Patents by Inventor Ichiro Ichikawa
Ichiro Ichikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11952423Abstract: A novel antibody that can be used as an anti-tumor agent and an anti-tumor agent that comprises, as an active ingredient, a molecule containing such an antibody.Type: GrantFiled: May 16, 2023Date of Patent: April 9, 2024Assignees: MIE UNIVERSITY, DAIICHI SANKYO COMPANY, LIMITEDInventors: Hiroshi Shiku, Yasushi Akahori, Kento Tanaka, Ayaka Yatsu, Junya Ichikawa, Toshiaki Ohtsuka, Shiho Kozuma, Ryuji Hashimoto, Makiko Nakayama, Naoya Shinozaki, Kensuke Nakamura, Ichiro Watanabe, Shinji Furuzono
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Patent number: 8399464Abstract: Disclosed is a triazole derivative(s) represented by the general formula (1) below or a pharmacologically acceptable salt(s) thereof. Also disclosed are a prodrug(s) of such a triazole derivative(s) and an HSP90 inhibitor(s) containing any one of them as an active constituent. (1) (In the formula, X represents a halogen atom, an optionally substituted alkyl group, an optionally substituted alkynyl group or the like; Y represents a mercapto group, a hydroxyl group, an optionally substituted sulfonyl group, an optionally substituted amino group or the like; and R represents an optionally substituted aryl or alkyl group or the like.Type: GrantFiled: March 8, 2006Date of Patent: March 19, 2013Assignee: Nippon Kayaku Kabushiki KaishaInventors: Hiroshi Kuramochi, Setsuko Niitsuma, Masaharu Nakamura, Yoshitaka Sato, Seiichi Saito, Arihiro Tomura, Yuh-ichiro Ichikawa, Yousuke Kasuga
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Publication number: 20080269218Abstract: Disclosed is a triazole derivative represented by the general formula (1) below or a pharmacologically acceptable salt thereof. Also disclosed are a prodrug of such a triazole derivative and an HSP90 inhibitor containing any one of them as an active constituent. (1) (In the formula, X represents a halogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group or the like; Y represents a mercapto group, a hydroxyl group, an optionally substituted sulfonyl group, an optionally substituted amino group or the like; and R represents an optionally substituted aryl or amino group or the like.Type: ApplicationFiled: March 8, 2006Publication date: October 30, 2008Inventors: Hiroshi Kuramochi, Setsuko Niitsuma, Masaharu Nakamura, Yoshitaka Sato, Seiichi Saito, Arihiro Tomura, Yuh-Ichiro Ichikawa, Yousuke Kasuga
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Patent number: 5610315Abstract: This invention relates to a process for the preparation of a 6,7-diacyl-7-deacetylforskolin derivative represented by the general formula: ##STR1## wherein R.sup.1 and R.sup.2 each stands for an acyl group and R.sup.3 stands for an aliphatic group having 2 to 3 carbon atoms, which comprises eliminating the acyl group at position 1 in a 1,6,7-triacyl-7-deacetylforskolin derivative represented by the general formula: ##STR2## wherein R.sup.1, R.sup.2 and R.sup.3 are as defined above, by solvolysis. The compound of the formula (I) is expected as medicine.Type: GrantFiled: May 16, 1995Date of Patent: March 11, 1997Assignee: Nippon Kayaku Kabushiki KaishaInventors: Tochiro Tatee, Akira Shiozawa, Hirotaka Yamamoto, Yuh-ichiro Ichikawa, Aya Ishikawa, Chikara Komuro, Kazuhisa Narita
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Patent number: 5484954Abstract: This invention relates to a process for the preparation of a 6,7-diacyl-7-deacetylforskolin derivative represented by the general formula: ##STR1## wherein R.sup.1 and R.sup.2 each stands for an acyl group and R.sup.3 stands for an aliphatic group having 2 to 3 carbon atoms, which comprises eliminating the acyl group at position 1 in a 1,6,7-triacyl-7-deacetylforskolin derivative represented by the general formula: ##STR2## wherein R.sup.1, R.sup.2 and R.sup.3 are as defined above, by solvolysis. The compound of the formula (I) is expected as medicine.Type: GrantFiled: January 19, 1994Date of Patent: January 16, 1996Assignee: Nippon Kayaku Kabushiki KaishaInventors: Tochiro Tatee, Akira Shiozawa, Hirotaka Yamamoto, Yuh-ichiro Ichikawa, Aya Narita
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Patent number: 5374625Abstract: A novel nucleic acid derivative represented by the following general formula (I) and physiologically acceptable salt thereof which are expected to have an antiviral activity: ##STR1## wherein B represents a nucleic acid base derivative; A.sup.1 and A.sup.2 represent, independently of each other, OR.sup.1 or OCOR.sup.1 ; R.sup.1 represents a hydrogen atom, a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group; l represents a number of 0 or 1; and m and n each represents an integer of 0-2; provided that when l and m are 0, n is 0 or 2.Type: GrantFiled: July 17, 1991Date of Patent: December 20, 1994Assignee: Nippon Kayaku Kabushiki KaishaInventors: Yuh-ichiro Ichikawa, Hiroshi Akaba, Yuka Sugawara, Akira Shiozawa, Kenichi Matsubara, Takemitsu Nagahata, Hiroo Hoshino, Jun-ichi Seki
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Patent number: 5324730Abstract: This invention relates to cyclobutane derivatives represented by the following general formula (1) and physiologically acceptable salts thereof: ##STR1## wherein B represents a nucleic acid base derivative, R.sup.1 and R.sup.2 independently represent hydrogen atom, dialkylaminoacyl group, 1,4-dihydro-1-methylnicotinoyl group or substituted phosphoric acid group, provided that either one of R.sup.1 and R.sup.2 is a group other than hydrogen atom.The compounds of this invention exhibit a high oral absorbability and are metabolized in vivo into the compounds of formula (1a). Accordingly, the compounds of this invention are expectedly useful as antiviral agent.Type: GrantFiled: May 22, 1991Date of Patent: June 28, 1994Assignee: Nippon Kayaku Kabushiki KaishaInventors: Yuh-ichiro Ichikawa, Hiroshi Akaba, Yuka Sugawara, Hideo Sugimura, Kazuhisa Narita, Akira Shiozawa, Kouwa Yamashita, Sayuri Kato, Yukihiro Nishiyama, Kenichi Matsubara, Takemitsu Nagahata
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Patent number: 5302730Abstract: This invention relates to a process for the preparation of a 6,7-diacyl-7-deacetylforskolin derivative represented by the general formula: ##STR1## wherein R.sup.1 and R.sup.2 each stands for an acyl group and R.sup.3 stands for an aliphatic group having 2 to 3 carbon atoms, which comprises eliminating the acyl group at position 1 in a 1,6,7-triacyl-7-deacetylforskolin derivative represented by the general formula: ##STR2## wherein R.sup.1, R.sup.2 and R.sup.3 are as defined above, by solvolysis. The compound of the formula (I) is expected as medicine.Type: GrantFiled: June 4, 1993Date of Patent: April 12, 1994Inventors: Tochiro Tatee, Akira Shiozawa, Hirotaka Yamamoto, Yuh-ichiro Ichikawa, Aya Narita, Chikara Komuro, Kazuhisa Narita
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Patent number: 4841051Abstract: The present invention relates to a phenylpiperazine derivative represented by the general formula: ##STR1## wherein R.sub.1 stands for a lower alkyl group; R.sub.2 stands for a group represented by the general formula: ##STR2## (wherein R.sub.3, R.sub.4 and R.sub.5 each stand for a hydrogen atom or a lower alkyl group and Y stands for CH or N); and n stands for an integer of 1 to 6,and pharmaceutically acceptable acid addition salts thereof, which exhibit an .alpha..sub.1 -blocking activity and therefore are expected to be useful as a hypotensive drug.Type: GrantFiled: December 1, 1986Date of Patent: June 20, 1989Assignee: Nippon Kayaku Kabushiki KaishaInventors: Akira Shiozawa, Yuh-Ichiro Ichikawa, Takashi Takahira
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Patent number: 4741989Abstract: A developer for positive photoresists which can improve the sensitivity and resolution of the resist is disclosed. The developer comprises an aqueous solution of a quaternary ammonium hydroxide represented by the formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are each an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 5 carbon atoms, and at least one development modifier selected from the group consisting of water-soluble aliphatic ketones, cyclic ethers, and tertiary amines, and optionally, at least one another development modifier selected from the group consisting of water-soluble primary amines and secondary amines.Type: GrantFiled: May 28, 1986Date of Patent: May 3, 1988Assignee: Sumitomo Chemical Company, LimitedInventors: Kenji Niwa, Ichiro Ichikawa
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Patent number: 4673554Abstract: A method for obtaining high-purity tantalum pentoxide is disclosed, which comprises the following steps:dissolving a crude tantalum-containing compound in an acid containing hydrofluoric acid;mixing and bringing the resulting acidic aqueous solution of the crude tantalum-containing compound into contact with an organic solution composed of a water-insoluble quaternary ammonium compound and a water-insoluble organic solvent, to extract the tantalum from said acidic aqueous solution into said organic solution;mixing said organic solution with an aqueous solution containing at least one compound selected from the group consisting of an inorganic acid and an ammonium salt, to remove any of the impurities that have partly been extracted into said organic solution together with tantalum from said organic solution;converting the tantalum in said organic solution to tantalum hydroxide by treatment with an alkali containing ammonium hydroxide; andprecipitating said tantalum hydroxide and separating it, followed by calType: GrantFiled: December 13, 1985Date of Patent: June 16, 1987Assignee: Sumitomo Chemical Company, LimitedInventors: Kenji Niwa, Ichiro Ichikawa
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Patent number: 4308273Abstract: This invention relates to the novel 1,6-naphthyridine derivatives useful as antidinic and/or cerebral circulation improver, such novel derivatives being represented by the following general formula: ##STR1## (wherein R is a C.sub.2-10 alkyl which may have hydroxyl, lower alkylcarbonyl, lower alkyloxycarbonyl or phenoxy as a substituent; a C.sub.2-10 unsaturated aliphatic hydrocarbon group having unsaturated double bond(s); a phenyl-lower alkyl which may have halogen, lower alkyl, lower alkoxy or lower alkylthio as substituent(s) attached to the phenyl ring; a cinnamyl which may have halogen, nitro, lower alkyl or lower alkoxy as substituent(s) attached to the phenyl ring; propargyl; 1-naphthylmethyl; 2-thenyl; cyclohexenyl; a cycloalkyl-lower alkyl with a 3- to 6-membered ring; 1/2(C.sub.2-4 alkylene); 1/2(butenylene), or diphenylmethyl, and in case two alkoxyl groups are present attached to the phenyl ring, they may be bonded to form a ring) and salt thereof.Type: GrantFiled: October 10, 1979Date of Patent: December 29, 1981Assignee: Nippon Kayaku Kabushiki KaishaInventors: Hiroshi Yamanaka, Takao Sakamoto, Akira Shiozawa, Yuh-Ichiro Ichikawa, Michio Ishikawa, Hiroshi Miyazaki
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Patent number: 4220738Abstract: By block-copolymerizing a mixture of an aromatic vinyl compound and a conjugated diene in two stages in an aliphatic hydrocarbon solvent, using an organomonolithium compound or an organodilithium compound as a polymerization initiator, a block copolymer is formed as a suspension polymer in a slurry state.The resulting block copolymer is very clear and excellent in mechanical properties, especially, strength, elongation and impact strength. It has a wide application in the field of general resins.Type: GrantFiled: March 28, 1978Date of Patent: September 2, 1980Assignee: Sumitomo Chemical Company, LimitedInventors: Tamotsu Miki, Shizuo Narisawa, Hideki Horiike, Ichiro Ichikawa
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Patent number: 4122134Abstract: By block-copolymerizing a vinyl aromatic compound and a conjugated diene in a hydrocarbon solvent with an organolithium compound as initiator, there is obtained a block copolymer which comprises in the molecule three blocks of homopolymerized vinyl aromatic compound, randomly copolymerized vinyl aromatic compound and conjugated diene, and homopolymerized diene, respectively. The resulting block copolymer is transparent and excellent in mechanical properties, and is suitable for use in the manufacture of sheeting, film, and various molded articles.Type: GrantFiled: August 23, 1977Date of Patent: October 24, 1978Assignee: Sumitomo Chemical Company, LimitedInventors: Tamotsu Miki, Shizuo Narisawa, Ichiro Ichikawa, Hideki Horiike
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Patent number: 4089913Abstract: In block-copolymerizing a vinyl aromatic compound and a conjugated diene in a hydrocarbon solvent using an organolithium compound as initiator, a transparent block copolymer resin characterized by having elastomeric random copolymer blocks may be produced by continuously adding a mixture of the vinyl aromatic compound and the conjugated diene. The block copolymer resin thus obtained is transparent, excellent in mechanical characteristics and may be used in the fields of sheetings, films, and various molded articles.Type: GrantFiled: February 27, 1976Date of Patent: May 16, 1978Assignee: Sumitomo Chemical Company, LimitedInventors: Tamotsu Miki, Shizuo Narisawa, Ichiro Ichikawa, Hideki Horiike
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Patent number: 4054616Abstract: A block copolymer resin having at one or both ends a copolymer block of a vinyl aromatic compound and a conjugated diene is obtained by subjecting a vinyl aromatic compound and a conjugated diene to 2- or 3-stage block copolymerization in a hydrocarbon solvent in the presence of a definite amount of a Lewis base compound using an organolithium compound as an initiator. The block copolymer resin is high in transparency and excellent in mechanical properties, and is successfully usable in the fields of sheets, films and various molded articles.Type: GrantFiled: May 10, 1976Date of Patent: October 18, 1977Assignee: Sumitomo Chemical Company, LimitedInventors: Tamotsu Miki, Shizuo Narisawa, Ichiro Ichikawa, Hideki Horiike