Patents by Inventor Ippei Kobayashi

Ippei Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6256140
    Abstract: An optical amplifying apparatus is basically arranged by employing an amplifying optical fiber, a pumping light source, and a wavelength division multiplexer for entering thereinto pumping light.
    Type: Grant
    Filed: October 26, 1999
    Date of Patent: July 3, 2001
    Assignee: NEC Corporation
    Inventor: Ippei Kobayashi
  • Patent number: 6192060
    Abstract: An optical transmitter having an automatic output controlling function converts monitor current of a laser into a voltage and detects an average value of the voltage. The average value is compared with a mark-space ratio outputted from a mark-space ratio detection circuit by a bias control circuit, by which a bias circuit is controlled. Meanwhile, the average value described above is divided by the mark-space ratio from the mark-space ratio detection circuit by an operation circuit, and a resulting value is compared with a reference voltage (Vref) and amplified by a pulse current controller. The pulse current driver is controlled with the amplified output of the pulse current controller. Finally, outputs of the pulse current driver and the bias circuit are added to drive the laser.
    Type: Grant
    Filed: January 15, 1999
    Date of Patent: February 20, 2001
    Assignee: NEC Corporation
    Inventor: Ippei Kobayashi
  • Patent number: 5963288
    Abstract: An improved liquid crystal device and manufacturing method for same are described. In the device, a pair of substrates, between which a liquid crystal layer is disposed, is joined with pillars inbetween functioning as spacers which are provided of photocurable resin by photolithography. With this stucture, the spacers can be in surface contact with the inside surfaces of the substrates on which electrode arrangement and active devices are formed.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: October 5, 1999
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Masahiko Sato, Toshimitsu Konuma, Seiichi Odaka, Toshiharu Yamaguchi, Toshio Watanabe, Osamu Aoyagi, Kaoru Tabata, Chizuru Isigaki, Hiroyuki Sakayori, Ippei Kobayashi, Akio Osabe, Shunpei Yamazaki
  • Patent number: 5952676
    Abstract: An improved liquid crystal device and manufacturing method for same are described. In the device, a pair of substrates, between which a liquid crystal layer is disposed, is joined with pillars inbetween functioning as spacers which are provided of photocurable resin by photolithography. With this structure, the spacers can be in surface contact with the inside surfaces of the substrates on which electrode arrangement and active devices are formed.
    Type: Grant
    Filed: June 6, 1997
    Date of Patent: September 14, 1999
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Masahiko Sato, Toshimitsu Konuma, Seiichi Odaka, Toshiharu Yamaguchi, Toshio Watanabe, Osamu Aoyagi, Kaoru Tabata, Chizuru Isigaki, Hiroyuki Sakayori, Ippei Kobayashi, Akio Osabe, Shunpei Yamazaki
  • Patent number: 5379139
    Abstract: An improved liquid crystal device and manufacturing method for same are described. In the device, a pair of substrates, between which a liquid crystal layer is disposed, is joined with pillars inbetween functioning as spacers which are provided of photocurable resin by photolithography. With this structure, the spacers can be in surface contact with the inside surfaces of :he substrates on which electrode arrangement and active devices are formed.
    Type: Grant
    Filed: July 6, 1992
    Date of Patent: January 3, 1995
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Masahiko Sato, Toshimitsu Konuma, Seiichi Odaka, Toshiharu Yamaguchi, Toshio Watanabe, Osamu Aoyagi, Kaoru Tabata, Chizuru Isigaki, Hiroyuki Sakayori, Ippei Kobayashi, Akio Osabe, Shunpei Yamazaki
  • Patent number: 5296405
    Abstract: An improved semiconductor processing is disclosed. In the manufacturing process, a semiconductor layer is formed and then undergoes photo annealing. A neutralizer is then introduced to the photoannealed semiconductor. The semiconductor thus formed demonstrates the SEL effect instead of the Staebler-Wronski effect.
    Type: Grant
    Filed: August 24, 1992
    Date of Patent: March 22, 1994
    Assignee: Semiconductor Energy Laboratory Co.., Ltd.
    Inventors: Shunpei Yamazaki, Kunio Suzuki, Susumu Nagayama, Takashi Inujima, Masayoshi Abe, Takeshi Fukada, Mikio Kinka, Ippei Kobayashi, Katsuhiko Shibata, Masato Susukida, Kaoru Koyanagi
  • Patent number: 5171710
    Abstract: An improved semiconductor processing is disclosed. In the manufacturing process, a semiconductor layer is formed and then undergoes photo annealing. A neutralizer is then introduced to the photoannealed semiconductor. The semiconductor thus formed demonstrates the SEL effect instead of the Staebler-Wronski effect.
    Type: Grant
    Filed: May 9, 1990
    Date of Patent: December 15, 1992
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Kunio Suzuki, Susumu Nagayama, Takashi Inujima, Masayoshi Abe, Takeshi Fukada, Mikio Kinka, Ippei Kobayashi, Katsuhiko Shibata, Masato Susukida, Kaoru Koyanagi
  • Patent number: 5089426
    Abstract: An improved semiconductor device is disclosed which is free from current leakage due to pin-holes or other gaps. Also an improved method for provessing a semiconductor device is shown. According to the invention, gaps produced in fabricating process of the semiconductor layer are filled with insulator in advance of deposition of electrodes. By virtue of this configuration, short current paths do not result even if transparent electrode is provided on the semiconductor layer.
    Type: Grant
    Filed: January 16, 1990
    Date of Patent: February 18, 1992
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Kunio Suzuki, Masato Susukida, Mikio Kinka, Takeshi Fukada, Masayoshi Abe, Ippei Kobayashi, Katsuhiko Shibata, Kaoru Koyanagi, Susumu Nagayama
  • Patent number: 5035488
    Abstract: An improved method of manufacturing liquid crystal devices is described. The liquid crystal device consists of a pair of substrates, a liquid crystal layer disposed between the substrates, an electrode arrangement including driving devices for applying an electric field to the liquid crystal layer. The driving device is formed of a semiconductor film having a pin junction. The method includes the step of repairing short current paths present in the semiconductor film by applying a reverse voltage to the driving device.
    Type: Grant
    Filed: June 10, 1988
    Date of Patent: July 30, 1991
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventor: Ippei Kobayashi
  • Patent number: 5029983
    Abstract: A liquid crystal device can be driven by application of a unipolar electric field to a ferroelectric liquid crystal layer. Without application of an electric field, isotropic characteristics are observed because of a spiral arrangement of the liquid crystal molecules. Under the application of an electric field, a birefringence is observed because of liquid crystal molecules being aligned in one direction. The device can be driven by applying an electric field in one direction and removing the electric field.
    Type: Grant
    Filed: December 4, 1987
    Date of Patent: July 9, 1991
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Hiroyuki Sakayori, Ippei Kobayashi
  • Patent number: 4995706
    Abstract: An improved liquid crystal device which is driven by applying electric field thereon is shown. The liquid crystal is contained in the device as a layer which is separated into pixel and the optical condition of which is changed by the electric field applied. Contiguous to the liquid crystal layer, a ferroelectric film is provided to impart hysteresis to the device.
    Type: Grant
    Filed: August 14, 1989
    Date of Patent: February 26, 1991
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Takashi Inujima, Shunpei Yamazaki, Toshimitsu Konuma, Toshiji Hamatani, Mitsunori Sakama, Toshiharu Yamaguchi, Ippei Kobayashi
  • Patent number: 4986213
    Abstract: An improved semiconductor processing is desclosed. In the manufacturing process, just formed semiconductor layer undergoes photo annealing and latent dangling bonds are let appear on the surface and gaps, then neutralizer is introduced to the ambience of the semiconductor. The semiconductor thus formed demonstrates SEL effect in place of Staebler-Wronski effect.
    Type: Grant
    Filed: September 28, 1988
    Date of Patent: January 22, 1991
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Kunio Suzuki, Susumu Nagayama, Takashi Inujima, Masayoshi Abe, Takeshi Fukada, Mikio Kinka, Ippei Kobayashi, Katsuhiko Shibata, Masato Susukida, Kaoru Koyanagi
  • Patent number: 4978203
    Abstract: An improved liquid crystal device is shown. The device comprises a pair of substrates, a liquid crystal layer disposed inbetween and a pair of electrodes formed on the opposed insides of the substrate for applying an electric field on the liquid crystal layer. Further a dielectric film is formed on a inside of the substrate of the device. In response to an electric field applied to the liquid crystal layer, an electric charge is accumulated on the dielectric film to enable the device to exhibit apparent coersive electric field.
    Type: Grant
    Filed: January 9, 1989
    Date of Patent: December 18, 1990
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Takashi Inujima, Toshiji Hamatani, Toshimitsu Konuma, Mitsunori Sakama, Ippei Kobayashi, Toshiharu Yamaguchi
  • Patent number: 4937651
    Abstract: An improved semiconductor device is disclosed which is free from current leakage due to pin-holes or other gaps. Also an improved method for processing a semiconductor device is shown. According to the invention, gaps produced in fabricating process of the semiconductor layer are filled with insulator in advance of deposition of electrodes.
    Type: Grant
    Filed: August 22, 1986
    Date of Patent: June 26, 1990
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Kunio Suzuki, Mikio Kinka, Takeshi Fukada, Masayoshi Abe, Ippei Kobayashi, Katsuhiko Shibata, Masato Susukida, Susumu Nagayama, Kaoru Koyanagi
  • Patent number: 4904057
    Abstract: A liquid crystal device can be driven by application of unipolar electric field to a ferroelectric liquid crystal layer. Without application of electric field, isotropic characteristics is observed because of a spiral arrangement of liquid crystal molecules. Under application of electric field, a birefringence is observed because of liquid crystal molecules aligned in one direction. The device can be driven by applying an electric field in one direction and removing the electric field, by using a rectifier in series with each pixel.
    Type: Grant
    Filed: December 1, 1988
    Date of Patent: February 27, 1990
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Hiroyuki Sakayori, Ippei Kobayashi
  • Patent number: 4888305
    Abstract: An improved semiconductor processing is disclosed. In the manufacturing process, just formed semiconductor layer undergoes photo annealing and latent dangling bonds are let appear on the surface and gaps, then neutralizer is introduced to the ambience of the semiconductor. The semiconductor thus formed demonstrates SEL effect in place of Staebler-Wronski effect.
    Type: Grant
    Filed: March 9, 1989
    Date of Patent: December 19, 1989
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Kunio Suzuki, Susumu Nagayama, Takashi Inujima, Masayoshi Abe, Takeshi Fukada, Mikio Kinka, Ippei Kobayashi, Katsuhiko Shibata, Masato Susukida, Kaoru Koyanagi
  • Patent number: 4874461
    Abstract: An improved liquid crystal device and manufacturing method for same are described. In the device, a pair of substrates, between which a liquid crystal layer is disposed, is joined with pillars inbetween functioning as spacers which are provided of photocurable resin by photolithography. With this structure, the spacers can be in surface contact with the inside surfaces of the substrates on which electrode arrangement and active devices are formed.
    Type: Grant
    Filed: July 21, 1988
    Date of Patent: October 17, 1989
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Masahiko Sato, Toshimitsu Konuma, Seiichi Odaka, Toshiharu Yamaguchi, Toshio Watanabe, Osamu Aoyagi, Kaoru Tabata, Chizuru Isigaki, Hiroyuki Sakayori, Ippei Kobayashi, Akio Osabe, Shunpei Yamazaki
  • Patent number: 4812415
    Abstract: An improved semiconductor device is disclosed which is free from current leakage due to pin-holes or other gaps. Also an improved method for processing a semiconductor device is shown. According to the invention, gaps produced during the fabricating process of the semiconductor layer are filled with insulator in advance of deposition of electrodes. By virtue of this configuration, short current paths do not result when electrodes are provided on the semiconductor layer.
    Type: Grant
    Filed: August 6, 1987
    Date of Patent: March 14, 1989
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Kunio Suzuki, Mikio Kinka, Takeshi Fukada, Masayoshi Abe, Ippei Kobayashi, Katsuhiko Shibata, Masato Susukida, Susumu Nagayama, Kaoru Koyanagi
  • Patent number: 4806496
    Abstract: Photoelectric conversion devices are manufactured at high yield by repairing the devices during the final steps of the manufacuturing process. Short current paths resulting from the formation process of semiconductor layers can be eliminated by applying a reverse voltage to the layers, which thus are heated and made insulating. After the elimination of the short current paths, the reverse current no longer passes beyond 15 mA on a reverse voltage of 8 V.
    Type: Grant
    Filed: January 28, 1987
    Date of Patent: February 21, 1989
    Assignee: Semiconductor Energy Laboratory Co. Ltd.
    Inventors: Kunio Suzuki, Ippei Kobayashi, Katsuhiko Shibata, Masato Susukida, Mikio Kinka, Takeshi Fukada, Susumu Nagayama, Masayoshi Abe, Shunpei Yamazaki
  • Patent number: 4786607
    Abstract: An improved semiconductor device is disclosed which is free from current leakage due to pin-holes or other gaps. Also an improved method for processsing a semiconductor device is shown. According to the invention, gaps produced in fabricating process of the semiconductor layer are filled with insulator in advance of deposition of electrodes.
    Type: Grant
    Filed: September 4, 1987
    Date of Patent: November 22, 1988
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shumpei Yamazaki, Kunio Suzuki, Mikio Kinka, Takeshi Fukada, Masayoshi Abe, Ippei Kobayashi, Katsuhiko Shibata, Masato Susukida, Susumu Nagayama, Kaoru Koyanagi