Abstract: A dot matrix display panel with a thin film transistor and the manufacturing method therefor, the panel being so constructed that a gate insulating layer and a semiconductor layer are provided as one laminated film substantially equal in the size thereto on an insulating substrate having a gate electrode and in a region of the substrate except for the peripheral portion thereof, and a source electrode and a drain electrode come into contact with the semiconductor layer in a region covering the gate electrode and gate insulating layer so as to constitute a thin film transistor array substrate, so that a display medium is sandwiched between the array substrate and the substrate having a transparent electrode.

Abstract: A video camera with a monitor, which is provided integrally on both surfaces or the same one surface of a semiconductor substrate or a substrate having a semiconductor film thereon; an image pickup plate and a display unit in one functioning as the image pickup plate for converting an optical image into an electrical signal and the display unit for converting the electrical signal into a visual image; the camera is provided with an optical system for imaging the optical image on the pickup plate.

Abstract: A method of producing thin film transistor arrays and having at least 7 steps including: a first step of forming a first electrode layer uniformly over an insulating substrate; a second step of forming electrodes, such as drain and source electrodes and bus bars with a desired pattern by photoetching the first electrode; a third step of forming a uniform semiconducting layer on the surface of the substrate having the patterned electrodes; a fourth step of successively forming a uniform insulating layer over the uniformly deposited semiconducting layer while keeping the array in a vacuum; a fifth step of photoetching the uniformly deposited insulating layer into a desired pattern; a sixth step of photoetching the uniform semiconducting layer into the same pattern as the patterned insulating layer; a seventh step of forming a second electrode uniformly over the surface having the patterned electrodes and insulating layer; and an eighth step of photoetching the uniformly deposited second electrode into a desired