Patents by Inventor Isidore Salugsugan

Isidore Salugsugan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reduced chemical-mechanical polishing particulate contamination
    Patent number: 5702563
    Abstract: Particulate contamination of a semiconductor wafer subjected to chemical-mechanical polishing is reduced by applying a high pressure water spray to the polishing pad during conditioning.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: December 30, 1997
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Isidore Salugsugan, Diana M. Schonauer
  • Chemical-mechanical polishing of thin materials using a pulse polishing technique
    Patent number: 5486265
    Abstract: Uniform chemical-mechanical planarization is achieved at a high material removal rate by pulsing the pressure applied to the wafer undergoing planarization between an initial optimum pressure and a reduced second pressure, preferably about 0 psi.
    Type: Grant
    Filed: February 6, 1995
    Date of Patent: January 23, 1996
    Assignee: Advanced Micro Devices, Inc.
    Inventor: Isidore Salugsugan