Abstract: A gas tube protector includes a new coating for the electrodes. The coating, which eliminates the need for conditioning the electrodes prior to using or testing the protector, includes barium titanate and titanium.

Abstract: A film of material (29) is deposited on a substrate (15), as, for example, in a sputtering process, wherein a gas-permeable substrate (73) covers an opening (71) in a process chamber (14) of a passage communicating with a monitoring chamber (52). A monitoring gas is introduced into one of the chambers to diffuse through the gas-permeable substrate (73) into the other of the chambers. Its level of concentration is then monitored in at least one of the chambers while the film is being deposited. As the film deposits on workpiece substrates within the process chamber, the film also deposits on the surface of the gas-permeable substrate. When the film on such gas-permeable substrate forms a continuous surface, diffusion of the monitoring gas from one chamber to the other ceases. Consequently, an increased concentration level of the monitoring gas may be detected in the one chamber and a decreased concentration level may be detected in the other chamber.

Abstract: The position of an armature 22 located within a sealed glass envelope 12 of a sealed contact switch 11 is adjusted to meet a gap width requirement between the armature and an electrical contact 23. The glass envelope 12 is placed into a holer 48 adjacent a magnetic pole face of a magnetizing apparatus. The holder 48 supports the envelope in a position wherein the armature 22 becomes oriented perpendicular to a magnetic force field and the path of movement of the armature in closing or opening the contact extends in the same direction as that of the field. Under the influence of the applied magnetic field, the armature 22 is yieldably pulled beyond its normal path of movement toward the pole face. When the envelope is removed from the field, the armature remains in an adjusted rest position within the envelope, different from its initial rest position. The adjustment of the armature is useful in the manufacture of mercury-wetted sealed contact switches.