Patents by Inventor Isao Sugiyama
Isao Sugiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11780035Abstract: A solder composition of the invention contains: a flux composition containing (A) a rosin resin, (B) an activator, (C) an imidazoline compound having a phenyl group, and (D) an antioxidant; and (E) solder powder, in which the (B) component contains (B1) an organic acid, the (B1) component contains at least one selected from the group consisting of (B11) 1-hydroxy-2-naphthoic acid, 3-hydroxy-2-naphthoic acid, and 1,4-dihydroxy-2-naphthoic acid, and the (C) component is at least one selected from the group consisting of 2-phenylimidazoline and 2-benzylimidazoline.Type: GrantFiled: September 21, 2021Date of Patent: October 10, 2023Assignee: Tamura CorporationInventors: Ryutaro Shimoishi, Isao Sugiyama, Daigo Ichikawa
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Publication number: 20220097181Abstract: A solder composition of the invention contains: a flux composition containing (A) a rosin resin, (B) an activator, (C) an imidazoline compound having a phenyl group, and (D) an antioxidant; and (E) solder powder, in which the (B) component contains (B1) an organic acid, the (B1) component contains at least one selected from the group consisting of (B11) 1-hydroxy-2-naphthoic acid, 3-hydroxy-2-naphthoic acid, and 1,4-dihydroxy-2-naphthoic acid, and the (C) component is at least one selected from the group consisting of 2-phenylimidazoline and 2-benzylimidazoline.Type: ApplicationFiled: September 21, 2021Publication date: March 31, 2022Inventors: Ryutaro Shimoishi, Isao Sugiyama, Daigo Ichikawa
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Patent number: 8657915Abstract: The present invention provides a metal powder composed of tantalum or niobium that achieves both sinterability and fluidity and the manufacturing method thereof. The present invention also provides a tantalum or niobium powder that enables the manufacturing of an anode for a solid electrolytic capacitor in which holes are formed for a conductive polymer-containing solution to pass through, without using a hole molding material or pore forming material. Furthermore, the present invention provides an anode for a solid electrolytic capacitor that enables the manufacturing of a high-volume and low ESR solid electrolytic capacitor. The present invention further provides a manufacturing method of a metal powder that allows the manufacturing of a metal powder of a given diameter range from a raw powder at high yield, without requiring a lot of work and time.Type: GrantFiled: May 31, 2006Date of Patent: February 25, 2014Assignee: Global Advanced Metals Japan, K.K.Inventors: Yujiro Mizusaki, Isao Sugiyama, Hitoshi Iijima, Osamu Kubota
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Patent number: 7846301Abstract: A method of production of blast furnace coke comprising drying mixed coal, then, or simultaneously with the drying, classifying it to fine-grained coal and coarse-grained coal, then adding to the fine-grained coal at a temperature of 80 to 350° C. a caking additive comprised of one or more of a heavy distillate of tar, soft pitch, and petroleum pitch, agglomerating it by hot pressing, then mixing the clumps of coal and the coarse-grained coal and charging and carbonizing the mixture in a coke oven.Type: GrantFiled: May 12, 2006Date of Patent: December 7, 2010Assignee: Nippon Steel CorporationInventors: Kenji Katou, Isao Sugiyama, Yoshiaki Nakashima, Hiroshi Uematsu, Takashi Arima, Masahiko Yokomizo, Michitaka Sakaida
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Publication number: 20090080145Abstract: The present invention provides a metal powder composed of tantalum or niobium that achieves both sinterability and fluidity and the manufacturing method thereof. The present invention also provides a tantalum or niobium powder that enables the manufacturing of an anode for a solid electrolytic capacitor in which holes are formed for a conductive polymer-containing solution to pass through, without using a hole molding material or pore forming material. Furthermore, the present invention provides an anode for a solid electrolytic capacitor that enables the manufacturing of a high-volume and low ESR solid electrolytic capacitor. The present invention further provides a manufacturing method of a metal powder that allows the manufacturing of a metal powder of a given diameter range from a raw powder at high yield, without requiring a lot of work and time.Type: ApplicationFiled: May 31, 2006Publication date: March 26, 2009Inventors: Yujiro Mizusaki, Isao Sugiyama, Hitoshi Iijima, Osamu Kubota
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Publication number: 20080190753Abstract: A method of production of blast furnace coke comprising drying mixed coal, then, or simultaneously with the drying, classifying it to fine-grained coal and coarse-grained coal, then adding to the fine-grained coal at a temperature of 80 to 350° C. a caking additive comprised of one or more of a heavy distillate of tar, soft pitch, and petroleum pitch, agglomerating it by hot pressing, then mixing the clumps of coal and the coarse-grained coal and charging and carbonizing the mixture in a coke oven.Type: ApplicationFiled: May 12, 2006Publication date: August 14, 2008Inventors: Kenji Katou, Isao Sugiyama, Yoshiaki Nakashima, Hiroshi Uematsu, Takashi Arima, Masahiko Yokomizo, Michitaka Sakaida
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Patent number: 6372914Abstract: The present invention provides an efficient stereoselective method for manufacturing (2S,4S)-2-[[(R)-hydroxy-(3R)-cyclic amine-3-yl]methyl]pyrrolidine-4-thiol or a salt thereof which is useful as an intermediate for the manufacture of carbapenem and also provides the intermediate. A method for manufacturing which comprises the step of reacting a compound of the formula (I): (wherein, R1 is a lower alkylsulfonyl group, an optionally substituted arylsulfonyl group or an alkylsilyl group; and R2 is a protecting group for an amino group) with a compound of the formula (II): (wherein, R3 is a substituted or unsubstituted lower alkyl group or aryl group; X is an oxygen atom or a sulfur atom; Y is an azide group or a nitro group; and m is an integer of 2 to 5).Type: GrantFiled: November 2, 2000Date of Patent: April 16, 2002Assignee: Eisai Co., Ltd.Inventors: Takaaki Suzuki, Isao Sugiyama, Manabu Sasho, Nobuaki Sato, Atsushi Kamada, Kazuhide Ashizawa
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Patent number: 6218550Abstract: The present invention provides an efficient stereoselective method for manufacturing (2S,4S)-2-[[(R)-hydroxy-(3R)-cyclic amine-3-yl]methyl]pyrrolidine-4-thiol or a salt thereof which is useful as an intermediate for the manufacture of carbapenem and also provides the intermediate. A method for manufacturing which comprises the step of reacting a compound of the formula (I): (wherein, R1 is a lower alkylsulfonyl group, an optionally substituted arylsulfonyl group or an alkylsilyl group; and R2 is a protecting group for an amino group) with a compound of the formula (II): (wherein, R3 is a substituted or unsubstituted lower alkyl group or aryl group; X is an oxygen atom or a sulfur atom; Y is an azide group or a nitro group; and m is an integer of 2 to 5).Type: GrantFiled: November 12, 1999Date of Patent: April 17, 2001Assignee: Eisai Co., Ltd.Inventors: Takaaki Suzuki, Isao Sugiyama, Manabu Sasho, Nobuaki Sato, Atsushi Kamada, Kazuhide Ashizawa
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Patent number: 6037341Abstract: Compounds having potent antimicrobial effects over Gram-positive bacteria and Gram-negative bacteria, a high stability to .beta.-lactamases and DHP-I and a high safety for the human body and a process for producing the same. Carbapenem compounds represented by the following general formula (I) or salts thereof: ##STR1## wherein the ring A represents a 3- to 7-membered non-aromatic ring containing at least one nitrogen atom and optionally having a substituent other than R.sup.6 ; R.sup.1 represents hydrogen or methyl; R.sup.2 and R.sup.5 are the same or different and each represents hydrogen or a protecting group of the hydroxyl group; R.sup.3 represents hydrogen or a protecting group of the carboxyl group; R.sup.4 represents hydrogen, lower alkyl or a protecting group of the amino group; R.sup.6 represents: (1) hydrogen, (2) lower alkyl, optionally substituted by an optionally protected hydroxy, carbamoyl, formimidoyl, acetimidoyl or ##STR2## wherein R.sup.7 and R.sup.Type: GrantFiled: December 18, 1996Date of Patent: March 14, 2000Assignee: Eisai Co., Ltd.Inventors: Nobuaki Sato, Manabu Sasho, Atsushi Kamata, Takaaki Suzuki, Isao Sugiyama, Kanemasa Katsu, Takeshi Suzuki
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Patent number: 5741902Abstract: A 7-acyl-3-substituted carbamoyloxy cephem compound represented by the following formula (1): ##STR1## wherein A means a --CH.dbd. or --N.dbd. group; R.sup.1 denotes a hydroxyl, lower alkoxyl, fluorine-substituted lower alkoxyl or protected hydroxyl group; R.sup.2 and R.sup.3 are the same or different and individually represent a lower alkyl, hydroxyl-substituted lower alkyl, a carbamoyl-substituted lower alkyl group or cyano-substituted lower alkyl group, R.sup.2 is a hydrogen atom and R.sup.3 is a lower alkoxyl or alkyl group optionally substituted by one or more halogen atoms, or the group ##STR2## means a 4-6 membered heterocyclic group, which contains one nitrogen atom, or a morpholino group, said heterocyclic group or morpholino group being optionally substituted by one or more lower alkyl, hydroxyl and/or hydroxyl-substituted lower alkyl groups; and R.sup.Type: GrantFiled: June 5, 1995Date of Patent: April 21, 1998Assignee: Eisai Co., Ltd.Inventors: Shigeto Negi, Motosuke Yamanaka, Kanemasa Katsu, Isao Sugiyama, Yuuki Komatu, Atsushi Kamata, Akihiko Tsuruoka, Yoshimasa Machida
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Patent number: 5604217Abstract: A 7-acyl-3-substituted carbamoyloxy cephem compound represented by the following formula (1): ##STR1## wherein A means a --CH.dbd. or --N.dbd. group; R.sup.1 denotes a hydroxyl, lower alkoxyl, fluorine-substituted lower alkoxyl or protected hydroxyl group; R.sup.2 and R.sup.3 are the same or different and individually represent a lower alkyl, hydroxyl-substituted lower alkyl, a carbamoyl-substituted lower alkyl group or cyano-substituted lower alkyl group, R.sup.2 is a hydrogen atom and R.sup.3 is a lower alkoxyl or alkyl group optionally substituted by one or more halogen atoms or the group ##STR2## means a 4-6 membered heterocyclic group, which contains one nitrogen atom, or a morpholino group, said heterocyclic group or morpholino group being optionally substituted by one or more lower alkyl, hydroxyl and/or hydroxyl-substituted lower alkyl groups; and R.sup.Type: GrantFiled: June 5, 1995Date of Patent: February 18, 1997Assignee: Eisai Co., Ltd.Inventors: Shigeto Negi, Motosuke Yamanaka, Kanemasa Katsu, Isao Sugiyama, Yuuki Komatu, Atsushi Kamata, Akihiko Tsuruoka, Yoshimasa Machida
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Patent number: 5587473Abstract: A 7-acyl-3-substituted carbamoyloxy cephem compound represented by the following formula (1): ##STR1## wherein A means a --CH.dbd. or --N.dbd. group; R.sup.1 denotes a hydroxyl, lower alkoxyl, fluorine-substituted lower alkoxyl or protected hydroxyl group; R.sup.2 and R.sup.3 are the same or different and individually represent a lower alkyl, hydroxyl-substituted lower alkyl, a carbamoyl-substituted lower alkyl group or cyano-substituted lower alkyl group, R.sup.2 is a hydrogen atom and R.sup.3 is a lower alkoxyl or alkyl group optionally substituted by one or more halogen atoms, or the group ##STR2## means a 4-6 membered heterocyclic group, which contains one nitrogen atom, or a morpholino group, said heterocyclic group or morpholino group being optionally substituted by one or more lower alkyl, hydroxyl and/or hydroxyl-substituted lower alkyl groups; and R.sup.Type: GrantFiled: June 27, 1996Date of Patent: December 24, 1996Assignee: Eisai Co., Ltd.Inventors: Shigeto Negi, Motosuke Yamanaka, Kanemasa Katsu, Isao Sugiyama, Yuuki Komatu, Atsushi Kamata, Akihiko Tsuruoka, Yoshimasa Machida
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Patent number: 5563265Abstract: A 7-acyl-3-substituted carbamoyloxy cephem compound represented by the following formula (1): ##STR1## wherein A means a --CH.dbd. or --N.dbd. group; R.sup.1 denotes a hydroxyl, lower alkoxyl, fluorine-substituted lower alkoxyl or protected hydroxyl group; R.sup.2 and R.sup.3 are the same or different and individually represent a lower alkyl, hydroxyl-substituted lower alkyl, a carbamoyl-substituted lower alkyl group or cyano-substituted lower alkyl group, R.sup.2 is a hydrogen atom and R.sup.3 is a lower alkoxyl or alkyl group optionally substituted by one or more halogen atoms, or the group ##STR2## means a 4-6 membered heterocyclic group, which contains one nitrogen atom, or a morpholino group, said heterocyclic group or morpholino group being optionally substituted by one or more lower alkyl, hydroxyl and/or hydroxyl-substituted lower alkyl groups; and R.sup.Type: GrantFiled: February 23, 1995Date of Patent: October 8, 1996Assignee: Eisai Co., Ltd.Inventors: Shigeto Negi, Motosuke Yamanaka, Kanemasa Katsu, Isao Sugiyama, Yuuki Komatu, Atsushi Kamata, Akihiko Tsuruoka, Yoshimasa Machida
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Patent number: 5559225Abstract: A 7-acyl-3-substituted carbamoyloxy cephem compound represented by the following formula (1): ##STR1## wherein A means a --CH.dbd. or --N.dbd. group; R.sup.1 denotes a hydroxyl, lower alkoxyl or protected hydroxyl group; R.sup.2 and R.sup.3 are the same or different and individually represent a lower alkyl, hydroxyl-substituted lower alkyl, a carbamoyl-substituted lower alkyl group or cyano-substituted lower alkyl group, R.sup.2 is a hydrogen atom and R.sup.3 is a lower alkoxyl or alkyl group optionally substituted by one or more halogen atoms, or the group ##STR2## means a 4-6 membered heterocyclic group, which contains one nitrogen atom, or a morpholino group, said heterocyclic group or morpholino group being optionally substituted by one or more lower alkyl, hydroxyl and/or hydroxyl-substituted lower alkyl groups; and R.sup.Type: GrantFiled: March 14, 1994Date of Patent: September 24, 1996Assignee: Eisai Co., Ltd.Inventors: Shigeto Negi, Motosuke Yamanaka, Kanemasa Katsu, Isao Sugiyama, Yuuki Komatu, Atsushi Kamata, Akihiko Tsuruoka, Yoshimasa Machida
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Patent number: 5373000Abstract: A cephalosporin derivative represented by the formula: ##STR1## wherein R.sub.1 represents a lower alkyl group, and A is selected from: a group of the following formula: ##STR2## where R.sub.2 and R.sub.3 are the same or different lower alkyl group, R.sub.4 represents a substituted lower alkyl or amino group;a group which may be substituted and which is represented by the following formula: ##STR3## where R.sub.5 represents a lower alkyl group; or a group of the following formula: ##STR4## where R.sub.5 is as defined above, R.sub.6 represents a hydroxyl lower alkyl or carboxyl group, or its pharmacologically acceptable salt, and a process for preparing the same, as well as an antibacterial agent containing the same.Type: GrantFiled: April 1, 1992Date of Patent: December 13, 1994Assignee: Eisai Co., Ltd.Inventors: Yoshimasa Machida, Takashi Kamiya, Shigeto Negi, Toshihiko Naito, Yuuki Komatu, Seiichiro Nomoto, Isao Sugiyama, Hiroshi Yamauchi
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Patent number: 5151417Abstract: 3-Substituted vinyl cephalosporin derivatives represented by the following formula: ##STR1## wherein R.sup.1 represents a hydroxyl or lower alkoxyl group, X represents a nitrogen atom or a group represented by the formula --CH.dbd., R.sup.2 represents a carboxyl group or a carboxyl group protected with a protecting group, and R.sup.3 is as defined herein, and pharmaceutically acceptable salts thereof are potent antibacterial agents. Processes for their preparation, intermediates in such processes, and antibacterial compositions containing them as active ingredients are also described.Type: GrantFiled: July 10, 1990Date of Patent: September 29, 1992Assignee: Eisai Co., Ltd.Inventors: Manabu Sasho, Hiroshi Yamauchi, Motosuke Yamanaka, Takaharu Nakamura, Kanemasa Katsu, Isao Sugiyama, Yuuki Komatu, Shigeto Negi
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Patent number: 5128465Abstract: A cephem derivative represented by the following formula: ##STR1## wherein R.sub.1 means a fluorine-substituted lower alkyl and A.sub.1 denotes a cyclic or acyclic ammonio group, or a non-toxic salt thereof, is prepared by reacting a compound represented by the following formula: ##STR2## wherein A.sub.1 has the same meaning as defined above, with another compound represented by the following formula: ##STR3## wherein R.sub.1 has the same meaning as defined above, and if necessary, removing the protecting groups.Type: GrantFiled: January 22, 1990Date of Patent: July 7, 1992Assignee: Eisai Co., Ltd.Inventors: Takashi Kamiya, Toshihiko Naito, Yuuki Komatu, Yasunobu Kai, Takaharu Nakamura, Manabu Sasho, Shigeto Negi, Isao Sugiyama, Kanemasa Katsu, Hiroshi Yamauchi
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Patent number: 5089491Abstract: A 3-propenylcephem derivative of the following formula: ##STR1## wherein R.sub.1 represents a fluoro-substituted lower alkyl group or a cyano-substituted lower alkyl group, and A represents a cyclic or an acylic ammonio group, or a pharmaceutically acceptable salt thereof, exhibiting excellent anti-bacterial activities against both Gram-positive bacteria and Gram-negative bacteria; Process for the preparation thereof; Anti-bacterial composition; Intermediate for the 3-propenylcephem derivative; and Process for the preparation of the intermediate.Type: GrantFiled: January 11, 1990Date of Patent: February 18, 1992Assignee: Eisai Co., Ltd.Inventors: Takashi Kamiya, Toshihiko Naito, Shigeto Negi, Yuuki Komatu, Yasunobu Kai, Takaharu Nakamura, Isao Sugiyama, Yoshimasa Machida, Seiichiro Nomoto, Kyosuke Kitoh, Kanemasa Katsu, Hiroshi Yamauchi
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Patent number: 5022947Abstract: The invention provides a means to prepare a highly water-resistant printed material by the ink-jet printing method despite the water-solubility of the dye in the aqueous ink used in the ink-jet printing method. The inventive method comprises: overcoating the surface of the sheet material, which has a water-absorptive surface layer with receptivity of the aqueous ink and printed by the ink-jet printing method, with a curable polyisocyanate compound and bringing the overcoating layer under a condition capable of curing the polyisocyanate compound.Type: GrantFiled: June 5, 1990Date of Patent: June 11, 1991Assignee: Shin-Etsu Polymer Co., Ltd.Inventors: Masamitsu Hasegawa, Satoshi Tamura, Isao Sugiyama, Takashi Wakashima
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Patent number: 5010188Abstract: Described herein is a cephem derivative represented by the general formula: ##STR1## wherein n stands for 1 or 2, Y stands for CH or nitrogen atom, R.sub.1 represents a lower hydrocarbon group or a carboxyl-substituted, a carbamoyl-substituted, or a cyclopropyl-substituted lower alkyl group, and R.sub.2 denotes hydroxyl group, a lower alkyl group, a hydroxy-substituted lower alkyl group, or carbamoyl group. The derivative is useful as an antibacterial composition. Also described herein are processes for the production of the derivative, antibacterial composition, intermediate of the derivative and process for the production thereof.Type: GrantFiled: March 16, 1988Date of Patent: April 23, 1991Assignee: Eisai Co., Ltd.Inventors: Hiroshi Yamauchi, Isao Sugiyama, Isao Saito, Seiichiro Nomoto, Takashi Kamiya, Yoshimasa Machida, Shigeto Negi