Patents by Inventor Itsunari Hayabuchi

Itsunari Hayabuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5324675
    Abstract: A method of producing a semiconductor device of the type which includes a semiconductor substrate; a gate insulating layer of a triplex structure formed on the semiconductor substrate and composed of a first oxide layer, an oxidation-resistant layer and a second oxide layer, and a gate electrode formed on the gate insulating layer, includes the steps of: forming the first oxide layer, the oxidation-resistant layer, and the second oxide layer successively on the semiconductor substrate; adjusting the thickness of the oxidation-resistant layer during or after the formation thereof in such a way that the entire oxidation-resistant layer can be oxidized in a post-process in which the oxidation-resistant layer is oxidized except for that region which corresponds to the gate electrode; and oxidizing the oxidation-resistant layer except for the region corresponding to the gate electrode and forming an oxide layer around the gate electrode, whereby the oxidation-resistant layer is entirely oxidized except for the reg
    Type: Grant
    Filed: March 30, 1993
    Date of Patent: June 28, 1994
    Assignee: Kawasaki Steel Corporation
    Inventor: Itsunari Hayabuchi
  • Patent number: 4868632
    Abstract: In an MONOS type nonvolatile semiconductor memory comprising a channel forming semiconductor region between source and drain regions in a surface of a substrate; a tunnel insulating film formed on the channel forming semiconductor region in the surface of the substrate, the tunnel insulating film permitting charge-injection; a silicon nitride film formed as a second insulating film on the tunnel insulating film; a silicon oxide film formed as a third insulating film; and a conductive electrode formed on the silicon oxide film, the silicon nitride film has a composition close to a stoichiometric value of Si.sub.3 N.sub.4 at a portion near an interface with the tunnel insulating film and has a composition of excess silicon at a portion of the thickness of the same film except near the interface with the tunnel insulating film.
    Type: Grant
    Filed: July 8, 1988
    Date of Patent: September 19, 1989
    Assignees: Director General of Agency of Industrial Science and Technology, Research Development Corporation of Japan, Citizen Watch Co., Ltd.
    Inventors: Yutaka Hayashi, Itsunari Hayabuchi, Tatsuo Tsuchiya, Seiichi Ishihara
  • Patent number: 4475180
    Abstract: A writable non-volatile memory circuit for use in portable electronic devices such as electronic timepiece, wherein there is improved the power consumption and there is provided a volatile memory with a serial input for writing the data into the non-volatile memory and for checking the data.
    Type: Grant
    Filed: December 24, 1981
    Date of Patent: October 2, 1984
    Assignee: Citizen Watch Co., Ltd.
    Inventors: Fukuo Sekiya, Itsunari Hayabuchi