Patents by Inventor Ilan Sela
Ilan Sela has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230332097Abstract: A bacterial culture is disclosed which comprises Rhizobium bacteria having a nucleic acid sequence at least 99% identical to the nucleic acid sequence as set forth in SEQ ID NO: 1. Uses thereof are also disclosed.Type: ApplicationFiled: February 25, 2021Publication date: October 19, 2023Applicant: Hinoman Ltd.Inventors: Miri LAPIDOT, Ilan SELA, Monica COLT
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Patent number: 10801028Abstract: An isolated nucleic acid agent is disclosed comprising a nucleic acid sequence which downregulates expression of a gene product of a Varroa destructor mite. Compositions comprising same and uses thereof are also disclosed.Type: GrantFiled: April 26, 2017Date of Patent: October 13, 2020Assignees: BEEOLOGICS INC., YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW UNIVERSITY OF JERUSALEM LTD.Inventors: Ilan Sela, Sharoni Shafir, Eyal Maori, Yael Garbian, Eyal Ben-Chanoch, Gal Yarden, Haim Kalev
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Patent number: 10533940Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.Type: GrantFiled: November 12, 2018Date of Patent: January 14, 2020Assignee: KLA-Tencor CorporationInventors: Amnon Manassen, Andrew V. Hill, Daniel Kandel, Ilan Sela, Ohad Bachar, Barak Bringoltz
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Publication number: 20190094142Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.Type: ApplicationFiled: November 12, 2018Publication date: March 28, 2019Inventors: Amnon Manassen, Andrew V. Hill, Daniel Kandel, Ilan Sela, Ohad Bachar, Barak Bringoltz
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Patent number: 10203247Abstract: A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.Type: GrantFiled: December 5, 2016Date of Patent: February 12, 2019Assignee: KLA-Tencor CorporationInventors: Gregory R. Brady, Andrei V. Shchegrov, Lawrence D. Rotter, Derrick A. Shaughnessy, Anatoly Shchemelinin, Ilya Bezel, Muzammil A. Arain, Anatoly A. Vasiliev, James Andrew Allen, Oleg Shulepov, Andrew V. Hill, Ohad Bachar, Moshe Markowitz, Yaron Ish-Shalom, Ilan Sela, Amnon Manassen, Alexander Svizher, Maxim Khokhlov, Avi Abramov, Oleg Tsibulevsky, Daniel Kandel, Mark Ghinovker
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Patent number: 10126238Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.Type: GrantFiled: December 13, 2017Date of Patent: November 13, 2018Assignee: KLA-Tencor CorporationInventors: Amnon Manassen, Andrew Hill, Daniel Kandel, Ilan Sela, Ohad Bachar, Barak Bringoltz
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Patent number: 9958385Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.Type: GrantFiled: December 23, 2014Date of Patent: May 1, 2018Assignee: KLA-Tencor CorporationInventors: Amnon Manassen, Andrew Hill, Daniel Kandel, Ilan Sela, Ohad Bachar, Barak Bringoltz
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Publication number: 20180106723Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.Type: ApplicationFiled: December 13, 2017Publication date: April 19, 2018Inventors: Amnon Manassen, Andrew Hill, Daniel Kandel, Ilan Sela, Ohad Bachar, Barak Bringoltz
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Publication number: 20170233743Abstract: An isolated nucleic acid agent is disclosed comprising a nucleic acid sequence which downregulates expression of a gene product of a Varroa destructor mite. Compositions comprising same and uses thereof are also disclosed.Type: ApplicationFiled: April 26, 2017Publication date: August 17, 2017Inventors: Ilan SELA, Sharoni SHAFIR, Eyal MAORI, Yael GARBIAN, Eyal BEN-CHANOCH, Gal YARDEN, Haim KALEV
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Patent number: 9662348Abstract: An isolated nucleic acid agent is disclosed comprising a nucleic acid sequence which downregulates expression of a gene product of a Varroa destructor mite. Compositions comprising same and uses thereof are also disclosed.Type: GrantFiled: January 27, 2015Date of Patent: May 30, 2017Assignees: Yissum Research Development Company of the Hebrew University of Jerusalem Ltd., Beeologics Inc.Inventors: Ilan Sela, Sharoni Shafir, Eyal Maori, Yael Garbian, Eyal Ben-Chanoch, Gal Yarden, Haim Kalev
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Publication number: 20170146399Abstract: A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.Type: ApplicationFiled: December 5, 2016Publication date: May 25, 2017Inventors: Gregory R. Brady, Andrei V. Shchegrov, Lawrence D. Rotter, Derrick A. Shaughnessy, Anatoly Shchemelinin, Ilya Bezel, Muzammil A. Arain, Anatoly A. Vasiliev, James Andrew Allen, Oleg Shulepov, Andrew V. Hill, Ohad Bachar, Moshe Markowitz, Yaron Ish-Shalom, Ilan Sela, Amnon Manassen, Alexander Svizher, Maxim Khokhlov, Avi Abramov, Oleg Tsibulevsky, Daniel Kandel, Mark Ghinovker
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Patent number: 9512985Abstract: The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.Type: GrantFiled: February 22, 2013Date of Patent: December 6, 2016Assignee: KLA-Tencor CorporationInventors: Gregory R. Brady, Andrei V. Shchegrov, Lawrence D. Rotter, Derrick Shaughnessy, Anatoly Shchemelinin, Ilya Bezel, Muzammil A. Arain, Anatoly A. Vasiliev, James Andrew Allen, Oleg Shulepov, Andrew V. Hill, Ohad Bachar, Moshe Markowitz, Yaron Ish-Shalom, Ilan Sela, Amnon Manassen, Alexander Svizher, Maxim Khokhlov, Avi Abramov, Oleg Tsibulevsky, Daniel Kandel, Mark Ghinovker
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Patent number: 9315818Abstract: A Geminivirus based expression construct being capable of systemic symptomeless spread in a plant host is provided as well as methods of utilizing same for plant gene expression, gene silencing and plant protection.Type: GrantFiled: June 7, 2007Date of Patent: April 19, 2016Assignees: Yissum Research Development Company of the Hebrew University of Jerusalem, Morflora Israel Ltd.Inventors: Ilan Sela, Rita Mozes-Koch, Yuval Peretz, Herve Huet
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Publication number: 20150232875Abstract: The present invention provides means and methods for simple and efficient introduction of foreign genetic material into the plant cell. Particularly, the present invention combines seed priming and virus-based DNA constructs for efficient introduction of heterologous DNA into plants.Type: ApplicationFiled: March 8, 2015Publication date: August 20, 2015Applicant: Yissum Research Development Company of the Hebrew University of Jerusalem Ltd.Inventors: Ilan SELA, Haim David Rabinowitch, Ofer Gover
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Patent number: 9080971Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.Type: GrantFiled: October 16, 2014Date of Patent: July 14, 2015Assignee: KLA-Tencor Corp.Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
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Publication number: 20150133532Abstract: An isolated nucleic acid agent is disclosed comprising a nucleic acid sequence which downregulates expression of a gene product of a Varroa destructor mite. Compositions comprising same and uses thereof are also disclosed.Type: ApplicationFiled: January 27, 2015Publication date: May 14, 2015Inventors: Ilan Sela, Sharoni Shafir, Eyal Maori, Yael Garbian, Eyal Ben-Chanoch, Gal Yarden, Haim Kalev
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Publication number: 20150116717Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.Type: ApplicationFiled: December 23, 2014Publication date: April 30, 2015Inventors: Amnon MANASSEN, Andrew HILL, Daniel KANDEL, Ilan SELA, Ohad BACHAR, Barak BRINGOLTZ
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Patent number: 8975470Abstract: The present invention provides means and methods for simple and efficient introduction of foreign genetic material into the plant cell. Particularly, the present invention combines seed priming and virus-based DNA constructs for efficient introduction of heterologous DNA into plants.Type: GrantFiled: June 30, 2010Date of Patent: March 10, 2015Assignee: Yissum Research Development Company of the Hebrew University of Jerusalem Ltd.Inventors: Ilan Sela, Haim David Rabinowitch, Ofer Gover
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Patent number: 8962584Abstract: An isolated nucleic acid agent is disclosed comprising a nucleic acid sequence which downregulates expression of a gene product of a Varroa destructor mite. Compositions comprising same and uses thereof are also disclosed.Type: GrantFiled: April 13, 2012Date of Patent: February 24, 2015Assignees: Yissum Research Development Company of the Hebrew University of Jerusalem, Ltd., Beeologics Inc.Inventors: Ilan Sela, Sharoni Shafir, Eyal Maori, Yael Garbian, Eyal Ben-Chanoch, Gal Yarden, Haim Kalev
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Publication number: 20150036142Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.Type: ApplicationFiled: October 16, 2014Publication date: February 5, 2015Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem