Patents by Inventor Ilhami H. Torunoglu
Ilhami H. Torunoglu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9424372Abstract: A system and method for mask data preparation (MDP) uses pixel processing algorithms running on parallel processing platforms such as central processing units (CPUs) and graphical processing units (GPUs). Proximity effects correlation, dose, and bias corrections are performed on a pixel basis. In some embodiments, striping of a decorated database in parallel using multiple graphic processors is performed. While performing a first light path simulation for a first stripe for a mask, a second light path simulation is performed for a second stripe for the mask. Using a result of the striping and first and second light path simulations, dose adjustment during a mask processing on a pixel of the mask is performed.Type: GrantFiled: March 15, 2013Date of Patent: August 23, 2016Assignee: D2S, Inc.Inventors: Ilhami H. Torunoglu, Ahmet Karakas
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Patent number: 9305132Abstract: Minimizing memory access by converting a given matrix computation into a set of low-order polynomials. The set of polynomials is processed using parallel computational hardware such as graphical processing units.Type: GrantFiled: July 2, 2013Date of Patent: April 5, 2016Assignee: D2S, Inc.Inventor: Ilhami H. Torunoglu
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Patent number: 9280631Abstract: Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.Type: GrantFiled: December 20, 2013Date of Patent: March 8, 2016Assignee: D2S, Inc.Inventors: Ilhami H. Torunoglu, Ahmet Karakas
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Patent number: 8938696Abstract: Computationally intensive electronic design automation operations are accelerated with algorithms utilizing one or more graphics processing units. The optical proximity correction (OPC) process calculates, improves, and optimizes one or more features on an exposure mask (used in semiconductor or other processing) so that a resulting structure realized on an integrated circuit or chip meets desired design and performance requirements. When a chip has billions of transistors or more, each with many fine structures, the computational requirements for OPC can be very large. This processing can be accelerated using one or more graphics processing units.Type: GrantFiled: July 15, 2013Date of Patent: January 20, 2015Assignee: D2S, Inc.Inventors: Ilhami H. Torunoglu, Ahmet Karakas, Erich E. Elsen
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Publication number: 20140310663Abstract: Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.Type: ApplicationFiled: December 20, 2013Publication date: October 16, 2014Applicant: GAUDA, INC.Inventors: Ilhami H. Torunoglu, Ahmet Karakas
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Patent number: 8707222Abstract: In an electronic design automation technique for optical proximity correction, a mask is represented by a function with an exact analytical form over a mask region. Using the physics of optical projection, a solution based on a spatial frequency analysis is determined. Spatial frequencies above a cutoff are determined by the optical system do not contribute to the projected image. Spatial frequencies below this cutoff affect the print (and the mask), while those above the cutoff only affect the mask. Frequency components in the function below this cutoff frequency may be removed, which will help to reduce computational complexity.Type: GrantFiled: November 27, 2012Date of Patent: April 22, 2014Assignee: Gauda, Inc.Inventors: P. Jeffrey Ungar, Ilhami H. Torunoglu
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Patent number: 8689148Abstract: In an electronic design automation technique for optical proximity correction, an optimized mask function that has values other than those allowed for a particular mask type, such as 0 and 1 for a chrome-on-glass binary mask, evolves it to a solution restricted to these values or narrow intervals near them. The technique “regularizes” the solution by mixing in a new cost functional that encourages the mask to assume the desired values. The mixing in may be done over one or more steps or even “quasistatically,” in which the total cost functional and the mask is brought from pure goodness-of-fit to the printed layout for given conditions to pure manufacturability by keeping the total cost functional minimized step-by-step. A goal of this gradual mixing-in is to do thermodynamically optimal work on the mask function to bring it to manufacturable values.Type: GrantFiled: March 20, 2012Date of Patent: April 1, 2014Assignee: Gauda, Inc.Inventors: P. Jeffrey Ungar, Ilhami H. Torunoglu
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Patent number: 8615723Abstract: Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.Type: GrantFiled: August 28, 2012Date of Patent: December 24, 2013Assignee: Gauda, Inc.Inventors: Ilhami H. Torunoglu, Ahmet Karakas
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Patent number: 8490034Abstract: Computationally intensive electronic design automation operations are accelerated with algorithms utilizing one or more graphics processing units. The optical proximity correction (OPC) process calculates, improves, and optimizes one or more features on an exposure mask (used in semiconductor or other processing) so that a resulting structure realized on an integrated circuit or chip meets desired design and performance requirements. When a chip has billions of transistors or more, each with many fine structures, the computational requirements for OPC can be very large. This processing can be accelerated using one or more graphics processing units.Type: GrantFiled: July 8, 2011Date of Patent: July 16, 2013Assignee: Gauda, Inc.Inventors: Ilhami H. Torunoglu, Ahmet Karakas, Erich E. Elsen
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Patent number: 8478808Abstract: Minimizing memory access by converting a given matrix computation into a set of low-order polynomials. The low-order polynomials can be used by dividing the domain of the polynomials into smaller subregions. If the domain is divided into equal intervals, the low-order polynomial can be used to approximate results from the matrix computation. The set of polynomials is processed using parallel computational hardware such as graphical processing units.Type: GrantFiled: October 19, 2007Date of Patent: July 2, 2013Assignee: Gauda, Inc.Inventor: Ilhami H. Torunoglu
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Publication number: 20120324405Abstract: Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.Type: ApplicationFiled: August 28, 2012Publication date: December 20, 2012Applicant: GAUDA, INC.Inventors: Ilhami H. Torunoglu, Ahmet Karakas
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Patent number: 8321819Abstract: In an electronic design automation technique for optical proximity correction, a mask is represented by a function with an exact analytical form over a mask region. Using the physics of optical projection, a solution based on a spatial frequency analysis is determined. Spatial frequencies above a cutoff are determined by the optical system do not contribute to the projected image. Spatial frequencies below this cutoff affect the print (and the mask), while those above the cutoff only affect the mask. Frequency components in the function below this cutoff frequency may be removed, which will help to reduce computational complexity.Type: GrantFiled: December 20, 2010Date of Patent: November 27, 2012Assignee: Gauda, Inc.Inventors: P. Jeffrey Ungar, Ilhami H. Torunoglu
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Patent number: 8255841Abstract: Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.Type: GrantFiled: June 9, 2009Date of Patent: August 28, 2012Assignee: Gauda, Inc.Inventors: Ilhami H. Torunoglu, Ahmet Karakas
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Patent number: 8141004Abstract: In an electronic design automation technique for optical proximity correction, an optimized mask function that has values other than those allowed for a particular mask type, such as 0 and 1 for a chrome-on-glass binary mask, evolves it to a solution restricted to these values or narrow intervals near them. The technique “regularizes” the solution by mixing in a new cost functional that encourages the mask to assume the desired values. The mixing in may be done over one or more steps or even “quasistatically,” in which the total cost functional and the mask is brought from pure goodness-of-fit to the printed layout for given conditions to pure manufacturability by keeping the total cost functional minimized step-by-step. A goal of this gradual mixing-in is to do thermodynamically optimal work on the mask function to bring it to manufacturable values.Type: GrantFiled: May 11, 2010Date of Patent: March 20, 2012Assignee: Gauda, Inc.Inventors: P. Jeffrey Ungar, Ilhami H. Torunoglu
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Patent number: 7856612Abstract: In an electronic design automation technique for optical proximity correction, a mask is represented by a function with an exact analytical form over a mask region. Using the physics of optical projection, a solution based on a spatial frequency analysis is determined. Spatial frequencies above a cutoff are determined by the optical system do not contribute to the projected image. Spatial frequencies below this cutoff affect the print (and the mask), while those above the cutoff only affect the mask. Frequency components in the function below this cutoff frequency may be removed, which will help to reduce computational complexity.Type: GrantFiled: September 28, 2007Date of Patent: December 21, 2010Assignee: Gauda, Inc.Inventors: P. Jeffrey Ungar, Ilhami H. Torunoglu
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Patent number: 7716627Abstract: In an electronic design automation technique for optical proximity correction, an optimized mask function that has values other than those allowed for a particular mask type, such as 0 and 1 for a chrome-on-glass binary mask, evolves it to a solution restricted to these values or narrow intervals near them. The technique “regularizes” the solution by mixing in a new cost functional that encourages the mask to assume the desired values. The mixing in may be done over one or more steps or even “quasistatically,” in which the total cost functional and the mask is brought from pure goodness-of-fit to the printed layout for given conditions to pure manufacturability by keeping the total cost functional minimized step-by-step. A goal of this gradual mixing-in is to do thermodynamically optimal work on the mask function to bring it to manufacturable values.Type: GrantFiled: September 28, 2007Date of Patent: May 11, 2010Assignee: Guada, Inc.Inventors: P. Jeffrey Ungar, Ilhami H. Torunoglu
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Publication number: 20090245618Abstract: Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.Type: ApplicationFiled: June 9, 2009Publication date: October 1, 2009Applicant: GAUDA, INC.Inventors: Ilhami H. Torunoglu, Ahmet Karakas
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Patent number: 7546574Abstract: Optical proximity correction techniques performed on one or more graphics processors improve the masks used for the printing of microelectronic circuit designs. Execution of OPC techniques on hardware or software platforms utilizing graphics processing units. GPUs may share the computation load with the system CPUs to efficiently and effectively execute the OPC method steps.Type: GrantFiled: December 1, 2006Date of Patent: June 9, 2009Assignee: Gauda, Inc.Inventors: Ilhami H. Torunoglu, Ahmet Karakas
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Patent number: 6889326Abstract: A system and method for protecting circuit designs from unauthorized use involves techniques for watermarking by embedding a hidden, recognizable input/output signature or code into the circuit design. An internal sequential function, such as a finite state machine, within the circuit design is used to generate a predictable output sequence when a known input sequence is applied. The free input configurations in the internal sequential function of the circuit design are identified and modified to generate the desired output sequence when the known input sequence is applied. A path among the free input configurations is selected, with output values in the desired output sequence being assigned the various state transitions. If there are not enough free input configurations to meet specified watermarking robustness criteria, then additional free input configurations may be added by, for example, adding one or more inputs, outputs or states to the finite state machine.Type: GrantFiled: August 11, 2003Date of Patent: May 3, 2005Assignee: Cadence Design Systems, Inc.Inventors: Edoardo Charbon, Ilhami H. Torunoglu
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Patent number: 6876775Abstract: A technique is provided for removing blurring from an image captured by an imaging device. The imaging device may include a lens and an imaging medium comprised of a plurality of imaging pieces. According to an embodiment, a distance is determined between individual imaging pieces of the imaging medium and a region on the target object that corresponds to the respective individual imaging piece. The image of the target object is captured on the imaging medium. Blurring is removed from the captured image using the distances identified for the individual imaging pieces.Type: GrantFiled: February 19, 2002Date of Patent: April 5, 2005Assignee: Canesta, Inc.Inventor: Ilhami H. Torunoglu