Patents by Inventor Jacob Levin
Jacob Levin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11994504Abstract: A point of use analyte detection and quantification system for food or food processing applications is provided. Related methods are also provided.Type: GrantFiled: September 20, 2021Date of Patent: May 28, 2024Assignee: SALVUS, LLCInventors: Ron Levin, Clinton Beeland, James LeFiles, Joseph Egan, Timothy Zollers, Jacob Thompson
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Publication number: 20240057957Abstract: An energy-dispersive x-ray spectroscopy (EDX) sensing unit, the EDX sensing unit include a protective unit and an x-ray sensor that includes one or more sensing regions. The protective unit is configured to (i) introduce a change in one or more properties of electrons emitted from a sample, thereby preventing the electrons emitted from the sample from reaching the one or more sensing regions, the electrons are emitted from the sample due to an illuminating of the sample by a primary electron beam, and (ii) increase a safety of operation of the EDX sensing unit. The x-ray sensor is configured to (i) receive, by the one or more sensing regions, x-ray photons emitted from the sample due to the illuminating of the sample, and (ii) generate detection signals indicative of the x-ray photons.Type: ApplicationFiled: February 15, 2023Publication date: February 22, 2024Applicant: Applied Materials Israel Ltd.Inventors: Martin Chauvin, Eugene Brozgol, Marat Feldman, Yosef Basson, Itay Asulin, Shmuel Nakash, Jacob Levin
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Patent number: 11366072Abstract: A method and a system for detecting backscattered electrons in a multi-beam electron column.Type: GrantFiled: May 4, 2020Date of Patent: June 21, 2022Assignee: Applied Materials Israel Ltd.Inventors: Jacob Levin, Alon Litman
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Patent number: 11355309Abstract: The present invention relates to a sensor for electron detection emitted from an object to be used with a charged particle beam column being operated at a certain column and wafer voltage. The sensor is configured and operable to at least reduce interaction of negative ions with the active area of the sensor while minimizing electrons energy loss. The sensor is also configured and operable to minimize both gradual degradation of a cathodoluminescence efficiency of the active area and dynamic change of cathodoluminescence generated during operation of the sensor and evolving throughout the scintillator's lifetime.Type: GrantFiled: August 1, 2019Date of Patent: June 7, 2022Assignee: APPLIED MATERIALS ISRAEL LTD.Inventors: Itay Assulin, Jacob Levin, Guy Eytan
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Patent number: 11189451Abstract: A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.Type: GrantFiled: December 2, 2020Date of Patent: November 30, 2021Assignee: APPLIED MATERIALS ISRAEL LTD.Inventors: Itay Asulin, Ofer Yuli, Lavy Shavit, Yoram Uziel, Guy Eytan, Natan Schlimoff, Igor Krivts (Krayvitz), Jacob Levin, Israel Avneri
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Publication number: 20210341398Abstract: A method and a system for detecting backscattered electrons in a multi-beam electron column.Type: ApplicationFiled: May 4, 2020Publication date: November 4, 2021Inventors: Jacob Levin, Alon Litman
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Publication number: 20210319976Abstract: The present invention relates to a sensor for electron detection emitted from an object to be used with a charged particle beam column being operated at a certain column and wafer voltage. The sensor is configured and operable to at least reduce interaction of negative ions with the active area of the sensor while minimizing electrons energy loss. The sensor is also configured and operable to minimize both gradual degradation of a cathodoluminescence efficiency of the active area and dynamic change of cathodoluminescence generated during operation of the sensor and evolving throughout the scintillator's lifetime.Type: ApplicationFiled: August 1, 2019Publication date: October 14, 2021Inventors: Itay Assulin, Jacob Levin, Guy Eytan
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Publication number: 20210175040Abstract: A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.Type: ApplicationFiled: December 2, 2020Publication date: June 10, 2021Applicant: APPLIED MATERIALS ISRAEL LTD.Inventors: Itay Asulin, Ofer Yuli, Lavy Shavit, Yoram Uziel, Guy Eytan, Natan Schlimoff, Igor Krivts (Krayvitz), Jacob Levin, Israel Avneri
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Patent number: 10886092Abstract: A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.Type: GrantFiled: April 3, 2020Date of Patent: January 5, 2021Assignee: APPLIED MATERIALS ISRAEL LTD.Inventors: Itay Asulin, Ofer Yuli, Lavy Shavit, Yoram Uziel, Guy Eytan, Natan Schlimoff, Igor Krivts (Krayvitz), Jacob Levin, Israel Avneri
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Publication number: 20200234907Abstract: A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.Type: ApplicationFiled: April 3, 2020Publication date: July 23, 2020Applicant: APPLIED MATERIALS ISRAEL LTD.Inventors: Itay Asulin, Ofer Yuli, Lavy Shavit, Yoram Uziel, Guy Eytan, Natan Schlimoff, Igor Krivts (Krayvitz), Jacob Levin, Israel Avneri
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Patent number: 10231864Abstract: A comfortable device for treating sleep apnea incorporates a mask, a flexible hose and a chamber for collecting expired air containing CO2. A sensor detects apnea and a control system automatically adjusts the amount of rebreathed CO2 to minimize apnea and also minimize arousal.Type: GrantFiled: December 12, 2016Date of Patent: March 19, 2019Inventors: John Webster, Icaro dos Santos, Jacob Levin, Mehdi Shokoueinejad, Fa Wang, Jerome Dempsey, Ailiang Xie
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Patent number: 10177048Abstract: A system for inspecting and reviewing a sample, the system may include a chamber that is arranged to receive the sample and to maintain vacuum within the chamber during at least a scan period; an inspection unit; a review unit; and a mechanical stage for moving the sample, according to a scan pattern and during the scan period, in relation to the inspection unit and the review unit while a spatial relationship between the inspection unit and the review unit remains unchanged; wherein the inspection unit is arranged to detect, during the scan period, multiple suspected defects of the sample; and wherein the review unit is arranged to (a) receive, during the scan period, information about the multiple suspected defects; and (b) locate, during the scan period and in response to the information about the multiple suspected defects, at least one actual defect.Type: GrantFiled: March 4, 2015Date of Patent: January 8, 2019Assignee: APPLIED MATERIALS ISRAEL LTD.Inventors: Juergen Frosien, Jacob Levin, Igor Krivts (Krayvitz), Yoram Uziel, Boris Golberg
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Publication number: 20160260642Abstract: A system for inspecting and reviewing a sample, the system may include a chamber that is arranged to receive the sample and to maintain vacuum within the chamber during at least a scan period; an inspection unit; a review unit; and a mechanical stage for moving the sample, according to a scan pattern and during the scan period, in relation to the inspection unit and the review unit while a spatial relationship between the inspection unit and the review unit remains unchanged; wherein the inspection unit is arranged to detect, during the scan period, multiple suspected defects of the sample; and wherein the review unit is arranged to (a) receive, during the scan period, information about the multiple suspected defects; and (b) locate, during the scan period and in response to the information about the multiple suspected defects, at least one actual defect.Type: ApplicationFiled: March 4, 2015Publication date: September 8, 2016Inventors: Juergen Frosien, Jacob Levin, Igor Krivts (Krayvitz), Yoram Uziel, Boris Golberg
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Patent number: 7838830Abstract: A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.Type: GrantFiled: October 24, 2007Date of Patent: November 23, 2010Assignee: ICT, Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbHInventors: Juergen Frosien, Helmut Banzhof, Jacob Levin, Dror Shemesh
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Patent number: 7659506Abstract: A system and method for generating a thin sample, the method includes: milling an intermediate section of a thin sample such as to enable an upper portion of the thin sample to tilt in relation to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed. A system and method for inspecting a thin sample, the method includes: A method for inspecting a thin sample, the method comprising: illuminating, by a charged particle beam, a tilted upper portion of a thin sample that is connected, via a milled intermediate section, to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed; and collecting particles and photons resulting from the illumination.Type: GrantFiled: September 25, 2007Date of Patent: February 9, 2010Assignee: Applied Materials, Israel, Ltd.Inventors: Michal Avinun-Kalish, Jacob Levin, Dror Shemesh
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Publication number: 20090078867Abstract: A system and method for generating a thin sample, the method includes: milling an intermediate section of a thin sample such as to enable an upper portion of the thin sample to tilt in relation to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed. A system and method for inspecting a thin sample, the method includes: A method for inspecting a thin sample, the method comprising: illuminating, by a charged particle beam, a tilted upper portion of a thin sample that is connected, via a milled intermediate section, to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed; and collecting particles and photons resulting from the illumination.Type: ApplicationFiled: September 25, 2007Publication date: March 26, 2009Inventors: Michal Avinun-Kalish, Jacob Levin, Dror Shemesh
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Publication number: 20080258060Abstract: A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.Type: ApplicationFiled: October 24, 2007Publication date: October 23, 2008Inventors: JUERGEN FROSIEN, Helmut Banzhof, Jacob Levin, Dror Shemesh