Abstract: A method for lithography exposing process is provided. The method includes performing a first lithography exposing process to a resist layer using a mask having a focus-sensitive pattern and an energy-sensitive pattern; measuring critical dimensions (CDs) of transferred focus-sensitive pattern and transferred energy-sensitive pattern on the resist layer; extracting Bossung curves from the CDs; and determining slopes of the Bossung curves.

Abstract: A method for lithography exposing process is provided. The method includes performing a first lithography exposing process to a resist layer using a mask having a focus-sensitive pattern and an energy-sensitive pattern; measuring critical dimensions (CDs) of transferred focus-sensitive pattern and transferred energy-sensitive pattern on the resist layer; extracting Bossung curves from the CDs; and determining slops of the Bossung curves.

Abstract: A golf club head is provided. The golf club head includes a face plate and a body. The face plate has an annular fastening portion with at least one fastening groove mounted therearound. The body has a clamping portion including at least one annular block and at least one annular stopper, so as to form an accommodation slot for accommodating the annular fastening portion. At least one flange is disposed on the top of the clamping portion. When the accommodation slot corresponds to the annular fastening portion, the face plate is squeezed towards the body, and the flange bears against the face plate and is squeezed and deformed to form a catching portion for engaging into the fastening groove, so that the face plate and the body are combined into a club head.