Patents by Inventor Ido Kofler

Ido Kofler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9846128
    Abstract: An inspection system that may include a first detection module, an illumination and collection module, and a processor. The illumination and collection module and the first detection module may be configured to execute one or more illumination and collection iterations. Each inspection iteration may include: illuminating with illuminating radiation multiple points of an object; (ii) directing first collected radiation from the multiple points of the object through one or more first exit pupil regions towards the first detection module; and (iii) generating first detection signals that may be indicative of the first collected radiation. The processor may be configured to process the first detection signals to provide a first mapping between (i) a characteristic of radiation at the first exit pupil, (ii) the multiple points of the object, and (iii) the multiple first exit pupil regions.
    Type: Grant
    Filed: January 19, 2016
    Date of Patent: December 19, 2017
    Assignee: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Harel Ilan, Ido Kofler, Ido Dolev
  • Publication number: 20170205359
    Abstract: An inspection system that may include a first detection module, an illumination and collection module, and a processor. The illumination and collection module and the first detection module may be configured to execute one or more illumination and collection iterations. Each inspection iteration may include: illuminating with illuminating radiation multiple points of an object; (ii) directing first collected radiation from the multiple points of the object through one or more first exit pupil regions towards the first detection module; and (iii) generating first detection signals that may be indicative of the first collected radiation. The processor may be configured to process the first detection signals to provide a first mapping between (i) a characteristic of radiation at the first exit pupil, (ii) the multiple points of the object, and (iii) the multiple first exit pupil regions.
    Type: Application
    Filed: January 19, 2016
    Publication date: July 20, 2017
    Inventors: Harel Ilan, Ido Kofler, Ido Dolev
  • Patent number: 9664907
    Abstract: A spatial beam shaper structure and a corresponding optical system are provided. The spatial beam shaper structure comprises a light collecting surface configured for affecting light impinging thereon to provide a substantially smooth light profile of at least one optical property, the light collecting surface having a pattern in the form of multiple surface regions comprising regions of at least two different optical properties arranged in an alternating fashion, wherein an interface region between each two locally adjacent regions of the different optical properties has the at least two different optical properties, to provide substantially smooth transition of said different optical properties within the interface region.
    Type: Grant
    Filed: July 21, 2014
    Date of Patent: May 30, 2017
    Assignee: Applied Materials Israel Ltd.
    Inventors: Yoav Berlatzky, Seffi Sadeh, Ido Kofler, Haim Eder, Michael Rudman, Hagay Famini
  • Publication number: 20160018660
    Abstract: A spatial beam shaper structure and a corresponding optical system are provided. The spatial beam shaper structure comprises a light collecting surface configured for affecting light impinging thereon to provide a substantially smooth light profile of at least one optical property, the light collecting surface having a pattern in the form of multiple surface regions comprising regions of at least two different optical properties arranged in an alternating fashion, wherein an interface region between each two locally adjacent regions of the different optical properties has the at least two different optical properties, to provide substantially smooth transition of said different optical properties within the interface region.
    Type: Application
    Filed: July 21, 2014
    Publication date: January 21, 2016
    Inventors: Yoav Berlatzky, Seffi Sadeh, Ido Kofler, Haim Eder, Michael Rudman, Hagay Famini
  • Patent number: 8614790
    Abstract: An optical inspection system for inspecting a patterned sample located in an inspection plane includes an illumination unit defining an illumination path, and a light collection unit defining a collection path, each path having a certain angular orientation with respect to the inspection plane. The illumination unit comprises an illumination mask located in a first spectral plane with respect to the inspection plane and the light collection unit comprises a collection mask located in a second spectral plane with respect to the inspection plane being conjugate to the first spectral plane. Arrangements of features of the first and second patterns are selected in accordance with a diffraction response from said patterned sample along a collection channel defined by the angular orientation of the illumination and collection paths.
    Type: Grant
    Filed: December 12, 2011
    Date of Patent: December 24, 2013
    Assignee: Applied Materials Israel, Ltd.
    Inventors: Yoav Berlatzky, Ido Kofler, Doron Meshulach, Kobi Barkan
  • Publication number: 20130148114
    Abstract: An optical inspection system for inspecting a patterned sample located in an inspection plane includes an illumination unit defining an illumination path, and a light collection unit defining a collection path, each path having a certain angular orientation with respect to the inspection plane. The illumination unit comprises an illumination mask located in a first spectral plane with respect to the inspection plane and the light collection unit comprises a collection mask located in a second spectral plane with respect to the inspection plane being conjugate to the first spectral plane. Arrangements of features of the first and second patterns are selected in accordance with a diffraction response from said patterned sample along a collection channel defined by the angular orientation of the illumination and collection paths.
    Type: Application
    Filed: December 12, 2011
    Publication date: June 13, 2013
    Inventors: Yoav Berlatzky, Ido Kofler, Doron Meshulach, Kobi Barkan
  • Publication number: 20130148115
    Abstract: An optical inspection system for inspecting a patterned sample located in an inspection plane includes an illumination unit defining an illumination channel of a predetermined numerical aperture and first predetermined angular orientation with respect to the inspection plane, and a light collection unit defining a collection channel of second predetermined angular orientation with respect to the inspection plane. The illumination unit comprises an illumination mask located in a first spectral plane with respect to the inspection plane and defining an illumination pupil comprising a first pattern formed by at least one elongated light transmitting region having a physical dimension along one axis larger than along a perpendicular axis. The light collection unit comprises a collection mask located in a second spectral plane with respect to the inspection plane being conjugate to the first spectral plane, the collection mask comprising a second predetermined pattern of spaced-apart light blocking regions.
    Type: Application
    Filed: December 12, 2011
    Publication date: June 13, 2013
    Inventors: Yoav Berlatzky, Ido Kofler, Doron Meshulach, Kobi Barkan