Abstract: A test structure and method of its manufacture are presented for use in metrology measurements of a sample pattern.

Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure.

Abstract: A test structure is presented for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis. The test structure comprises a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some features of the main pattern, parameters of which are to be controlled during metrology measurements.

Abstract: An article is presented configured for controlling a multiple patterning process, such as a spacer self-aligned multiple patterning, to produce a target pattern. The article comprises a test site carrying a test structure comprising at least one pair of gratings, wherein first and second gratings of the pair are in the form of first and second patterns of alternating features and spaces and differ from the target pattern by respectively different first and second values which are selected to provide together a total difference such that a differential optical response from the test structure is indicative of a pitch walking effect.

Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure.

Abstract: A surface planarization system is presented. The system comprises an external energy source for generating a localized energy distribution within a processing region, and a control unit for operating the external energy source to create, by the localized energy distribution, a predetermined temperature pattern within the processing region such that different locations of the processing region are subjected to different temperatures. This provides that when a sample (e.g. semiconductor wafer) during its interaction with an etching material composition is located in the processing region, the temperature pattern at different locations of the sample's surface creates different material removal rates by the etching material composition (different etch rates).

Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure.

Abstract: A method and system are presented for monitoring measurement of parameters of patterned structures based on a predetermined fitting model. The method comprises: (a) providing data indicative of measurements in at least one patterned structure; and (b) applying at least one selected verification mode to said data indicative of measurements, said at least one verification mode comprising: I) analyzing the data based on at least one predetermined factor and classifying the corresponding measurement result as acceptable or unacceptable, II) analyzing the data corresponding to the unacceptable measurement results and determining whether one or more of the measurements providing said unacceptable result are to be disregarded, or whether one or more parameters of the predetermined fitting model are to be modified.

Abstract: A method and device for electrical emulation of pulsed laser is disclosed. The device utilizes high voltage electrical discharges of sub-microsecond duration in a liquid medium to produce cavitation bubbles of sub-millimeter size for use in high speed precision cutting. Such bubbles are produced by a micro-electrode (1.6) having a central wire having a diameter of 1 microns to 100 microns embedded in an insulator. A coaxial electrode (1.9) surrounds the insulator, and may be spaced from the outer surface of insulator to provide a path for removing tissue.

Abstract: A method and device for electrical emulation of pulsed laser is disclosed. The device utilizes high voltage electrical discharges of sub-microsecond duration in a liquid medium to produce cavitation bubbles of sub-millimeter size for use in high speed precision cutting. Such bubbles are produced by a micro-electrode (1.6) having a central wire having a diameter of 1 microns to 100 microns embedded in an insulator. A coaxial electrode (1.9) surrounds the insulator, and may be spaced from the outer surface of insulator to provide a path for removing tissue.

Abstract: A method and device for electrical emulation of pulsed laser is disclosed. The device utilizes high voltage electrical discharges of sub-microsecond duration in a liquid medium to produce cavitation bubbles of sub-millimeter size for use in high speed precision cutting. Such bubbles are produced by a micro-electrode (1.6) having a central wire having a diameter of 1 microns to 100 microns embedded in an insulator. A coaxial electrode (1.9) surrounds the insulator, and may be spaced from the outer surface of the insulator to provide a path for removing tissue.

Abstract: The invention includes the use of a beam homogenizer (scattering surface) at the input aperture of a tapered optical fiber to avoid hot spots (2) in the tapered section which would otherwise destroy the fiber (10).