantFiled: July 21, 2009Date of Patent: May 8, 2012Assignee: Sumitomo Chemical Company, LimitedInventors: Tatsuro Masuyama, Kazuhiko Hashimoto, Takashi Hiraoka, Ichiki Takemoto
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Patent number: 8158329Abstract: The present invention provides a compound represented by the formula (I): wherein P1, P2, P3, P4 and P5 each independently represents a hydrogen atom etc., and at least one selected from the group consisting of R1, R2, R3, R4, R5, R6, R7, R8 and R9 is the group represented by the formula (II): wherein X1 and X2 each independently represent a hydrogen atom etc., n represents an integer of 1 to 4, Z1 represents a C1-C6 alkyl group etc., and ring Y represents an alicyclic hydrocarbon group, and the others each independently represent a hydrogen atom, a C1-C6 alkyl group or a hydroxyl group, and a chemically amplified resist composition containing the same.Type: GrantFiled: December 4, 2009Date of Patent: April 17, 2012Assignee: Sumitomo Chemical Company, LimitedInventors: Ichiki Takemoto, Nobuo Ando
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Patent number: 8110336Abstract: A resin comprising a structural unit represented by the formula (I): wherein Q1 and Q2 represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more —CH2— may be replaced by —O— etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion.Type: GrantFiled: September 18, 2009Date of Patent: February 7, 2012Assignee: Sumitomo Chemical Company, LimitedInventors: Ichiki Takemoto, Nobuo Ando
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Patent number: 8071270Abstract: The present invention provides a polyhydric compound represented by the formula (I): wherein R51 to R67 each independently represent a hydrogen atom etc., at least one selected from the group consisting of R1 to R5 is a group represented by the formula (II): wherein Q1 and Q2 each independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., and A+ represents an organic counter ion, and the others are hydrogen atoms or groups represented by the formula (III): wherein X1 to X4 each independently represent a hydrogen atom etc., n represents an integer of 0 to 3, W represents any one of the following groups: Z1 represents a C1-C6 alkyl group etc., and ring Y represents a C3-C20 alicyclic hydrocarbon group, and a chemically amplified resist composition containing the same.Type: GrantFiled: February 23, 2009Date of Patent: December 6, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Ichiki Takemoto, Nobuo Ando
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Patent number: 8062830Abstract: The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the content of the structural unit (b1) based on the total units of the resin (B) is less than 10 mol %.Type: GrantFiled: April 17, 2009Date of Patent: November 22, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Yusuke Fuji, Junji Shigematsu, Takayuki Miyagawa, Nobuo Ando, Ichiki Takemoto
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Patent number: 8057983Abstract: The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the amount of the resin (B) is 2 parts by weight or less per 100 parts by weight of the resin (A).Type: GrantFiled: April 17, 2009Date of Patent: November 15, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Yusuke Fuji, Junji Shigematsu, Takayuki Miyagawa, Nobuo Ando, Ichiki Takemoto
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Publication number: 20110236827Abstract: The present invention provides a resin obtained by reacting a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a C1-C6 alkyl group, R2, R3 and R4 each independently represents a C1-C6 alkyl group and R1, R2, R3, R4 and A1 are bonded to form a ring, A1 represents a C1-C20 saturated hydrocarbon group in which one or more —CH2— can be replaced by —O—, B1 and B2 each independently represent a C1-C6 alkylene group, L1 and L2 each independently represent a halogen atom, —O—CH?CH2, —O—CH?CH(CH3) or —O—SO2—R? in which R? represents a C1-C6 alkyl group or a C6-C20 aryl group, with a polyhydric phenol compound.Type: ApplicationFiled: March 23, 2011Publication date: September 29, 2011Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Ichiki TAKEMOTO, Nobuo ANDO
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Publication number: 20110189610Abstract: The present invention provides a photoresist composition comprising a compound represented by the formula (I): wherein R1, R2, R3 and R4 independently represent a hydrogen atom etc., X1 to X8 independently represent a hydrogen atom or a group represented by the formula (II): wherein R11 and R12 independently represent a hydrogen atom etc., m represents an integer of 1 to 4, R13 represents a C1-C6 alkyl group etc., and ring Y1 represents a C3-C20 saturated hydrocarbon ring, and an acid generator represented by the formula (B1): wherein Q1 and Q2 independently represent a fluorine atom etc., Lb1 represents a C1-C17 saturated divalent hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, Y represents a C1-C18 aliphatic hydrocarbon group etc., and Z+ represents an organic cation.Type: ApplicationFiled: February 1, 2011Publication date: August 4, 2011Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Nobuo ANDO, Ichiki TAKEMOTO
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Publication number: 20110165519Abstract: The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.Type: ApplicationFiled: March 18, 2011Publication date: July 7, 2011Inventors: Nobuo ANDO, Ichiki TAKEMOTO, Isao YOSHIDA, Yukako HARADA
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Patent number: 7932334Abstract: The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.Type: GrantFiled: December 21, 2006Date of Patent: April 26, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Nobuo Ando, Ichiki Takemoto, Isao Yoshida, Yukako Harada
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Publication number: 20100279226Abstract: The present invention has the object of providing a method of manufacturing a resist pattern in which an extremely fine and highly accurate resist pattern can be formed which is obtained using the resist composition for forming a first resist pattern in a multi-patterning method such as a double patterning method. The resist processing method comprising; forming a first resist film by applying a first resist composition onto a substrate and drying, the first resist composition comprising a resin (A), a photo acid generator (B) and a cross-linking agent (C), the resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution but of being rendered soluble in alkali aqueous solution through the action of an acid; prebaking; exposure processing; post-exposure baking; developing; hard-baking the first resist pattern; and obtaining a second resist film; pre-baking; exposure processing; post-exposure baking; developing to obtain a second resist pattern.Type: ApplicationFiled: December 22, 2008Publication date: November 4, 2010Inventors: Mitsuhiro Hata, Yoshiyuki Takata, Satoshi Yamaguchi, Ichiki Takemoto, Takayuki Miyagawa, Yusuke Fuji
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Patent number: 7794914Abstract: The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group, a resin (B) which contains a structural unit (b2) having a fluorine-containing group and at least one structural unit selected from a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure, and an acid generator.Type: GrantFiled: February 12, 2007Date of Patent: September 14, 2010Assignee: Sumitomo Chemical Company, LimitedInventors: Nobuo Ando, Yusuke Fuji, Ichiki Takemoto
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Publication number: 20100151380Abstract: A resist composition comprising: (A) a resin being insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, (B) a polyhydric phenol compound represented by the formula (1): wherein at least one selected from the group consisting of R1, R2, R3, R4, and R5 is a group represented by the formula (2): wherein X1 and X2 each independently represent a hydrogen atom etc., n represents an integer of 1 to 4, Z1 represents a C1-C6 alkyl group etc., and ring Y represents an alicyclic hydrocarbon group, and the others are hydrogen atoms, and (C) an acid generator.Type: ApplicationFiled: December 8, 2009Publication date: June 17, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Nobuo ANDO, Ichiki TAKEMOTO
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Publication number: 20100151379Abstract: The present invention provides a compound represented by the formula (I): wherein P1, P2, P3, P4 and P5 each independently represents a hydrogen atom etc., and at least one selected from the group consisting of R1, R2, R3, R4, R5, R6, R7, R8 and R9 is the group represented by the formula (II): wherein X1 and X2 each independently represent a hydrogen atom etc., n represents an integer of 1 to 4, Z1 represents a C1-C6 alkyl group etc., and ring Y represents an alicyclic hydrocarbon group, and the others each independently represent a hydrogen atom, a C1-C6 alkyl group or a hydroxyl group, and a chemically amplified resist composition containing the same.Type: ApplicationFiled: December 4, 2009Publication date: June 17, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Ichiki Takemoto, Nobuo Ando
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Publication number: 20100075257Abstract: A resin comprising a structural unit represented by the formula (I): wherein Q1 and Q2 represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more —CH2— may be replaced by —O— etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion.Type: ApplicationFiled: September 18, 2009Publication date: March 25, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Ichiki TAKEMOTO, Nobuo ANDO
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Publication number: 20100055609Abstract: A compounds represented by the Formula (I) or the Formula (I?). wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q?1 to Q?4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.Type: ApplicationFiled: September 1, 2009Publication date: March 4, 2010Inventors: Ichiki TAKEMOTO, Nobuo Ando, Mitsuhiro Hata
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Publication number: 20100028807Abstract: An imide compound represented by the formula (I): wherein R1 represents a C1-C20 aliphatic hydrocarbon group etc., W1 represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., and A represents a group represented by the formula (I-1): wherein A1 represents —CH2—CH2— etc., and a chemically amplified resist composition containing the same.Type: ApplicationFiled: July 21, 2009Publication date: February 4, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LTD.Inventors: Ichiki TAKEMOTO, Tatsuro MASUYAMA, Takashi HIRAOKA