Abstract: A resistant based thermal probe including a nanometer sized four-leg filament integrated with a piezoresistive AFM type cantilever is created by depositing the filament structure onto the cantilever by a chemical vapor deposition technique where the cantilever is exposed to the flux of precursor gas. An incident electron beam causes a fragmentation of the gas molecules leaving a deposit behind which leads to a conductive deposit shaped as a multi-leg filament structure for thermal measurements of a sample. A deposited four leg filament structure has a mechanical rigidity, high spatial resolution, low thermal conductivity and thermal capacitance, fast response time, and in combination with a four point resistant measurement and lock-in technique, eliminates resistivity for increasing both the temperature sensitivity and the signal-to-noise ratio of the thermal probe.