Patents by Inventor Ichiro Oki

Ichiro Oki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for evaluating roughness on silicon substrate surface
    Patent number: 5242831
    Abstract: A method for evaluating surface micro roughness of a silicon substrate includes the steps of soaking the silicon substrate in a mixture of hydrochloric acid of 30 to 40 vol %, hydrogen peroxide solution of 30 to 40 vol % and deionized water whose volume ratio is approximately 1:1:16.7, and measuring an amount of chlorine element incorporated into native oxide film on the silicon surface through the soaking process to evaluate the degree of the micro roughness on the silicon substrate surface.
    Type: Grant
    Filed: July 7, 1992
    Date of Patent: September 7, 1993
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Ichiro Oki