Patents by Inventor Ittetsu OIKAWA

Ittetsu OIKAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Heat treatment apparatus and method of transferring substrates to the same
    Patent number: 8979469
    Abstract: A heat treatment apparatus includes a vessel loading unit on which a substrate vessel configured to accommodate a plurality of substrates at a first interval is loaded, a substrate holder configured to hold the plurality of substrates at a second interval which is smaller than the first interval, a substrate transfer unit capable of supporting the substrates and configured to transfer the plurality of substrates between the substrate holder and the substrate vessel and includes at least two substrate supporting parts stacked with the first interval therebetween and configured to be simultaneously advanced and retreated relative to the substrate vessel and individually advanced and retreated relative to the substrate holder, and a control unit configured to control an upper one of the at least two substrate supporting parts to be in an inoperative state when a lower one is supporting the substrate.
    Type: Grant
    Filed: July 26, 2012
    Date of Patent: March 17, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Kiichi Takahashi, Terumi Kamada, Ittetsu Oikawa
  • HEAT TREATMENT APPARATUS AND METHOD OF TRANSFERRING SUBSTRATES TO THE SAME
    Publication number: 20130028687
    Abstract: A heat treatment apparatus includes a vessel loading unit on which a substrate vessel configured to accommodate a plurality of substrates at a first interval is loaded, a substrate holder configured to hold the plurality of substrates at a second interval which is smaller than the first interval, a substrate transfer unit capable of supporting the substrates and configured to transfer the plurality of substrates between the substrate holder and the substrate vessel and includes at least two substrate supporting parts stacked with the first interval therebetween and configured to be simultaneously advanced and retreated relative to the substrate vessel and individually advanced and retreated relative to the substrate holder, and a control unit configured to control an upper one of the at least two substrate supporting parts to be in an inoperative state when a lower one is supporting the substrate.
    Type: Application
    Filed: July 26, 2012
    Publication date: January 31, 2013
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Kiichi TAKAHASHI, Terumi KAMADA, Ittetsu OIKAWA