Patents by Inventor Igor Agafonov
Igor Agafonov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11484612Abstract: A device and method for cleaning a target may include supporting a target on a support in a chamber in a housing, the chamber optionally defined by at least one UV reflective plate; operating at least one UV emitter attached to the housing and positioned to emit UV radiation into the chamber so that the UV radiation illuminates the target; and operating an actuator to modify the UV radiation illumination of the target while the UV emitter is operated.Type: GrantFiled: December 3, 2018Date of Patent: November 1, 2022Assignee: Uvton, Inc.Inventors: Remigijus Gaska, Igor Agafonov
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Publication number: 20220125969Abstract: A device for cleaning a target includes a housing including a base defining an inner circumference and a lid; a chamber within the housing having a top within the lid, a bottom within the base, and at least one UV reflective plate; at least one UV emitter attached to the housing and positioned to emit UV radiation into the chamber; and a support attached to the base and located in the chamber, the support configured for locating the target so that the UV radiation illuminates the target. The support may be formed of a plurality of ribs and/or a plurality of protrusions configured so that the target is supported thereon without falling onto the base. The at least one UV emitter may be upper and lower UV emitters, either or both of which may be one or more arrays.Type: ApplicationFiled: October 26, 2021Publication date: April 28, 2022Inventors: Remigijus Gaska, Igor Agafonov
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Publication number: 20220016283Abstract: A device for cleaning a target may include a housing including a base and a lid; a chamber within the housing having a top within the lid, a bottom within the base, and at least one UV reflective plate; at least one UV emitter attached to the housing and positioned to emit UV radiation into the chamber; and a support attached to the housing and located in the chamber, the support configured for locating the target so that the UV radiation illuminates the target. All of the at least one UV emitters may be located in the base of the housing and none of the at least one UV emitters may be located in the lid of the housing. A means may be provided for rotating the support relative to the base so that the target moves relative to the at least one UV emitter. The means may include at least one of a fan, a motor, and actuator, and/or specially-configured support plates, and/or bases of housings.Type: ApplicationFiled: July 13, 2021Publication date: January 20, 2022Inventors: Remigijus Gaska, Igor Agafonov
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Patent number: 10849996Abstract: Ultraviolet radiation is directed within an area. Items located within the area and/or one or more conditions of the area are monitored over a period of time. Based on the monitoring, ultraviolet radiation sources are controlled by adjusting a direction, an intensity, a pattern, and/or a spectral power of the ultraviolet radiation generated by the ultraviolet radiation source. Adjustments to the ultraviolet radiation source(s) can correspond to one of a plurality of selectable operating configurations including a storage life preservation operating configuration, a disinfection operating configuration, and an ethylene decomposition operating configuration.Type: GrantFiled: May 17, 2018Date of Patent: December 1, 2020Assignee: Sensor Electronic Technology, Inc.Inventors: Michael Shur, Maxim S. Shatalov, Timothy James Bettles, Yuri Bilenko, Saulius Smetona, Alexander Dobrinsky, Remigijus Gaska, Igor Agafonov
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Patent number: 10787375Abstract: A solution for treating a fluid, such as water, is provided. An ultraviolet transparency of a fluid can be determined before or as the fluid enters a disinfection chamber. In the disinfection chamber, the fluid can be irradiated by ultraviolet radiation to harm microorganisms that may be present in the fluid. One or more attributes of the disinfection chamber, fluid flow, and/or ultraviolet radiation can be adjusted based on the transparency to provide more efficient irradiation and/or higher disinfection rates. In addition, various attributes of the disinfection chamber, such as the position of the inlet(s) and outlet(s), the shape of the disinfection chamber, and other attributes of the disinfection chamber can be utilized to create a turbulent flow of the fluid within the disinfection chamber to promote mixing and improve uniform ultraviolet exposure.Type: GrantFiled: October 31, 2018Date of Patent: September 29, 2020Assignee: Sensor Electronics Technology, Inc.Inventors: Saulius Smetona, Timothy James Bettles, Igor Agafonov, Ignas Gaska, Alexander Dobrinsky, Maxim S Shatalov, Arthur Peter Barber, III
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Patent number: 10745295Abstract: A solution for treating a fluid, such as water, is provided. An ultraviolet transparency of a fluid can be determined before or as the fluid enters a disinfection chamber. In the disinfection chamber, the fluid can be irradiated by ultraviolet radiation to harm microorganisms that may be present in the fluid. One or more attributes of the disinfection chamber, fluid flow, and/or ultraviolet radiation can be adjusted based on the transparency to provide more efficient irradiation and/or higher disinfection rates. In addition, various attributes of the disinfection chamber, such as the position of the inlet(s) and outlet(s), the shape of the disinfection chamber, and other attributes of the disinfection chamber can be utilized to create a turbulent flow of the fluid within the disinfection chamber to promote mixing and improve uniform ultraviolet exposure.Type: GrantFiled: August 2, 2018Date of Patent: August 18, 2020Assignee: Sensor Electronic Technology, Inc.Inventors: Saulius Smetona, Timothy James Bettles, Igor Agafonov, Ignas Gaska, Alexander Dobrinsky, Michael Shur, Remigijus Gaska
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Patent number: 10441670Abstract: Ultraviolet radiation is directed within an area. Items located within the area and/or one or more conditions of the area are monitored over a period of time. Based on the monitoring, ultraviolet radiation sources are controlled by adjusting a direction, an intensity, a pattern, and/or a spectral power of the ultraviolet radiation generated by the ultraviolet radiation source. Adjustments to the ultraviolet radiation source(s) can correspond to one of a plurality of selectable operating configurations including a storage life preservation operating configuration, a disinfection operating configuration, and an ethylene decomposition operating configuration.Type: GrantFiled: December 22, 2016Date of Patent: October 15, 2019Assignee: Sensor Electronic Technology, Inc.Inventors: Michael Shur, Maxim S. Shatalov, Timothy James Bettles, Yuri Bilenko, Saulius Smetona, Alexander Dobrinsky, Remigijus Gaska, Igor Agafonov
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Patent number: 10429012Abstract: A solution for packaging an optoelectronic device by aligning an optical element with respect to the package is provided. After initial placement of the optical element on the device package, an emitted light pattern can be measured and compared to a target light pattern. Subsequently, the position of the optical element can be adjusted. The emitted light pattern can be repeatedly compared to the target light pattern until the emitted light pattern is within an acceptable range of error and the optical element can be secured to the device package.Type: GrantFiled: January 31, 2017Date of Patent: October 1, 2019Assignee: Sensor Electronic Technology, Inc.Inventors: Igor Agafonov, Michael Shur, Alexander Dobrinsky
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Publication number: 20190167827Abstract: A device and method for cleaning a target may include supporting a target on a support in a chamber in a housing, the chamber optionally defined by at least one UV reflective plate; operating at least one UV emitter attached to the housing and positioned to emit UV radiation into the chamber so that the UV radiation illuminates the target; and operating an actuator to modify the UV radiation illumination of the target while the UV emitter is operated.Type: ApplicationFiled: December 3, 2018Publication date: June 6, 2019Inventors: Remigijus Gaska, Igor Agafonov
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Publication number: 20190135659Abstract: A solution for treating a fluid, such as water, is provided. An ultraviolet transparency of a fluid can be determined before or as the fluid enters a disinfection chamber. In the disinfection chamber, the fluid can be irradiated by ultraviolet radiation to harm microorganisms that may be present in the fluid. One or more attributes of the disinfection chamber, fluid flow, and/or ultraviolet radiation can be adjusted based on the transparency to provide more efficient irradiation and/or higher disinfection rates. In addition, various attributes of the disinfection chamber, such as the position of the inlet(s) and outlet(s), the shape of the disinfection chamber, and other attributes of the disinfection chamber can be utilized to create a turbulent flow of the fluid within the disinfection chamber to promote mixing and improve uniform ultraviolet exposure.Type: ApplicationFiled: October 31, 2018Publication date: May 9, 2019Applicant: Sensor Electronic Technology, Inc.Inventors: Saulius Smetona, Timothy James Bettles, Igor Agafonov, Ignas Gaska, Alexander Dobrinsky, Maxim S. Shatalov, Arthur Peter Barber, III
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Publication number: 20180346349Abstract: A solution for treating a fluid, such as water, is provided. An ultraviolet transparency of a fluid can be determined before or as the fluid enters a disinfection chamber. In the disinfection chamber, the fluid can be irradiated by ultraviolet radiation to harm microorganisms that may be present in the fluid. One or more attributes of the disinfection chamber, fluid flow, and/or ultraviolet radiation can be adjusted based on the transparency to provide more efficient irradiation and/or higher disinfection rates. In addition, various attributes of the disinfection chamber, such as the position of the inlet(s) and outlet(s), the shape of the disinfection chamber, and other attributes of the disinfection chamber can be utilized to create a turbulent flow of the fluid within the disinfection chamber to promote mixing and improve uniform ultraviolet exposure.Type: ApplicationFiled: August 2, 2018Publication date: December 6, 2018Applicant: Sensor Electronic Technology, Inc.Inventors: Saulius Smetona, Timothy James Bettles, Igor Agafonov, Ignas Gaska, Alexander Dobrinsky, Michael Shur, Remigijus Gaska
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Patent number: 10124081Abstract: A solution for disinfecting an area using ultraviolet radiation is provided. The solution can include an enclosure including at least one ultraviolet transparent window and a set of ultraviolet radiation sources located adjacent to the at least one ultraviolet transparent window. The set of ultraviolet radiation sources can be configured to generate ultraviolet radiation directed through the at least one ultraviolet transparent window. An input unit can be located on the enclosure and configured to generate an electrical signal in response to pressure applied to the enclosure. A control unit can be configured to manage the ultraviolet radiation by monitoring the electrical signal generated by the input unit and controlling, based on the monitoring, the ultraviolet radiation generated by the set of ultraviolet radiation sources.Type: GrantFiled: December 4, 2017Date of Patent: November 13, 2018Assignee: Sensor Electronic Technology, Inc.Inventors: Igor Agafonov, Alexander Dobrinsky, Michael Shur, Remigijus Gaska, Saulius Smetona
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Patent number: 10090210Abstract: A metal-organic chemical vapor deposition (MOCVD) growth with temperature controlled layer is described. A substrate or susceptor can have a temperature controlled layer formed thereon to adjust the temperature uniformity of a MOCVD growth process used to epitaxially grow semiconductor layers. In one embodiment, the substrate and/or the susceptor can be profiled with a shape that improves temperature uniformity during the MOCVD growth process. The profiled shape can be formed with material that provides a desired temperature distribution to the substrate that is in accordance with a predetermined temperature profile for the substrate for a particular MOCVD process.Type: GrantFiled: October 3, 2016Date of Patent: October 2, 2018Assignee: Sensor Electronic Technology, Inc.Inventors: Maxim S. Shatalov, Mikhail Gaevski, Igor Agafonov, Robert M. Kennedy, Alexander Dobrinsky, Michael Shur, Emmanuel Lakios
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Publication number: 20180264150Abstract: Ultraviolet radiation is directed within an area. Items located within the area and/or one or more conditions of the area are monitored over a period of time. Based on the monitoring, ultraviolet radiation sources are controlled by adjusting a direction, an intensity, a pattern, and/or a spectral power of the ultraviolet radiation generated by the ultraviolet radiation source. Adjustments to the ultraviolet radiation source(s) can correspond to one of a plurality of selectable operating configurations including a storage life preservation operating configuration, a disinfection operating configuration, and an ethylene decomposition operating configuration.Type: ApplicationFiled: May 17, 2018Publication date: September 20, 2018Applicant: Sensor Electronic Technology, Inc.Inventors: Michael Shur, Maxim S. Shatalov, Timothy James Bettles, Yuri Bilenko, Saulius Smetona, Alexander Dobrinsky, Remigijus Gaska, Igor Agafonov
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Patent number: 10040699Abstract: A solution for treating a fluid, such as water, is provided. An ultraviolet transparency of a fluid can be determined before or as the fluid enters a disinfection chamber. In the disinfection chamber, the fluid can be irradiated by ultraviolet radiation to harm microorganisms that may be present in the fluid. One or more attributes of the disinfection chamber, fluid flow, and/or ultraviolet radiation can be adjusted based on the transparency to provide more efficient irradiation and/or higher disinfection rates. In addition, various attributes of the disinfection chamber, such as the position of the inlet(s) and outlet(s), the shape of the disinfection chamber, and other attributes of the disinfection chamber can be utilized to create a turbulent flow of the fluid within the disinfection chamber to promote mixing and improve uniform ultraviolet exposure.Type: GrantFiled: August 4, 2015Date of Patent: August 7, 2018Assignee: SENSOR ELECTRONICS TECHNOLOGY, INC.Inventors: Saulius Smetona, Timothy James Bettles, Igor Agafonov, Ignas Gaska, Alexander Dobrinsky, Michael Shur, Remigijus Gaska
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Publication number: 20180093002Abstract: A solution for disinfecting an area using ultraviolet radiation is provided. The solution can include an enclosure including at least one ultraviolet transparent window and a set of ultraviolet radiation sources located adjacent to the at least one ultraviolet transparent window. The set of ultraviolet radiation sources can be configured to generate ultraviolet radiation directed through the at least one ultraviolet transparent window. An input unit can be located on the enclosure and configured to generate an electrical signal in response to pressure applied to the enclosure. A control unit can be configured to manage the ultraviolet radiation by monitoring the electrical signal generated by the input unit and controlling, based on the monitoring, the ultraviolet radiation generated by the set of ultraviolet radiation sources.Type: ApplicationFiled: December 4, 2017Publication date: April 5, 2018Applicant: Sensor Electronic Technology, Inc.Inventors: Igor Agafonov, Alexander Dobrinsky, Michael Shur, Remigijus Gaska, Saulius Smetona
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Patent number: 9919068Abstract: Ultraviolet radiation is directed within an area. Items located within the area and/or one or more conditions of the area are monitored over a period of time. Based on the monitoring, ultraviolet radiation sources are controlled by adjusting a direction, an intensity, a pattern, and/or a spectral power of the ultraviolet radiation generated by the ultraviolet radiation source. Adjustments to the ultraviolet radiation source(s) can correspond to one of a plurality of selectable operating configurations including a storage life preservation operating configuration, a disinfection operating configuration, and an ethylene decomposition operating configuration.Type: GrantFiled: February 24, 2015Date of Patent: March 20, 2018Assignee: Sensor Electronic Technology, Inc.Inventors: Michael Shur, Maxim S. Shatalov, Timothy James Bettles, Yuri Bilenko, Saulius Smetona, Alexander Dobrinsky, Remigijus Gaska, Igor Agafonov
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Patent number: 9833526Abstract: A solution for disinfecting an area using ultraviolet radiation is provided. The solution can include an enclosure including at least one ultraviolet transparent window and a set of ultraviolet radiation sources located adjacent to the at least one ultraviolet transparent window. The set of ultraviolet radiation sources can be configured to generate ultraviolet radiation directed through the at least one ultraviolet transparent window. An input unit can be located on the enclosure and configured to generate an electrical signal in response to pressure applied to the enclosure. A control unit can be configured to manage the ultraviolet radiation by monitoring the electrical signal generated by the input unit and controlling, based on the monitoring, the ultraviolet radiation generated by the set of ultraviolet radiation sources.Type: GrantFiled: February 25, 2015Date of Patent: December 5, 2017Assignee: Sensor Electronic Technology, Inc.Inventors: Igor Agafonov, Alexander Dobrinsky, Michael Shur, Remigijus Gaska, Saulius Smetona
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Patent number: 9782846Abstract: Methods, wires, and apparatus for use in cutting (e.g., slicing) hard, brittle materials is provided. The wire can be a super-abrasive wire that includes a wire core and super-abrasive particles bonded to the wire core via a metal bonding layer. This wire, or another type of wire, can be used to slice workpieces useful for producing wafers. The workpieces can be aligned within a holder to produce wafers using the device and methods presently provided. The holder rotates about its central axis, which translates to workpieces moving in orbit around this axis. A single abrasive wire, or multiple turns of wire stretched tightly between wire guides, is then contacted with the rotating holder to slice the workpieces.Type: GrantFiled: July 7, 2014Date of Patent: October 10, 2017Assignee: UNIVERSITY OF SOUTH CAROLINAInventors: Tangali Sudarshan, Igor Agafonov, Robert Mark Kennedy
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Publication number: 20170219174Abstract: A solution for packaging an optoelectronic device by aligning an optical element with respect to the package is provided. After initial placement of the optical element on the device package, an emitted light pattern can be measured and compared to a target light pattern. Subsequently, the position of the optical element can be adjusted. The emitted light pattern can be repeatedly compared to the target light pattern until the emitted light pattern is within an acceptable range of error and the optical element can be secured to the device package.Type: ApplicationFiled: January 31, 2017Publication date: August 3, 2017Applicant: Sensor Electronic Technology, Inc.Inventors: Igor Agafonov, Michael Shur, Alexander Dobrinsky