Abstract: A microwave resonance plasma generating apparatus, a plasma processing system having the same and a method of generating a microwave resonance plasma are provided. The apparatus includes a microwave generating unit which generates a microwave, and a plasma producing unit which produces electrons and photons of high energy using the microwave generated from the microwave generating unit. The plasma producing unit includes a coaxial waveguide having an inner electrode disposed adjacent to the microwave generating unit, an outer electrode connected to the microwave generating unit and disposed to coaxially surround a portion of the inner electrode, the outer electrode being shorter than the inner electrode, and a dielectric tube disposed between the inner electrode and the outer electrode to insulate between the inner electrode and the outer electrode. The coaxial waveguide utilizes a principle of “cut or truncated electrode of coaxial waveguide” and a resonance phenomenon of Langmiur.

Abstract: A microwave plasma burner in which a high temperature plasma is generated. The microwave plasma burner includes a wave inducing tube for receiving and guiding microwaves from an antenna of a magnetron within a wave guide resonator, so as to generate a high temperature plasma by causing vibrations of an injected gas by the help of the microwaves while discharging the injected gas. The microwave plasma burner according to the present invention gives the following effects. A strong high temperature plasma can be generated with a structure not involving vacuum. The flames are generated by the heat which is generated by the vibrations of air, and therefore, a separate igniting device is not required. High temperature flames are generated, and therefore, the burner of the present invention can be used for welding and cutting. A complete combustion occurs due to the heat which is generated by the vibrations, and therefore, any air pollution can be prevented.

Abstract: A plasma generating apparatus is provided which uses slipping surface discharge and microwave to generate a large quantity of plasma in a different gases or gaseous mixtures (including electro-negative gases) in a wide range of gas pressure (from a deep vacuum up to atmospheric pressure). The plasma generating apparatus includes high voltage pulse means for generating a high voltage pulse, plasma generating means based on the slipping surface discharge which excites as the high voltage pulse generated by high voltage pulse generating means, is supplied, microwave generating means for generating a microwave radiation for producing plasma, a chamber in which the plasma generating means are placed, and the plasma collects, the chamber receiving the microwave radiation from the microwave generating means, and a gas inlet through which a specific gas flows into the chamber, to generate a large quantity of plasma according to the plasma generating means and microwave generating means.