Patents by Inventor Ichiro Amasaki

Ichiro Amasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230094960
    Abstract: The present disclosure provides a composition containing a compound represented by General Formula (1) and a polymer compound, in which a content of a chloride ion is less than 1.5 ppm with respect to a total mass of the composition, and provides a compound. In General Formula (1), Het1 represents a divalent aromatic heterocyclic residue of a 5-membered ring or a 6-membered ring, Xa, Xb, Xc, and Xd each independently represent a heteroatom, Ya, Yb, Yc, Yd, Ye and Yf each independently represent a heteroatom or a carbon atom, and two 6-membered rings bonded to Het1 each independently may have a double bond.
    Type: Application
    Filed: November 24, 2022
    Publication date: March 30, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Ichiro AMASAKI, Keizo KIMURA, Daisuke SASAKI, Yukio TANI
  • Patent number: 8975314
    Abstract: There is provided a new triazine-based compound which is useful as an ultraviolet absorber having excellent light resistance, heat resistance and ultraviolet ray shielding effect. A compound represented by the following general formula (1), in the general formula (1), L1 represents a divalent to decavalent aromatic ring residue or a divalent to decavalent heterocycle residue, n1 represents an integer of 2 to 10, X1 represents a hydrogen atom or a substituent, R1a, R1b, R1c and R1d each independently represent a hydrogen atom or a substituent and may be bonded to each other to form a ring.
    Type: Grant
    Filed: March 28, 2014
    Date of Patent: March 10, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Ichiro Amasaki, Keizo Kimura
  • Patent number: 8957140
    Abstract: To provide a novel triazine-based compound exhibiting an ultraviolet blocking effect even in the long-wavelength region and being useful as an ultraviolet absorber with excellent light resistance, and to provide an ultraviolet absorber and a resin composition, which can maintain a long-wavelength ultraviolet-blocking effect for a long period of time. A compound represented by the following formula (1): wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent excluding OH, provided that at least one substituent represents a substituent having a Hammett's ?p value of 0.3 or more and substituents may combine with each other to form a ring, and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, provided that substituents may combine with each other to form a ring.
    Type: Grant
    Filed: July 28, 2010
    Date of Patent: February 17, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Ichiro Amasaki, Keizo Kimura, Yukie Watanabe, Kyosuke Tsumura, Hiroshi Yokoyama, Takumi Nakamura
  • Publication number: 20140213703
    Abstract: There is provided a new triazine-based compound which is useful as an ultraviolet absorber having excellent light resistance, heat resistance and ultraviolet ray shielding effect. A compound represented by the following general formula (1), in the general formula (1), L1 represents a divalent to decavalent aromatic ring residue or a divalent to decavalent heterocycle residue, n1 represents an integer of 2 to 10, X1 represents a hydrogen atom or a substituent, R1a, R1b, R1c and R1d each independently represent a hydrogen atom or a substituent and may be bonded to each other to form a ring.
    Type: Application
    Filed: March 28, 2014
    Publication date: July 31, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Ichiro AMASAKI, Keizo KIMURA
  • Publication number: 20140213704
    Abstract: A compound represented by the following general formula (1), in the general formula (1), X1a and X1b represent a hydrogen atom or a substituent, Y1 represents a substituent having a dissociative proton, Z1a and Z1b each independently represent heteroatom or a carbon atom, Q1 represents an atomic group which is required to form an aromatic heterocycle together with Z1a and Z1b.
    Type: Application
    Filed: March 28, 2014
    Publication date: July 31, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Ichiro AMASAKI, Keizo KIMURA
  • Patent number: 8748520
    Abstract: A polycarbonate resin composition comprising a compound represented by the following formula (1): wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent provided that OH is excluded, at least one of the substituents represents a substituent having a Hammett's ?p value of 0.3 or more, and the substituents may be combined each other to form a ring; and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, and the substituents may be combined each other to form a ring.
    Type: Grant
    Filed: September 27, 2010
    Date of Patent: June 10, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Takashi Kitagawa, Ichiro Amasaki, Yukie Watanabe, Keizo Kimura
  • Publication number: 20140084578
    Abstract: There is provided a compound represented by the following formula (1): wherein each of R1a to R1k independently represents a hydrogen atom or a monovalent substituent, the substituents may combine with each other to form a ring, each of M1a and M1b independently represents a hydrogen atom or a monovalent counter cation, Y1 represents a nitrogen atom or a carbon atom having a hydrogen atom or monovalent substituent, A1 represents an aromatic group, and the aromatic group represented by A1 may contain a heteroatom or may have a substituent.
    Type: Application
    Filed: September 25, 2013
    Publication date: March 27, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Kazunari YAGI, Shinya HAYASHI, Yutaro NORIZUKI, Takashi IIZUMI, Ichiro AMASAKI, Hiroshi YAMADA, Shigeaki TANAKA
  • Patent number: 8623990
    Abstract: To provide a polyester resin composition being able to maintain a long-wavelength ultraviolet-blocking effect for a long period of time, ensuring high solubility for a solvent, and having excellent light resistance. A polyester resin composition comprising a compound represented by the following formula (1) and a polyester resin: wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent excluding OH, at least one of the substituents represents a substituent having a positive Hammett's ?p value, and the substituents may combine with each other to form a ring; and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, and the substituents may combine with each other to form a ring.
    Type: Grant
    Filed: January 13, 2011
    Date of Patent: January 7, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Yukie Watanabe, Ichiro Amasaki, Keizo Kimura, Youichi Nagai
  • Patent number: 8541488
    Abstract: A formed resin article, containing a compound and a polymer substance, wherein the compound has a maximum absorption wavelength in a range of 400 nm or less, measured in a solution of the compound, wherein the compound is contained in the polymer substance in a quantity of 5 g/m2 or less, and wherein a light transmittance of the article at a wavelength of 410 nm is 5% or less.
    Type: Grant
    Filed: March 24, 2009
    Date of Patent: September 24, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Ichiro Amasaki, Keizo Kimura, Youichiro Takeshima
  • Publication number: 20120301696
    Abstract: To provide a polyester resin composition being able to maintain a long-wavelength ultraviolet-blocking effect for a long period of time, ensuring high solubility for a solvent, and having excellent light resistance. A polyester resin composition comprising a compound represented by the following formula (1) and a polyester resin: wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent excluding OH, at least one of the substituents represents a substituent having a positive Hammett's ?p value, and the substituents may combine with each other to form a ring; and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, and the substituents may combine with each other to form a ring.
    Type: Application
    Filed: January 13, 2011
    Publication date: November 29, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Yukie Watanabe, Ichiro Amasaki, Keizo Kimura, Youichi Nagai
  • Publication number: 20120136098
    Abstract: To provide a novel triazine-based compound exhibiting an ultraviolet blocking effect even in the long-wavelength region and being useful as an ultraviolet absorber with excellent light resistance, and to provide an ultraviolet absorber and a resin composition, which can maintain a long-wavelength ultraviolet-blocking effect for a long period of time. A compound represented by the following formula (1): wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent excluding OH, provided that at least one substituent represents a substituent having a Hammett's ?p value of 0.3 or more and substituents may combine with each other to form a ring, and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, provided that substituents may combine with each other to form a ring.
    Type: Application
    Filed: July 28, 2010
    Publication date: May 31, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Ichiro Amasaki, Keizo Kimura, Yukie Watanabe, Kyosuke Tsumura, Hiroshi Yokoyama, Takumi Nakamura
  • Publication number: 20120053343
    Abstract: A compound represented by the following formula (1): wherein each of R1b, R1c, R1d, R1g, R1h, R1i, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, the monovalent substituents may combine with each other to form a ring, provided that at least one of R1c and R1h represents a hydrogen atom or a substituent having a positive ?p value of the Hammett's rule, each of R1a, R1e, R1f and R1j independently represents a hydrogen atom or a monovalent substituent excluding —NHY1 and —OH, Y1 represents —COR1q or —SO2R1r, and each of R1q and R1r independently represents a monovalent substituent.
    Type: Application
    Filed: August 31, 2011
    Publication date: March 1, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Ichiro AMASAKI, Keizo KIMURA, Kyosuke TSUMURA
  • Patent number: 8044123
    Abstract: An ultraviolet absorber composition is provided and includes: a compound represented by formula (I); and an ultraviolet absorber having a maximum absorption at a wavelength of from 340 to 400 nm: R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, and R1j each independently represent a hydrogen atom or a monovalent substituent except OH, or adjacent two of R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, and R1j may be taken together to form a ring; R1k, R1m, R1n, and R1p each independently represent a hydrogen atom or a monovalent substituent, or adjacent two of R1k, R1m, R1n, and R1p may be taken together to form a ring; and at least one of R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, R1j, R1k, R1m, R1n, and R1p is a substituent having a positive ?p value in Hammett equation.
    Type: Grant
    Filed: June 22, 2010
    Date of Patent: October 25, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Ichiro Amasaki, Keizo Kimura
  • Publication number: 20110186791
    Abstract: An ultraviolet absorbent composition, containing at least one kind of specific ultraviolet absorbent as exemplified below, and at least one kind of specific compound as exemplified below.
    Type: Application
    Filed: March 30, 2009
    Publication date: August 4, 2011
    Applicant: FUJIFILM Corporation
    Inventors: Kazushi Furukawa, Keizo Kimura, Youichiro Takeshima, Ichiro Amasaki
  • Publication number: 20110092619
    Abstract: A formed resin article, containing a compound and a polymer substance, wherein the compound has a maximum absorption wavelength in a range of 400 nm or less, measured in a solution of the compound, wherein the compound is contained in the polymer substance in a quantity of 5 g/m2 or less, and wherein a light transmittance of the article at a wavelength of 410 nm is 5% or less.
    Type: Application
    Filed: March 24, 2009
    Publication date: April 21, 2011
    Applicant: FUJIFILM Corporation
    Inventors: Ichiro Amasaki, Keizo Kimura, Youichiro Takeshima
  • Publication number: 20110077331
    Abstract: A polycarbonate resin composition comprising a compound represented by the following formula (1): wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent provided that OH is excluded, at least one of the substituents represents a substituent having a Hammett's ?p value of 0.3 or more, and the substituents may be combined each other to form a ring; and each of R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, and the substituents may be combined each other to form a ring.
    Type: Application
    Filed: September 27, 2010
    Publication date: March 31, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Takashi Kitagawa, Ichiro Amasaki, Yukie Watanabe, Keizo Kimura
  • Publication number: 20110077330
    Abstract: A polycarbonate resin composition containing a compound represented by the following formula (1): wherein each of R1a, R1b, R1c, R1d and R1e independently represents a hydrogen atom or a monovalent substituent excluding —OH, at least one of the substituents represents a substituent having a positive Hammett's ?p value, and the substituents may be combined each other to form a ring; each of R1f, R1g, R1h, R1i and R1j independently represents a hydrogen atom or a monovalent substituent excluding —OH, and the substituents may be combined each other to form a ring; and each of R1k, R1m, R1n and R1p independently represents a hydrogen atom or a monovalent substituent, and the substituents may be combined each other to form a ring.
    Type: Application
    Filed: September 27, 2010
    Publication date: March 31, 2011
    Applicant: FUJIFILM Corporation
    Inventors: Ichiro Amasaki, Keizo Kimura
  • Patent number: 7897761
    Abstract: A compound represented by the following Formula (1): wherein, Het1 represents a bivalent five- or six-membered aromatic heterocyclic residue and may further be substituted; Xa to Xd each independently represent a heteroatom and may further be substituted; Ya to Yf each independently represent a heteroatom or a carbon atom and may further be substituted; the ring bound to Het1 may have a double bond at any position.
    Type: Grant
    Filed: March 28, 2008
    Date of Patent: March 1, 2011
    Assignee: Fujifilm Corporation
    Inventors: Ichiro Amasaki, Naoyuki Hanaki
  • Publication number: 20110024701
    Abstract: An ultraviolet absorbent composition, comprising: at least one kind of ultraviolet absorbent (A) that is a compound represented by the following Formula (1); and at least one kind of ultraviolet absorbent (B) that is a compound where absorbance at 320 nm is 20% or more of absorbance at absorption maximum wavelength in the range of from 270 nm to 400 nm and the absorption maximum wavelength is 380 nm or less: wherein Het1 represents a bivalent five- or six-membered aromatic heterocyclic residue; the aromatic heterocyclic residue may have a substituent; Xa, Xb, Xc and Xd each independently represent a heteroatom; Xa to Xd may have a substituent; Ya, Yb, Yc, Yd, Ye and Yf each independently represent a heteroatom or a carbon atom; Ya to Yf may have a substituent; and the rings bound to Het1 may have a double bond at any position.
    Type: Application
    Filed: March 30, 2009
    Publication date: February 3, 2011
    Applicant: Fujifilm Corporation
    Inventors: Kazushi Furukawa, Keizo Kimura, Youichiro Takeshima, Ichiro Amasaki
  • Publication number: 20100324181
    Abstract: An ultraviolet absorber composition is provided and includes: a compound represented by formula (I); and an ultraviolet absorber having a maximum absorption at a wavelength of from 340 to 400 nm: R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, and R1j each independently represent a hydrogen atom or a monovalent substituent except OH, or adjacent two of R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, and R1j may be taken together to form a ring; R1k, R1m, R1n, and R1p each independently represent a hydrogen atom or a monovalent substituent, or adjacent two of R1k, R1m, R1n, and R1p may be taken together to form a ring; and at least one of R1a, R1b, R1c, R1d, R1c, R1f, R1g, R1h, R1i, R1j, R1k, R1m, R1n, and R1p is a substituent having a positive ?p value in Hammett equation.
    Type: Application
    Filed: June 22, 2010
    Publication date: December 23, 2010
    Applicant: FUJIFILM Corporation
    Inventors: Ichiro AMASAKI, Keizo KIMURA