Patents by Inventor Imtiaz J. Rangwalla

Imtiaz J. Rangwalla has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ELECTRON BEAM APPARATUS WITH ADJUSTABLE AIR GAP
    Publication number: 20170062172
    Abstract: An electron beam processing apparatus for treating a substrate is provided. The apparatus has an electron beam generating assembly housed in a chamber that includes a filament for generating a plurality of electrons upon heating. The apparatus may also have a foil support assembly that is configured to direct the plurality of electrons through a thin foil out of the chamber. The apparatus may further have a processing assembly that is configured to pass the substrate by the thin foil so that the plurality of electrons penetrates the substrate and cause a chemical reaction. A distance of an air gap between the thin foil and the substrate may be adjustable.
    Type: Application
    Filed: August 25, 2016
    Publication date: March 2, 2017
    Inventors: Imtiaz J. Rangwalla, Rich Alexy, Edward Maguire
  • CROSS LINKING MEMBRANE SURFACES
    Publication number: 20110256378
    Abstract: The present invention relates, in part, to high energy processes for manufacturing cross-linked polyolefins. The polyolefins described herein are capable of undergoing further processing without compromising their physical properties and dynamic performance.
    Type: Application
    Filed: April 13, 2011
    Publication date: October 20, 2011
    Inventors: Christopher H. Collins, Imtiaz J. Rangwalla
  • Alkylenimine/organic barrier coatings having bis-silane additives
    Patent number: 6541088
    Abstract: A composition which provides gas, flavor, and aroma barrier to substrates, where the composition is formed by mixing an ethylenically unsaturated acid, a bis-silane and a polyamine.
    Type: Grant
    Filed: March 3, 2000
    Date of Patent: April 1, 2003
    Assignees: EG Technology Partners, L.P., Dow Corning Corporation, Dow Corning S.A.
    Inventors: Imtiaz J. Rangwalla, John E. Wyman, Patrick Jacques Jean Merlin, Shrenik Mahesh Nanavati, Lisa Marie Seibel, Laurence Gallez
  • Reactive silicone/alkyleneimine barrier laminating adhesives having bis-silane additives
    Patent number: 6436498
    Abstract: A method of laminating two substrates by coating at least one side of a substrate with a laminating adhesive, bringing a coated side of the substrate into contact with a second substrate to form a three layer film, and treating the three layer film with a free radical initiator. The laminating adhesive is formed by mixing an ethylenically unsaturated acid, a bis-silane and a polyamine, and the polyamine optionally can have a crosslinker reacted therein.
    Type: Grant
    Filed: March 3, 2000
    Date of Patent: August 20, 2002
    Assignees: Dow Corning Corporation, Dow Corning SA, EG Technology Partners, L.P.
    Inventors: Imtiaz J. Rangwalla, John E. Wyman, Patrick Jacques Jean Merlin, Shrenik Mahesh Nanavati, Lisa Marie Seibel, Laurence Gallez
  • Barrier coatings having bis-silanes
    Patent number: 6416817
    Abstract: A process of preparing an oxygen barrier coating using a compound of the general formula RaX3−aSi—Z—SiX3−aRa wherein Z is R′NH(R′NH)pR′, each R is selected from the group consisting of a hydrogen atom and a hydrocarbon group, each X is selected from the group consisting of an alkoxy group with 1 to 4 carbon atoms, a halogen atom, an oxime group or an acyloxy group, each R′ is a divalent hydrocarbon group having 1 to 12 carbon atoms; a is from 0 to 3 and p is 0 or 1. The invention further comprises compositions incorporating the above compound. Coatings prepared may be used in packaging applications as a top coat, or a primer for further coatings.
    Type: Grant
    Filed: March 3, 2000
    Date of Patent: July 9, 2002
    Assignees: Dow Corning SA, E.G. Technology Partners, L.P.
    Inventors: Imtiaz J. Rangwalla, John E. Wyman, Patrick Jacques Jean Merlin, Shrenik Mahesh Nanavati, Laurence Gallez