Patents by Inventor Jacco Van Der Hoeven

Jacco Van Der Hoeven has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11912212
    Abstract: An additive sub-system for a wastewater management system of a vehicle including at least one holding tank and a toilet has a controller, at least one additive dispenser and a pump. The at least one additive dispenser is in fluid communication with the at least one holding tank or the toilet. The pump is associated with each additive dispenser of the at least one additive dispensers. Each pump is controlled by the controller to dispense an additive from the at least one additive dispenser to the at least one holding tank or the toilet.
    Type: Grant
    Filed: November 24, 2020
    Date of Patent: February 27, 2024
    Assignee: Thetford BV
    Inventors: Jacco Van Beek, Joop Van Leeuwen, Tijs Slezak, Wilco Wessels, Ruud Van Den Heijkant, Ronald Van Der Hoeven, Mark Mulders, Tom Kieboom, Didier Van Riel, Mitchell Van De Sande, Dineke Van Duijn
  • Patent number: 11912213
    Abstract: An apparatus for delivering wastewater from a recreational vehicle to a drain includes a housing having an outer wall and an inner wall generally perpendicular or slightly angled to the outer wall. The housing and the inner wall define an inlet chamber above the inner wall and a further chamber below the inner wall. The housing further includes an outlet downwardly extending from the inlet chamber.
    Type: Grant
    Filed: November 24, 2020
    Date of Patent: February 27, 2024
    Assignee: Thetford BV
    Inventors: Jacco Van Beek, Joop Van Leeuwen, Tijs Slezak, Wilco Wessels, Ruud Van Den Heijkant, Ronald Van Der Hoeven, Mark Mulders, Tom Kieboom, Didier Van Riel, Mitchell Van De Sande, Dineke Van Duijn
  • Publication number: 20080073602
    Abstract: An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
    Type: Application
    Filed: June 22, 2006
    Publication date: March 27, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hernes Jacobs, Noud Jan Gilissen, Hans Jansen, Nicolaas Ten Kate, Nicolaas Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Johannes Mulkens, Harmen Klaas Van Der Schoot, Marco Koert Stavenga, Bob Streefkerk, Peter-Paul Steijaert, Marcus Vermeulen, Jacco Van Der Hoeven