Patents by Inventor Inkuk Kang
Inkuk Kang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240008279Abstract: A semiconductor device and method of fabricating the same are disclosed. The method includes depositing a polysilicon gate layer over a gate dielectric formed over a surface of a substrate in a peripheral region, forming a dielectric layer over the polysilicon gate layer and depositing a height-enhancing (HE) film over the dielectric layer. The HE film, the dielectric layer, the polysilicon gate layer and the gate dielectric are then patterned for a high-voltage Field Effect Transistor (HVFET) gate to be formed in the peripheral region. A high energy implant is performed to form at least one lightly doped region in a source or drain region in the substrate adjacent to the HVFET gate. The HE film is then removed, and a low voltage (LV) logic FET formed on the substrate in the peripheral region. In one embodiment, the LV logic FET is a high-k metal-gate logic FET.Type: ApplicationFiled: June 26, 2023Publication date: January 4, 2024Applicant: Cypress Semiconductor CorporationInventors: Chun Chen, James Pak, Unsoon KIM, Inkuk Kang, Sung-Taeg Kang, Kuo Tung Chang
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Patent number: 11690227Abstract: A semiconductor device and method of fabricating the same are disclosed. The method includes depositing a polysilicon gate layer over a gate dielectric formed over a surface of a substrate in a peripheral region, forming a dielectric layer over the polysilicon gate layer and depositing a height-enhancing (HE) film over the dielectric layer. The HE film, the dielectric layer, the polysilicon gate layer and the gate dielectric are then patterned for a high-voltage Field Effect Transistor (HVFET) gate to be formed in the peripheral region. A high energy implant is performed to form at least one lightly doped region in a source or drain region in the substrate adjacent to the HVFET gate. The HE film is then removed, and a low voltage (LV) logic FET formed on the substrate in the peripheral region. In one embodiment, the LV logic FET is a high-k metal-gate logic FET.Type: GrantFiled: May 18, 2021Date of Patent: June 27, 2023Assignee: CYPRESS SEMICONDUCTOR CORPORATIONInventors: Chun Chen, James Pak, Unsoon Kim, Inkuk Kang, Sung-Taeg Kang, Kuo Tung Chang
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Publication number: 20210296343Abstract: A semiconductor device and method of fabricating the same are disclosed. The method includes depositing a polysilicon gate layer over a gate dielectric formed over a surface of a substrate in a peripheral region, forming a dielectric layer over the polysilicon gate layer and depositing a height-enhancing (HE) film over the dielectric layer. The HE film, the dielectric layer, the polysilicon gate layer and the gate dielectric are then patterned for a high-voltage Field Effect Transistor (HVFET) gate to be formed in the peripheral region. A high energy implant is performed to form at least one lightly doped region in a source or drain region in the substrate adjacent to the HVFET gate. The HE film is then removed, and a low voltage (LV) logic FET formed on the substrate in the peripheral region. In one embodiment, the LV logic FET is a high-k metal-gate logic FET.Type: ApplicationFiled: May 18, 2021Publication date: September 23, 2021Applicant: Cypress Semiconductor CorporationInventors: Chun Chen, James Pak, Unsoon KIM, Inkuk Kang, Sung-Taeg Kang, Kuo Tung Chang
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Publication number: 20210134811Abstract: Systems and methods of forming such include method, forming a memory gate (MG) stack in a first region, forming a sacrificial polysilicon gate on a high-k dielectric in a second region, wherein the first and second regions are disposed in a single substrate. Then a select gate (SG) may be formed adjacent to the MG stack in the first region of the semiconductor substrate. The sacrificial polysilicon gate may be replaced with a metal gate to form a logic field effect transistor (FET) in the second region. The surfaces of the substrate in the first region and the second region are substantially co-planar.Type: ApplicationFiled: November 20, 2020Publication date: May 6, 2021Applicant: Cypress Semiconductor CorporationInventors: Chun Chen, James Pak, Unsoon Kim, Inkuk Kang, Sung-Taeg Kang, Kuo Tung Chang
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Patent number: 10872898Abstract: Systems and methods of forming such include method, forming a memory gate (MG) stack in a first region, forming a sacrificial polysilicon gate on a high-k dielectric in a second region, wherein the first and second regions are disposed in a single substrate. Then a select gate (SG) may be formed adjacent to the MG stack in the first region of the semiconductor substrate. The sacrificial polysilicon gate may be replaced with a metal gate to form a logic field effect transistor (FET) in the second region. The surfaces of the substrate in the first region and the second region are substantially co-planar.Type: GrantFiled: December 20, 2017Date of Patent: December 22, 2020Assignee: Cypress Semiconductor CorporationInventors: Chun Chen, James Pak, Unsoon Kim, Inkuk Kang, Sung-Taeg Kang, Kuo Tung Chang
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Patent number: 10497710Abstract: A semiconductor device and method of making the same are disclosed. The semiconductor device includes a metal-gate logic transistor formed in a first region of a substrate, and a non-volatile memory (NVM) cell including a select gate and a memory gate formed in a first recess in a second region of the same substrate, wherein the recess is recessed relative to a first surface of the substrate. The metal-gate logic transistor includes a planarized surface above and substantially parallel to the first surface, and top surfaces of the select gate and memory gate are approximately at or below an elevation of the planarized surface of the metal-gate. Generally, at least one of the top surfaces of the select gate or the memory gate includes a silicide formed thereon. Other embodiments are also disclosed.Type: GrantFiled: October 12, 2017Date of Patent: December 3, 2019Assignee: Cypress Semiconductor CorporationInventors: Sung-Taeg Kang, James Pak, Unsoon Kim, Inkuk Kang, Chun Chen, Kuo-Tung Chang
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Publication number: 20190304990Abstract: A semiconductor device and method of fabricating the same are disclosed. The method includes depositing a polysilicon gate layer over a gate dielectric formed over a surface of a substrate in a peripheral region, forming a dielectric layer over the polysilicon gate layer and depositing a height-enhancing (HE) film over the dielectric layer. The HE film, the dielectric layer, the polysilicon gate layer and the gate dielectric are then patterned for a high-voltage Field Effect Transistor (HVFET) gate to be formed in the peripheral region. A high energy implant is performed to form at least one lightly doped region in a source or drain region in the substrate adjacent to the HVFET gate. The HE film is then removed, and a low voltage (LV) logic FET formed on the substrate in the peripheral region. In one embodiment, the LV logic FET is a high-k metal-gate logic FET.Type: ApplicationFiled: March 4, 2019Publication date: October 3, 2019Applicant: Cypress Semiconductor CorporationInventors: Chun Chen, James Pak, Unsoon KIM, Inkuk Kang, Sung-Taeg Kang, Kuo Tung Chang
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Patent number: 10242996Abstract: A semiconductor device and method of fabricating the same are disclosed. The method includes depositing a polysilicon gate layer over a gate dielectric formed over a surface of a substrate in a peripheral region, forming a dielectric layer over the polysilicon gate layer and depositing a height-enhancing (HE) film over the dielectric layer. The HE film, the dielectric layer, the polysilicon gate layer and the gate dielectric are then patterned for a high-voltage Field Effect Transistor (HVFET) gate to be formed in the peripheral region. A high energy implant is performed to form at least one lightly doped region in a source or drain region in the substrate adjacent to the HVFET gate. The HE film is then removed, and a low voltage (LV) logic FET formed on the substrate in the peripheral region. In one embodiment, the LV logic FET is a high-k metal-gate logic FET.Type: GrantFiled: December 20, 2017Date of Patent: March 26, 2019Assignee: Cypress Semiconductor CorporationInventors: Chun Chen, James Pak, Unsoon Kim, Inkuk Kang, Sung-Taeg Kang, Kuo Tung Chang
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Publication number: 20190027484Abstract: Systems and methods of forming such include method, forming a memory gate (MG) stack in a first region, forming a sacrificial polysilicon gate on a high-k dielectric in a second region, wherein the first and second regions are disposed in a single substrate. Then a select gate (SG) may be formed adjacent to the MG stack in the first region of the semiconductor substrate. The sacrificial polysilicon gate may be replaced with a metal gate to form a logic field effect transistor (FET) in the second region. The surfaces of the substrate in the first region and the second region are substantially co-planar.Type: ApplicationFiled: December 20, 2017Publication date: January 24, 2019Applicant: Cypress Semiconductor CorporationInventors: Chun Chen, James Pak, Unsoon Kim, Inkuk Kang, Sung-Taeg Kang, Kuo Tung Chang
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Publication number: 20190027487Abstract: A semiconductor device and method of fabricating the same are disclosed. The method includes depositing a polysilicon gate layer over a gate dielectric formed over a surface of a substrate in a peripheral region, forming a dielectric layer over the polysilicon gate layer and depositing a height-enhancing (HE) film over the dielectric layer. The HE film, the dielectric layer, the polysilicon gate layer and the gate dielectric are then patterned for a high-voltage Field Effect Transistor (HVFET) gate to be formed in the peripheral region. A high energy implant is performed to form at least one lightly doped region in a source or drain region in the substrate adjacent to the HVFET gate. The HE film is then removed, and a low voltage (LV) logic FET formed on the substrate in the peripheral region. In one embodiment, the LV logic FET is a high-k metal-gate logic FET.Type: ApplicationFiled: December 20, 2017Publication date: January 24, 2019Applicant: Cypress Semiconductor CorporationInventors: Chun Chen, James Pak, Unsoon Kim, Inkuk Kang, Sung-Taeg Kang, Kuo Tung Chang
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Publication number: 20180166458Abstract: A semiconductor device and method of making the same are disclosed. The semiconductor device includes a metal-gate logic transistor formed in a first region of a substrate, and a non-volatile memory (NVM) cell including a select gate and a memory gate formed in a first recess in a second region of the same substrate, wherein the recess is recessed relative to a first surface of the substrate. The metal-gate logic transistor includes a planarized surface above and substantially parallel to the first surface, and top surfaces of the select gate and memory gate are approximately at or below an elevation of the planarized surface of the metal-gate. Generally, at least one of the top surfaces of the select gate or the memory gate includes a silicide formed thereon. Other embodiments are also disclosed.Type: ApplicationFiled: October 12, 2017Publication date: June 14, 2018Applicant: Cypress Semiconductor CorporationInventors: Sung-Taeg Kang, James Pak, Unsoon KIM, Inkuk Kang, Chun Chen, Kuo-Tung Chang
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Patent number: 9853039Abstract: A semiconductor device including a non-volatile memory (NVM) cell and method of making the same are disclosed. The semiconductor device includes a metal-gate logic transistor formed on a logic region of a substrate, and the NVM cell integrally formed in a first recess in a memory region of the same substrate, wherein the first recess is recessed relative to a first surface of the substrate in the logic region. Generally, the metal-gate logic transistor further including a planarized surface above and substantially parallel to the first surface of the substrate in the logic region, and the NVM cell is arranged below an elevation of the planarized surface of the metal-gate. In some embodiments, logic transistor is a High-k Metal-gate (HKMG) logic transistor with a gate structure including a metal-gate and a high-k gate dielectric. Other embodiments are also disclosed.Type: GrantFiled: March 29, 2017Date of Patent: December 26, 2017Assignee: Cypress Semiconductor CorporationInventors: Sung-Taeg Kang, James Pak, Unsoon Kim, Inkuk Kang, Chun Chen, Kuo-Tung Chang
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Patent number: 9818755Abstract: A semiconductor device including a non-volatile memory (NVM) cell and method of making the same are disclosed. The semiconductor device includes a metal-gate logic transistor formed on a logic region of a substrate, and the NVM cell integrally formed in a first recess in a memory region of the same substrate, wherein the first recess is recessed relative to a first surface of the substrate in the logic region. Generally, the metal-gate logic transistor further including a planarized surface above and substantially parallel to the first surface of the substrate in the logic region, and the NVM cell is arranged below an elevation of the planarized surface of the metal-gate. In some embodiments, logic transistor is a High-k Metal-gate (HKMG) logic transistor with a gate structure including a metal-gate and a high-k gate dielectric. Other embodiments are also disclosed.Type: GrantFiled: March 29, 2017Date of Patent: November 14, 2017Assignee: Cypress Semiconductor CorporationInventors: Sung-Taeg Kang, James Pak, Unsoon Kim, Inkuk Kang, Chun Chen, Kuo-Tung Chang
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Publication number: 20150255480Abstract: A semiconductor processing method to provide a high quality top oxide layer in charged-trapping NAND and NOR flash memory. The top oxide layer of NAND and NOR flash memory determines array device performance and reliability. The method described overcomes the corner thinning issue and the poor top oxide quality that results from the traditional oxidation approach of using pre-deposited silicon-rich nitride.Type: ApplicationFiled: May 6, 2014Publication date: September 10, 2015Applicant: Spansion LLCInventors: Tung-Sheng CHEN, Shenqing FANG, Inkuk KANG
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Patent number: 8987092Abstract: Methods for fabricating a FIN structure with a semicircular top surface and rounded top surface corners and edges are disclosed. As a part of a disclosed method, a FIN structure is formed in a semiconductor substrate. The FIN structure includes a top surface having corners and edges. The FIN structure is annealed where the annealing causes the top surface to have a semicircular shape and the top surface corners and edges to be rounded.Type: GrantFiled: April 28, 2008Date of Patent: March 24, 2015Assignee: Spansion LLCInventors: Inkuk Kang, Gang Xue, Shenqing Fang, Rinji Sugino, Yi Ma
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Patent number: 8742496Abstract: Methods for forming a memory cell are disclosed. A method includes forming a source-drain structure in a semiconductor substrate where the source-drain structure includes a rounded top surface and sidewall surfaces. An oxide layer is formed on the top and sidewall surfaces of the source-drain structure. The thickness of the portion of the oxide layer that is formed on the top surface of the source-drain structure is greater than the thickness of the portion of the oxide layer that is formed on the sidewall surfaces of the source-drain structure.Type: GrantFiled: June 17, 2013Date of Patent: June 3, 2014Assignee: Spansion LLCInventors: Shenqing Fang, Gang Xue, Wenmei Li, Inkuk Kang
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Patent number: 8637918Abstract: A memory and method of manufacture employing word line scaling. A layered stack, including a charge trapping component and a core polysilicon layer, is formed on a core section and a peripheral section of a substrate. A portion of the layered stack, including the core polysilicon layer is then removed from the peripheral section. A peripheral polysilicon layer, which is thicker than the core polysilicon layer of the layered stack, is next formed on the layered stack and the peripheral section. The layered stack is then isolated from the peripheral polysilicon layer by removing a portion of the peripheral polysilicon layer from the core section, and polysilicon lines are patterned in the isolated layered stack.Type: GrantFiled: November 10, 2011Date of Patent: January 28, 2014Assignee: Spansion LLCInventors: Shenqing Fang, Chun Chen, Wenmei Li, Inkuk Kang, Gang Xue, Hyesook Hong
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Publication number: 20140001537Abstract: A method for fabricating a memory device with U-shaped trap layers over rounded active region corners is disclosed. In the present invention, an STI process is performed before the charge-trapping layer is formed. Immediately after the STI process, the sharp corners of the active regions are exposed, making them available for rounding. Rounding the corners improves the performance characteristics of the memory device. Subsequent to the rounding process, a bottom oxide layer, nitride layer, and sacrificial top oxide layer are formed. An organic bottom antireflective coating applied to the charge trapping layer is planarized. Now the organic bottom antireflective coating, sacrificial top oxide layer, and nitride layer are etched, without etching the sacrificial top oxide layer and nitride layer over the active regions. After the etching the charge trapping layer has a cross-sectional U-shape appearance.Type: ApplicationFiled: September 5, 2013Publication date: January 2, 2014Applicant: Spansion LLCInventors: Shenqing FANG, Angela HUI, Shao-Yu TING, Inkuk KANG, Gang XUE
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Publication number: 20130277732Abstract: Methods for forming a memory cell are disclosed. A method includes forming a source-drain structure in a semiconductor substrate where the source-drain structure includes a rounded top surface and sidewall surfaces. An oxide layer is formed on the top and sidewall surfaces of the source-drain structure. The thickness of the portion of the oxide layer that is formed on the top surface of the source-drain structure is greater than the thickness of the portion of the oxide layer that is formed on the sidewall surfaces of the source-drain structure.Type: ApplicationFiled: June 17, 2013Publication date: October 24, 2013Inventors: Shenqing FANG, Gang XUE, Wenmei LI, Inkuk KANG
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Patent number: 8551858Abstract: A method for fabricating a memory device with U-shaped trap layers over rounded active region corners is disclosed. In the present invention, an STI process is performed before the charge-trapping layer is formed. Immediately after the STI process, the sharp corners of the active regions are exposed, making them available for rounding. Rounding the corners improves the performance characteristics of the memory device. Subsequent to the rounding process, a bottom oxide layer, nitride layer, and sacrificial top oxide layer are formed. An organic bottom antireflective coating applied to the charge trapping layer is planarized. Now the organic bottom antireflective coating, sacrificial top oxide layer, and nitride layer are etched, without etching the sacrificial top oxide layer and nitride layer over the active regions. After the etching the charge trapping layer has a cross-sectional U-shape appearance.Type: GrantFiled: February 3, 2010Date of Patent: October 8, 2013Assignee: Spansion LLCInventors: Shenqing Fang, Angela Hui, Shao-Yu Ting, Inkuk Kang, Gang Xue