Patents by Inventor IK-HAN OH

IK-HAN OH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160187790
    Abstract: An exposure method includes exposing a substrate to form a first pattern on a first layer, measuring a first alignment value of the first pattern, generating first correction data by using the first alignment value, storing the first correction data and exposing the substrate to form a second pattern on a second layer disposed on the first layer by using the first correction data.
    Type: Application
    Filed: June 16, 2015
    Publication date: June 30, 2016
    Inventors: IK-HAN OH, SEUNG-KYU LEE, HYEON-MIN CHO