Abstract: In one embodiment, a system for determining a characteristic of the plasma chamber is disclosed. The system includes an impedance matching network, a sensor, and a control circuit. The control circuit stores one or more reference values for a parameter related to a semiconductor processing tool. A current value for the parameter is determined based on a signal received from the sensor. The control circuit then determines a characteristic of the plasma chamber based on a comparison of the current value for the parameter and the one or more reference values for the parameter.

Abstract: In one embodiment, a system for semiconductor fabrication includes a continuous wave (CW) radio frequency (RF) source and a pulsing RF source. The system further includes a matching network positioned between the CW RF source and the load and a control circuit. The control circuit receives one or more signals indicative of the pulsing RF signal, and selects a portion of the pulsing RF signal. The control circuit then samples at least one parameter during the selected portion of the pulsing RF signal. Based on the at least one parameter, the control circuit causes an alteration of the at least one variable reactance element, which causes the matching network to impedance match between the CW RF source and the load.

Abstract: In one embodiment, a method of matching an impedance is disclosed. An impedance matching network is coupled between a radio frequency (RF) source and a plasma chamber. The matching network includes a variable reactance element (VRE) having different positions for providing different reactances. The RF source is subject to a power control scheme to control a power delivered to the matching network. Based on a determined parameter, a new position for the VRE is determined to reduce a reflected power at the RF input of the matching network. The VRE is altered to the new position while the power control scheme is altered.

Abstract: A computer server system comprises a communications module; a processor coupled with the communications module; and a memory coupled to the processor and storing processor-executable instructions which, when executed by the processor, configure the processor to receive, via the communications module and from a requesting device, a signal that includes a request to send a stored-value card to a recipient, the request identifying one or more parameters of the stored-value card; generate the stored-value card and a three-dimensional object representing the stored-value card according to the one or more parameters; and send, via the communications module and to a mobile device of the recipient, a signal that includes the three-dimensional object representing the stored-value card for display in augmented reality.

Abstract: A system and method for assessing a marbling of a meat sample are provided. The system comprises at least one processor and a memory comprising instructions which, when executed by the processor, configure the processor to perform the method. The method comprises obtaining an image of a meat sample, identifying a muscle of interest (MOI) of the meat sample, segmenting an area of interest (AOI) in the MOI where the AOI in the MOI comprises a region of interest (ROI) of the image, detecting a number of marbling pixels in the ROI of the image, and determining a marbling score comprising a ratio of the number of marbling pixels and the total number of pixels in the ROI of the image. The meat sample is one of a chop, a slice, a steak, or a whole loin.

Abstract: A computer server system comprises a communications module; a processor coupled with the communications module; and a memory coupled to the processor and storing processor-executable instructions which, when executed by the processor, configure the processor to receive, via the communications module and from a requesting device, a signal that includes a request to send a stored-value card to a recipient, the request identifying one or more parameters of the stored-value card; generate the stored-value card and a three-dimensional object representing the stored-value card according to the one or more parameters; and send, via the communications module and to a mobile device of the recipient, a signal that includes the three-dimensional object representing the stored-value card for display in augmented reality.

Abstract: A computer server system comprises a communications module; a processor coupled with the communications module; and a memory coupled to the processor and storing processor-executable instructions which, when executed by the processor, configure the processor to receive, via the communications module and from a requesting device, a signal that includes a request to send a stored-value card to a recipient, the request identifying one or more parameters of the stored-value card; generate the stored-value card and a three-dimensional object representing the stored-value card according to the one or more parameters; and send, via the communications module and to a mobile device of the recipient, a signal that includes the three-dimensional object representing the stored-value card for display in augmented reality.

Abstract: In one embodiment, a system includes an RF source and an RF impedance matching circuit receiving RF power from the RF source. The matching circuit includes at least one variable reactance element, a sensor operably coupled to a component of the matching circuit, and a control circuit. The control circuit receives a signal from the sensor indicative of a parameter value. Upon determining the parameter value meets a first predetermined condition, the control circuit transmits a control signal to the RF source causing the RF source to carry out a power control scheme. The power control scheme causes the RF source to reduce or maintain the RF power without turning off the RF power.

Abstract: Systems and methods include a computer-implemented method for analyzing petroleum samples. Different boiling curves are received that are calculated for a petroleum sample using different analytical speciation techniques. The boiling curves include: 1) a detailed hydrocarbon analysis (DHA) is used for a speciation of light-end components of the petroleum sample; 2) a comprehensive 2-dimensional (2D) gas chromatography (GCxGC) is used for a speciation of a middle distillates range of the petroleum sample; and 3) a high-resolution mass spectrometry is used for a speciation of heavy-end components of the petroleum sample. A compositional coverage of the different analytical speciation techniques for the petroleum samples is determined using the different boiling curves. Each of the different analytical speciation techniques covers a different boiling range and produces a compositional model modeling a breakdown of components in the petroleum sample by carbon number, aromatic ring family, and heteroatom class.

Abstract: In one embodiment, a method of matching an impedance is disclosed. An impedance matching network is coupled between a radio frequency (RF) source and a plasma chamber. The matching network includes a variable reactance element (VRE) having different positions for providing different reactances. The RF source is subject to a power control scheme to control a power delivered to the matching network. Based on a determined parameter, a new position for the VRE is determined to reduce a reflected power at the RF input of the matching network. The VRE is altered to the new position while the power control scheme is altered.

Abstract: In one embodiment, an RF impedance matching network is disclosed. The matching network is coupled between an RF source having a variable frequency and a plasma chamber having a variable chamber impedance. The matching network includes a variable reactance element (VRE), and a control circuit coupled to the VRE and a sensor, the sensor configured to detect an RF parameter. To cause an impedance match between the RF source and the plasma chamber, the control circuit determines, based on the detected RF parameter and a VRE configuration, a new source frequency for the RF source. The impedance match then causes the variable frequency of the RF source to alter to the new source frequency.

Abstract: A system and method for conveyor configuration and testing. The system is configured to execute the method, which includes: receive input data relating to configuration of a conveyor system; prepare a simulation of the configured conveyor system; operate the simulation of the conveyor system; determine at least one operational parameter related to the conveyor system to be monitored; monitor the at least one operational parameter during operation of the simulation of the conveyor system; determine if the configuration of the conveyor system needs to be adjusted based on the monitored operational parameter; if the configuration needs to be adjusted, automatically make an adjustment and return to operate the simulation of the conveyor system; and continue the simulation until otherwise terminated. In some cases, the monitoring operational parameters uses a machine learning model based on actual data from operating conveyors.

Abstract: Embodiments herein relate to systems and methods for identifying a plurality of components of a petroleum sample. Embodiments further relate to determining respective atmospheric equivalent boiling points (AEBPs) for respective ones of the plurality of components. Embodiments further relate to determining a boiling curve for the petroleum sample based on the respective AEBPs. Embodiments further relate to outputting an indication of the boiling curve for the petroleum sample. Other embodiments may be described or claimed.

Abstract: In one embodiment, a method of matching an impedance is disclosed. An impedance matching network is coupled between a radio frequency (RF) source and a plasma chamber. The matching network includes a variable reactance element (VRE) having different positions for providing different reactances. The RF source has an RF source control circuit carrying out a power control scheme to control a power delivered to the matching network. Based on a determined parameter, a new position for the VRE is determined to reduce a reflected power at the RF input of the matching network. The matching network provides a notice signal to the RF source indicating the VRE will be altered. In response to the notice signal, the RF source control circuit alters the power control scheme. While the power control scheme is altered, the VRE is altered to the new position.

Abstract: In one embodiment, a method of using an impedance matching network to determine a plasma chamber characteristic is disclosed. An impedance matching network is coupled between a radio frequency (RF) source and a plasma chamber. The matching network includes a variable reactance element (VRE) having different positions for providing different reactances. A characteristic of the plasma chamber is determined based on reference values for a parameter of the matching network and a current value. Based thereon, either a visual or audible indication of the determined characteristic of the plasma chamber is provided, or an action is taken to address the determined characteristic.

Abstract: In one embodiment, an RF impedance matching circuit includes at least one electronically variable capacitor (EVC) comprising discrete fixed capacitors. Each fixed capacitor has a corresponding switching circuit for switching in and out the fixed capacitor to alter a total capacitance of the EVC. Each switching circuit includes a diode operably coupled to the fixed capacitor to cause the switching in and out of the fixed capacitor, the diode being a PIN diode or an NIP diode. Each switching circuit further includes a driver circuit operably coupled to the diode, and a resonant filter positioned between the driver circuit and the diode. The resonant filter includes an inductor and a capacitor coupled in parallel.

Abstract: In one embodiment, a method, a method of manufacturing a semiconductor is disclosed. A monitored semiconductor manufacturing system (monitored system) is operated over a period of time, the monitored system comprising an impedance matching network coupled between a radio frequency (RF) source and a plasma chamber. First values for a parameter of the monitored system are received, the first values comprising different values for the parameter over the time period of operation of the monitored system, and a learning model is trained using the first values for the parameter. A substrate is then placed in a plasma chamber of a controlled semiconductor manufacturing system (controlled system). A characteristic of the controlled system is determined using a current value of the parameter and the trained learning model. An action is then taken upon the controlled system to address the determined characteristic.

Abstract: In one embodiment, a method of impedance matching and controlling the power delivered to a plasma chamber is disclosed. A matching network includes a variable reactance element (VRE), the VRE having different positions for providing different reactances. Based on a determined parameter, the method determines potential new positions for the VRE that would have a threshold effectiveness in providing an impedance match between the RF source and the plasma chamber. A preferred position for the VRE is determined by determining the one of the potential new positions meeting the threshold effectiveness whose efficiency in delivering RF power from the RF input to the RF output would cause an RF power at the RF output to be closest to a desired RF power.

Abstract: A device providing inter-device call continuity facilitated by a wireless audio output device may include a processor configured to initiate, over a peer-to-peer connection with a second device, a communication session between the second device and a third device. The processor may be further configured to establish, over the peer-to-peer connection with the second device, an audio link corresponding to the communication session. The processor may be further configured to determine, based at least in part on the audio link, that a connection quality of the peer-to-peer connection satisfies a connection degradation condition. The processor may be further configured to request, over a wide area network connection, for the communication session with the third device to be handed-off from the second device to the first device, and to establish, over the wide area network connection, the communication session with the third device.

Abstract: In one embodiment, the present disclosure is directed to an RF impedance matching network that includes an electronically variable capacitor (EVC) and a control circuit. The control circuit is coupled to a sensor configured to detecting an RF parameter. To cause an impedance match between an RF source and a plasma chamber, the control circuit determines, using a match lookup table with a value based on the detected RF parameter, a match combination of a new EVC configuration for providing a new EVC capacitance, and a new source frequency for the RF source. The control circuit then alters the EVC to the new EVC configuration, and alters the variable frequency of the RF source to the new source frequency.