Patents by Inventor Ichiro Amasaki
Ichiro Amasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230094960Abstract: The present disclosure provides a composition containing a compound represented by General Formula (1) and a polymer compound, in which a content of a chloride ion is less than 1.5 ppm with respect to a total mass of the composition, and provides a compound. In General Formula (1), Het1 represents a divalent aromatic heterocyclic residue of a 5-membered ring or a 6-membered ring, Xa, Xb, Xc, and Xd each independently represent a heteroatom, Ya, Yb, Yc, Yd, Ye and Yf each independently represent a heteroatom or a carbon atom, and two 6-membered rings bonded to Het1 each independently may have a double bond.Type: ApplicationFiled: November 24, 2022Publication date: March 30, 2023Applicant: FUJIFILM CorporationInventors: Ichiro AMASAKI, Keizo KIMURA, Daisuke SASAKI, Yukio TANI
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Patent number: 8975314Abstract: There is provided a new triazine-based compound which is useful as an ultraviolet absorber having excellent light resistance, heat resistance and ultraviolet ray shielding effect. A compound represented by the following general formula (1), in the general formula (1), L1 represents a divalent to decavalent aromatic ring residue or a divalent to decavalent heterocycle residue, n1 represents an integer of 2 to 10, X1 represents a hydrogen atom or a substituent, R1a, R1b, R1c and R1d each independently represent a hydrogen atom or a substituent and may be bonded to each other to form a ring.Type: GrantFiled: March 28, 2014Date of Patent: March 10, 2015Assignee: FUJIFILM CorporationInventors: Ichiro Amasaki, Keizo Kimura
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Patent number: 8957140Abstract: To provide a novel triazine-based compound exhibiting an ultraviolet blocking effect even in the long-wavelength region and being useful as an ultraviolet absorber with excellent light resistance, and to provide an ultraviolet absorber and a resin composition, which can maintain a long-wavelength ultraviolet-blocking effect for a long period of time. A compound represented by the following formula (1): wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent excluding OH, provided that at least one substituent represents a substituent having a Hammett's ?p value of 0.3 or more and substituents may combine with each other to form a ring, and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, provided that substituents may combine with each other to form a ring.Type: GrantFiled: July 28, 2010Date of Patent: February 17, 2015Assignee: FUJIFILM CorporationInventors: Ichiro Amasaki, Keizo Kimura, Yukie Watanabe, Kyosuke Tsumura, Hiroshi Yokoyama, Takumi Nakamura
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Publication number: 20140213703Abstract: There is provided a new triazine-based compound which is useful as an ultraviolet absorber having excellent light resistance, heat resistance and ultraviolet ray shielding effect. A compound represented by the following general formula (1), in the general formula (1), L1 represents a divalent to decavalent aromatic ring residue or a divalent to decavalent heterocycle residue, n1 represents an integer of 2 to 10, X1 represents a hydrogen atom or a substituent, R1a, R1b, R1c and R1d each independently represent a hydrogen atom or a substituent and may be bonded to each other to form a ring.Type: ApplicationFiled: March 28, 2014Publication date: July 31, 2014Applicant: FUJIFILM CorporationInventors: Ichiro AMASAKI, Keizo KIMURA
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Publication number: 20140213704Abstract: A compound represented by the following general formula (1), in the general formula (1), X1a and X1b represent a hydrogen atom or a substituent, Y1 represents a substituent having a dissociative proton, Z1a and Z1b each independently represent heteroatom or a carbon atom, Q1 represents an atomic group which is required to form an aromatic heterocycle together with Z1a and Z1b.Type: ApplicationFiled: March 28, 2014Publication date: July 31, 2014Applicant: FUJIFILM CorporationInventors: Ichiro AMASAKI, Keizo KIMURA
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Patent number: 8748520Abstract: A polycarbonate resin composition comprising a compound represented by the following formula (1): wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent provided that OH is excluded, at least one of the substituents represents a substituent having a Hammett's ?p value of 0.3 or more, and the substituents may be combined each other to form a ring; and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, and the substituents may be combined each other to form a ring.Type: GrantFiled: September 27, 2010Date of Patent: June 10, 2014Assignee: FUJIFILM CorporationInventors: Takashi Kitagawa, Ichiro Amasaki, Yukie Watanabe, Keizo Kimura
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Publication number: 20140084578Abstract: There is provided a compound represented by the following formula (1): wherein each of R1a to R1k independently represents a hydrogen atom or a monovalent substituent, the substituents may combine with each other to form a ring, each of M1a and M1b independently represents a hydrogen atom or a monovalent counter cation, Y1 represents a nitrogen atom or a carbon atom having a hydrogen atom or monovalent substituent, A1 represents an aromatic group, and the aromatic group represented by A1 may contain a heteroatom or may have a substituent.Type: ApplicationFiled: September 25, 2013Publication date: March 27, 2014Applicant: FUJIFILM CorporationInventors: Kazunari YAGI, Shinya HAYASHI, Yutaro NORIZUKI, Takashi IIZUMI, Ichiro AMASAKI, Hiroshi YAMADA, Shigeaki TANAKA
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Patent number: 8623990Abstract: To provide a polyester resin composition being able to maintain a long-wavelength ultraviolet-blocking effect for a long period of time, ensuring high solubility for a solvent, and having excellent light resistance. A polyester resin composition comprising a compound represented by the following formula (1) and a polyester resin: wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent excluding OH, at least one of the substituents represents a substituent having a positive Hammett's ?p value, and the substituents may combine with each other to form a ring; and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, and the substituents may combine with each other to form a ring.Type: GrantFiled: January 13, 2011Date of Patent: January 7, 2014Assignee: FUJIFILM CorporationInventors: Yukie Watanabe, Ichiro Amasaki, Keizo Kimura, Youichi Nagai
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Patent number: 8541488Abstract: A formed resin article, containing a compound and a polymer substance, wherein the compound has a maximum absorption wavelength in a range of 400 nm or less, measured in a solution of the compound, wherein the compound is contained in the polymer substance in a quantity of 5 g/m2 or less, and wherein a light transmittance of the article at a wavelength of 410 nm is 5% or less.Type: GrantFiled: March 24, 2009Date of Patent: September 24, 2013Assignee: FUJIFILM CorporationInventors: Ichiro Amasaki, Keizo Kimura, Youichiro Takeshima
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Publication number: 20120301696Abstract: To provide a polyester resin composition being able to maintain a long-wavelength ultraviolet-blocking effect for a long period of time, ensuring high solubility for a solvent, and having excellent light resistance. A polyester resin composition comprising a compound represented by the following formula (1) and a polyester resin: wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent excluding OH, at least one of the substituents represents a substituent having a positive Hammett's ?p value, and the substituents may combine with each other to form a ring; and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, and the substituents may combine with each other to form a ring.Type: ApplicationFiled: January 13, 2011Publication date: November 29, 2012Applicant: FUJIFILM CORPORATIONInventors: Yukie Watanabe, Ichiro Amasaki, Keizo Kimura, Youichi Nagai
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Publication number: 20120136098Abstract: To provide a novel triazine-based compound exhibiting an ultraviolet blocking effect even in the long-wavelength region and being useful as an ultraviolet absorber with excellent light resistance, and to provide an ultraviolet absorber and a resin composition, which can maintain a long-wavelength ultraviolet-blocking effect for a long period of time. A compound represented by the following formula (1): wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent excluding OH, provided that at least one substituent represents a substituent having a Hammett's ?p value of 0.3 or more and substituents may combine with each other to form a ring, and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, provided that substituents may combine with each other to form a ring.Type: ApplicationFiled: July 28, 2010Publication date: May 31, 2012Applicant: FUJIFILM CORPORATIONInventors: Ichiro Amasaki, Keizo Kimura, Yukie Watanabe, Kyosuke Tsumura, Hiroshi Yokoyama, Takumi Nakamura
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Publication number: 20120053343Abstract: A compound represented by the following formula (1): wherein each of R1b, R1c, R1d, R1g, R1h, R1i, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, the monovalent substituents may combine with each other to form a ring, provided that at least one of R1c and R1h represents a hydrogen atom or a substituent having a positive ?p value of the Hammett's rule, each of R1a, R1e, R1f and R1j independently represents a hydrogen atom or a monovalent substituent excluding —NHY1 and —OH, Y1 represents —COR1q or —SO2R1r, and each of R1q and R1r independently represents a monovalent substituent.Type: ApplicationFiled: August 31, 2011Publication date: March 1, 2012Applicant: FUJIFILM CORPORATIONInventors: Ichiro AMASAKI, Keizo KIMURA, Kyosuke TSUMURA
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Patent number: 8044123Abstract: An ultraviolet absorber composition is provided and includes: a compound represented by formula (I); and an ultraviolet absorber having a maximum absorption at a wavelength of from 340 to 400 nm: R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, and R1j each independently represent a hydrogen atom or a monovalent substituent except OH, or adjacent two of R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, and R1j may be taken together to form a ring; R1k, R1m, R1n, and R1p each independently represent a hydrogen atom or a monovalent substituent, or adjacent two of R1k, R1m, R1n, and R1p may be taken together to form a ring; and at least one of R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, R1j, R1k, R1m, R1n, and R1p is a substituent having a positive ?p value in Hammett equation.Type: GrantFiled: June 22, 2010Date of Patent: October 25, 2011Assignee: FUJIFILM CorporationInventors: Ichiro Amasaki, Keizo Kimura
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Publication number: 20110186791Abstract: An ultraviolet absorbent composition, containing at least one kind of specific ultraviolet absorbent as exemplified below, and at least one kind of specific compound as exemplified below.Type: ApplicationFiled: March 30, 2009Publication date: August 4, 2011Applicant: FUJIFILM CorporationInventors: Kazushi Furukawa, Keizo Kimura, Youichiro Takeshima, Ichiro Amasaki
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Publication number: 20110092619Abstract: A formed resin article, containing a compound and a polymer substance, wherein the compound has a maximum absorption wavelength in a range of 400 nm or less, measured in a solution of the compound, wherein the compound is contained in the polymer substance in a quantity of 5 g/m2 or less, and wherein a light transmittance of the article at a wavelength of 410 nm is 5% or less.Type: ApplicationFiled: March 24, 2009Publication date: April 21, 2011Applicant: FUJIFILM CorporationInventors: Ichiro Amasaki, Keizo Kimura, Youichiro Takeshima
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Publication number: 20110077331Abstract: A polycarbonate resin composition comprising a compound represented by the following formula (1): wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent provided that OH is excluded, at least one of the substituents represents a substituent having a Hammett's ?p value of 0.3 or more, and the substituents may be combined each other to form a ring; and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, and the substituents may be combined each other to form a ring.Type: ApplicationFiled: September 27, 2010Publication date: March 31, 2011Applicant: FUJIFILM CORPORATIONInventors: Takashi Kitagawa, Ichiro Amasaki, Yukie Watanabe, Keizo Kimura
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Publication number: 20110077330Abstract: A polycarbonate resin composition containing a compound represented by the following formula (1): wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent excluding —OH, at least one of the substituents represents a substituent having a positive Hammett's ?p value, and the substituents may be combined each other to form a ring; each of R1f, R1g, R1h, R1i and R1j independently represents a hydrogen atom or a monovalent substituent excluding —OH, and the substituents may be combined each other to form a ring; and each of R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, and the substituents may be combined each other to form a ring.Type: ApplicationFiled: September 27, 2010Publication date: March 31, 2011Applicant: FUJIFILM CorporationInventors: Ichiro Amasaki, Keizo Kimura
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Patent number: 7897761Abstract: A compound represented by the following Formula (1): wherein, Het1 represents a bivalent five- or six-membered aromatic heterocyclic residue and may further be substituted; Xa to Xd each independently represent a heteroatom and may further be substituted; Ya to Yf each independently represent a heteroatom or a carbon atom and may further be substituted; the ring bound to Het1 may have a double bond at any position.Type: GrantFiled: March 28, 2008Date of Patent: March 1, 2011Assignee: Fujifilm CorporationInventors: Ichiro Amasaki, Naoyuki Hanaki
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Publication number: 20110024701Abstract: An ultraviolet absorbent composition, comprising: at least one kind of ultraviolet absorbent (A) that is a compound represented by the following Formula (1); and at least one kind of ultraviolet absorbent (B) that is a compound where absorbance at 320 nm is 20% or more of absorbance at absorption maximum wavelength in the range of from 270 nm to 400 nm and the absorption maximum wavelength is 380 nm or less: wherein Het1 represents a bivalent five- or six-membered aromatic heterocyclic residue; the aromatic heterocyclic residue may have a substituent; Xa, Xb, Xc and Xd each independently represent a heteroatom; Xa to Xd may have a substituent; Ya, Yb, Yc, Yd, Ye and Yf each independently represent a heteroatom or a carbon atom; Ya to Yf may have a substituent; and the rings bound to Het1 may have a double bond at any position.Type: ApplicationFiled: March 30, 2009Publication date: February 3, 2011Applicant: Fujifilm CorporationInventors: Kazushi Furukawa, Keizo Kimura, Youichiro Takeshima, Ichiro Amasaki
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Publication number: 20100324181Abstract: An ultraviolet absorber composition is provided and includes: a compound represented by formula (I); and an ultraviolet absorber having a maximum absorption at a wavelength of from 340 to 400 nm: R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, and R1j each independently represent a hydrogen atom or a monovalent substituent except OH, or adjacent two of R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, and R1j may be taken together to form a ring; R1k, R1m, R1n, and R1p each independently represent a hydrogen atom or a monovalent substituent, or adjacent two of R1k, R1m, R1n, and R1p may be taken together to form a ring; and at least one of R1a, R1b, R1c, R1d, R1c, R1f, R1g, R1h, R1i, R1j, R1k, R1m, R1n, and R1p is a substituent having a positive ?p value in Hammett equation.Type: ApplicationFiled: June 22, 2010Publication date: December 23, 2010Applicant: FUJIFILM CorporationInventors: Ichiro AMASAKI, Keizo KIMURA